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公开(公告)号：US4381963A
公开(公告)日：1983-05-03
申请号：US173533
申请日：1980-07-30
CPC分类号： G21B1/19 , B29C33/3878 , Y02E30/16 , Y10T29/49893
摘要： Identical half-section shells of microscopic size, such as hemispherical shells from which spherical laser fusion targets can be made are capable of mass production by micro fabrication molding techniques. A body (preferably a hollow glass microsphere which is called a glass microballoon) provides a pattern for the hemispherical shells, and is used to produce an original mold section. One or more master molds are formed from this original mold section by replication. Many identical replica molds are made by casting soluble material onto the master mold and removing them therefrom. The replica molds are coated with one or more layers which will form the hemispherical shell wall. The material coating the flat background around the hemispherical cavity is referred to as the flange and is removed to form free standing shells. In order to remove the flange material, the coated replica molds are overcoated with a soluble material which is etched away to the level of the flange. The remaining soluble material acts as a mask for the shell material when the flange material is etched away. The replica mold and overcoating body remain as a protective mask and are dissolved away to release the identical shell sections. These sections can be assembled to provide closed shells. Overlapping lips can be formed during flange removal so as to facilitate the assembly of the sections into the closed shells.
摘要翻译： 可以通过微型制造成型技术大量生产具有微小尺寸的相同的半截面壳体，例如可以制造球形激光熔化靶的半球形壳体。 身体（优选为称为玻璃微球的中空玻璃微球）为半球形壳提供图案，并用于制造原始模具部分。 通过复制从该原始模具部分形成一个或多个主模具。 许多相同的复制模具通过将可溶性材料浇铸到母模上并将其从中除去而制成。 复制模具涂覆有一层或多层，其将形成半球形壳壁。 将半球形腔周围的平坦背景涂覆的材料称为凸缘，并被移除以形成独立的壳体。 为了去除凸缘材料，涂覆的复制模具用可蚀刻的材料进行涂覆，该可溶材料被蚀刻到凸缘的水平面上。 当法兰材料被蚀刻掉时，剩余的可溶性材料用作壳材料的掩模。 复制模具和外涂体保留作为保护面罩，并溶解掉以释放相同的外壳部分。 这些部分可以组装以提供封闭的壳。 可以在法兰移除期间形成重叠的唇缘，以便于将部件组装到封闭的壳体中。
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公开(公告)号：US4480302A
公开(公告)日：1984-10-30
申请号：US427326
申请日：1982-09-29
CPC分类号： G11B7/24018
摘要： Laminated optical recording medium that provides desired optical properties in combination with pregrooved channels that define data tracks on which data may be written. Annular or spiral grooves are selectively placed on a base disc substrate. A recording layer is deposited on a transparent disc substrate. The two disc substrates are then bonded together so that the recording layer on the transparent disc substrate confronts the grooves on the base disc substrate. The covered grooves thus form chambers exposed to the recording layer. Prior to bonding the two disc substrates together, the chambers may be filled with an inert gas. A rigid support disc, such as is made from aluminum, may optionally be bonded to the underside of the grooved base disc substrate.
摘要翻译： 层叠光学记录介质，其与预定沟槽结合提供期望的光学特性，其定义可写入数据的数据轨迹。 环形或螺旋形槽被选择性地放置在基盘基板上。 记录层沉积在透明盘基片上。 然后将两个盘基片结合在一起，使得透明盘基片上的记录层面对基盘基片上的凹槽。 因此，被覆盖的沟槽形成暴露于记录层的室。 在将两个盘基片接合在一起之前，腔室可以填充惰性气体。 诸如由铝制成的刚性支撑盘可以可选地结合到带槽底盘基底的下侧。
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3.发明授权公开(公告)号：US06841312B1
公开(公告)日：2005-01-11
申请号：US10120935
申请日：2002-04-11
申请人： Franklin D. Kalk
发明人： Franklin D. Kalk
CPC分类号： G03F1/64
摘要： A method and apparatus for coupling a pellicle assembly to a photomask are disclosed. A pellicle assembly is mounted on a photomask by bringing an adhesive material formed on a surface of a frame associated with the pellicle assembly in contact with the photomask. The adhesive material is heated to cause the adhesive gasket to flow and comply with a flatness of the photomask.
摘要翻译： 公开了一种将防护薄膜组件耦合到光掩模的方法和装置。 通过使形成在与防护薄膜组件相关联的框架的表面上的粘合剂材料与光掩模接触来将防护薄膜组件安装在光掩模上。 粘合剂材料被加热以使粘合剂垫片流动并符合光掩模的平整度。
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公开(公告)号：US5459002A
公开(公告)日：1995-10-17
申请号：US218144
申请日：1994-03-28
IPC分类号： G03F1/32 , G03F1/54 , G03F1/58 , H01L21/027 , G03F9/00
摘要： Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 and consists essentially of a combination of a metallic component and a dielectric component. One surface of the film has a higher content of metallic component than the other surface and the profile of change in extinction coefficient is gradual through the film thickness. The profile of change in extinction coefficient and the film thickness are selected to provide a phase shift of about 180.degree. (or an odd multiple thereof) at a selected wavelength.
