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公开(公告)号:US20230245940A1
公开(公告)日:2023-08-03
申请号:US18133868
申请日:2023-04-12
申请人: Intel Corporation
发明人: Rahul JAIN , Kyu Oh LEE , Siddharth K. ALUR , Wei-Lun K. JEN , Vipul V. MEHTA , Ashish DHALL , Sri Chaitra J. CHAVALI , Rahul N. MANEPALLI , Amruthavalli P. ALUR , Sai VADLAMANI
IPC分类号: H01L23/31 , H01L21/48 , H01L21/56 , H01L23/538 , H01L23/00 , H01L25/065 , H01L23/532 , H01L23/498
CPC分类号: H01L23/3185 , H01L21/4853 , H01L21/4857 , H01L21/563 , H01L23/5381 , H01L23/5383 , H01L23/5386 , H01L24/16 , H01L25/0655 , H01L23/53295 , H01L23/3128 , H01L24/06 , H01L23/49816 , H01L24/13 , H01L24/81 , H01L25/0657 , H01L2224/16227 , H01L2924/18161 , H01L2224/83051 , H01L2224/81
摘要: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
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公开(公告)号:US20240186202A1
公开(公告)日:2024-06-06
申请号:US18415268
申请日:2024-01-17
申请人: Intel Corporation
发明人: Rahul JAIN , Kyu Oh LEE , Siddharth K. ALUR , Wei-Lun K. JEN , Vipul V. MEHTA , Ashish DHALL , Sri Chaitra J. CHAVALI , Rahul N. MANEPALLI , Amruthavalli P. ALUR , Sai VADLAMANI
IPC分类号: H01L23/31 , H01L21/48 , H01L21/56 , H01L23/00 , H01L23/498 , H01L23/532 , H01L23/538 , H01L25/065
CPC分类号: H01L23/3185 , H01L21/4853 , H01L21/4857 , H01L21/563 , H01L23/3128 , H01L23/49816 , H01L23/53295 , H01L23/5381 , H01L23/5383 , H01L23/5386 , H01L24/06 , H01L24/13 , H01L24/16 , H01L24/81 , H01L25/0655 , H01L25/0657 , H01L2224/16227 , H01L2224/81 , H01L2224/83051 , H01L2924/18161
摘要: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
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