MAGNETIC TUNNEL JUNCTION (MTJ) INTEGRATION ON BACKSIDE OF SILICON

    公开(公告)号:US20200006627A1

    公开(公告)日:2020-01-02

    申请号:US16022519

    申请日:2018-06-28

    申请人: Intel Corporation

    摘要: A memory device comprises a substrate having a front side and a backside, wherein a first conductive line is on the backside and a second conductive line is on the front side. A transistor is on the front side between the second conductive line and the substrate. A magnetic tunnel junction (MTJ) is on the backside between the first conductive line and the substrate, wherein one end of the MTJ is coupled through the substrate to the transistor and an opposite end of the MTJ is connected to the first conductive line, and wherein the transistor is further connected to the second conductive line on the front side.