摘要翻译： 公开了透射式嵌入式移相器 - 光掩模坯料，其包含光学非均匀衰减膜，其具有至少0.001的透射率，并且基本上由金属成分和电介质成分的组合组成。 膜的一个表面具有比另一个表面更高的金属成分含量，并且消光系数的变化曲线通过膜厚逐渐变化。 选择消光系数和膜厚度变化的曲线，以在所选波长处提供约180°（或其奇数倍）的相移。
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公开(公告)号：US06803160B2
公开(公告)日：2004-10-12
申请号：US10317565
申请日：2002-12-12
IPC分类号： G03F900
CPC分类号： G03F1/50
摘要： A multi-tone photomask and method for manufacturing the same are disclosed. A photomask includes a filter layer formed on at least a portion of a substrate. The filter layer includes a first pattern formed by a first etch process. A barrier layer including the first pattern is formed on at least a portion of the filter layer by a second etch process. An absorber layer including a second pattern is formed on at least a portion of the barrier layer by a third etch process. The barrier layer further acts as an etch stop for the third etch process.
摘要翻译： 公开了一种多色调光掩模及其制造方法。 光掩模包括形成在基板的至少一部分上的过滤层。 滤光层包括通过第一蚀刻工艺形成的第一图案。 通过第二蚀刻工艺在过滤层的至少一部分上形成包括第一图案的阻挡层。 通过第三蚀刻工艺在阻挡层的至少一部分上形成包括第二图案的吸收层。 阻挡层还用作第三蚀刻工艺的蚀刻停止。
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公开(公告)号：US5415953A
公开(公告)日：1995-05-16
申请号：US195670
申请日：1994-02-14
IPC分类号： G03F1/00 , G03F1/32 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32
摘要： Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 at the lithographic wavelength and consists essentially of a combination of multiple components with one of the components having a higher absorbance than another at the lithographic wavelength, One depth from a surface of the films has a higher content of the higher absorbing component than another depth and the profile of change in refractive index and/or extinction coefficient is gradual through the film thickness, Said profile(s) of change and the film thickness are selected to provide a phase shift of about 180.degree. (or an odd multiple thereof) at a selected lithographic wavelength.
摘要翻译： 公开了透射式嵌入式移相器 - 光掩模坯料，其包含光学不均匀的衰减膜，其在平版印刷波长处具有至少0.001的透射率，并且基本上由多个组分与其中一个组分的组合具有比另一个 光刻波长，从表面的一个深度具有比另一深度更高的吸收组分的含量，并且折射率和/或消光系数的变化曲线通过膜厚度逐渐变化。所述变化曲线 并且选择膜厚度以在所选择的光刻波长处提供约180°（或其奇数倍）的相移。
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公开(公告)号：US4857373A
公开(公告)日：1989-08-15
申请号：US32376
申请日：1987-03-31
申请人： Peter F. Carcia , Franklin D. Kalk
发明人： Peter F. Carcia , Franklin D. Kalk
CPC分类号： G11B7/243 , G11B2007/24308 , G11B2007/24316 , G11B7/2542 , Y10S428/913 , Y10S430/146 , Y10T428/239 , Y10T428/261 , Y10T428/31544
摘要： A nonablative optical recording element comprising a light-absorptive layer supported upon a dimensionally stable substrate in which the light-absorptive layer is a continuous, morphologically stable, amorphous, thin layer of an eutectic alloy of Te with at least one thermally conductive metal.
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公开(公告)号：US06841309B1
公开(公告)日：2005-01-11
申请号：US10044076
申请日：2002-01-11
CPC分类号： G03F1/48
摘要： A method for fabricating a damage resistant photomask includes forming a photomask pattern on a substrate and forming a transparent, protective coating on the photomask pattern. The protective coating may be an electrical insulator (e.g., spin-on glass). In addition, an antireflective layer may be applied to the protective coating. A pellicle may also be attached over the protective coating. The protective coating may prevent electrostatic energy from forming on or arcing between features on the photomask pattern and damaging the features. The protective layer may also prevent the photomask pattern from being damaged by or reacting with other substances, such as cleaning solutions.
摘要翻译： 制造耐损伤光掩模的方法包括在基片上形成光掩模图案，并在光掩模图案上形成透明保护涂层。 保护涂层可以是电绝缘体（例如旋涂玻璃）。 此外，可以将抗反射层施加到保护涂层。 防护薄膜也可以附着在保护涂层上。 保护涂层可以防止静电能量在光掩模图案上的特征之间形成或电弧，并损坏特征。 保护层也可以防止光掩模图案被其他物质如清洁溶液损坏或与其反应。
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公开(公告)号：US4600682A
公开(公告)日：1986-07-15
申请号：US628194
申请日：1984-07-06
CPC分类号： G11B7/252 , G11B7/257 , G11B2007/24306 , G11B2007/24314 , G11B2007/24316 , G11B2007/25711 , G11B2007/25718 , G11B7/256 , G11B7/2585 , Y10T428/31692
摘要： A radiation recording structure for use in an information storage device having focused write and read radiation beams includes a substrate supported reflective layer, an active structure supported on the reflective layer. The structure also includes a dust defocusing layer as an outer surface for the structure for defocusing the image of dust on the outer surface and an aluminum adhesion layer between the dust defocusing layer and the active recording layer. The adhesion layer is transparent to the radiation beams and provides surface energy to draw the defocusing layer and the recording layer together.
摘要翻译： 用于具有聚焦写入和读出辐射束的信息存储装置中的辐射记录结构包括基板支撑反射层，支撑在反射层上的有源结构。 该结构还包括作为用于使外表面上的灰尘的图像散焦的结构的外部表面的粉尘散焦层和在粉尘散焦层和活性记录层之间的铝粘合层。 粘合层对于辐射束是透明的并且提供表面能量以将散焦层和记录层牵引在一起。
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