Abstract:
Methods, techniques, and structures relating to die packaging. In one exemplary implementation, a die package interconnect structure includes a semiconductor substrate and a first conducting layer in contact with the semiconductor substrate. The first conducting layer may include a base layer metal. The base layer metal may include Cu. The exemplary implementation may also include a diffusion barrier in contact with the first conducting layer and a wetting layer on top of the diffusion barrier. A bump layer may reside on top of the wetting layer, in which the bump layer may include Sn, and Sn may be electroplated. The diffusion barrier may be electroless and may be adapted to prevent Cu and Sn from diffusing through the diffusion barrier. Furthermore, the diffusion barrier may be further adapted to suppress a whisker-type formation in the bump layer.
Abstract:
An embodiment of the invention relates to a wafer comprising a plurality of biochips and interconnects on the wafer, the biochip comprising a biochip pad, a synthesis electrode and a gel comprising a probe, wherein a plurality of the biochip pads of the plurality of the biochips are interconnected by the interconnects to carry out a chemical reaction on a plurality of the synthesis electrodes.
Abstract:
Methods, techniques, and structures relating to die packaging. In one exemplary implementation, a die package interconnect structure includes a semiconductor substrate and a first conducting layer in contact with the semiconductor substrate. The first conducting layer may include a base layer metal. The base layer metal may include Cu. The exemplary implementation may also include a diffusion barrier in contact with the first conducting layer and a wetting layer on top of the diffusion barrier. A bump layer may reside on top of the wetting layer, in which the bump layer may include Sn, and Sn may be electroplated. The diffusion barrier may be electroless and may be adapted to prevent Cu and Sn from diffusing through the diffusion barrier. Furthermore, the diffusion barrier may be further adapted to suppress a whisker-type formation in the bump layer.
Abstract:
An embodiment of the invention relates to a biochip comprising at least two measurement electrodes, a synthesis electrode, a ground electrode, a gap between the at least two measurement electrodes, a porous dielectric isolation layer and a gel comprising a probe in the gap, wherein the porous dielectric isolation layer is between the synthesis electrode and the gel. Yet other embodiments relate to the method of manufacturing the biochip and using the biochip for electrical detection of bio-species.