-
公开(公告)号:US11759769B2
公开(公告)日:2023-09-19
申请号:US17495881
申请日:2021-10-07
申请人: Isao Chinzei , Seiji Nakahigashi , Takumi Tojo , Masahide Miura , Nobuyuki Takagi , Yoshiteru Yazawa , Sho Hoshino , Minoru Ito , Naoto Fujita , Tomomasa Aikawa
发明人: Isao Chinzei , Seiji Nakahigashi , Takumi Tojo , Masahide Miura , Nobuyuki Takagi , Yoshiteru Yazawa , Sho Hoshino , Minoru Ito , Naoto Fujita , Tomomasa Aikawa
CPC分类号: B01J23/58 , B01D53/945 , B01J35/04 , B01D2255/1021 , B01D2255/1023 , B01D2255/1025 , B01D2255/2042 , B01D2255/9155 , F01N3/2803 , F01N2370/02
摘要: Provided is an exhaust gas purification device that allows improving an exhaust gas purification performance. An exhaust gas purification device of the present disclosure includes a substrate and a catalyst layer disposed on the substrate. The catalyst layer contains a porous carrier, a catalytic metal that is supported by the porous carrier and belongs to platinum group, an alkaline earth metal supported by the porous carrier, and an alkaline earth metal not supported by the porous carrier. At least a part of the alkaline earth metal supported by the porous carrier is supported inside the porous carrier.
-
公开(公告)号:US11504704B2
公开(公告)日:2022-11-22
申请号:US17410043
申请日:2021-08-24
申请人: Isao Chinzei , Takumi Tojo , Shogo Shirakawa , Sho Hoshino , Minoru Ito , Naoto Fujita
发明人: Isao Chinzei , Takumi Tojo , Shogo Shirakawa , Sho Hoshino , Minoru Ito , Naoto Fujita
IPC分类号: B01J35/00 , B01J23/46 , B01J35/02 , B01J35/04 , B01J21/14 , F01N3/28 , B01D53/94 , B01J23/44
摘要: An exhaust gas purification device includes a substrate including an upstream end and a downstream end and having a length Ls; a first containing Pd particles, extending between the upstream end and a first position, and being in contact with the substrate; a second containing Rh particles, extending between the downstream end and a second position, and being in contact with the substrate; and a third catalyst layer containing Rh particles, extending between the upstream end and a third position, and being in contact with at least the first catalyst layer, wherein an average of a Rh particle size distribution is from 1.0 to 2.0 nm, and a standard deviation of the Rh particle size distribution is 0.8 nm or less in each of the second catalyst layer and the third catalyst layer.
-
公开(公告)号:US12031465B2
公开(公告)日:2024-07-09
申请号:US17487236
申请日:2021-09-28
申请人: Isao Chinzei , Takumi Tojo , Masahide Miura , Nobusuke Kabashima , Minoru Ito , Naoto Fujita
发明人: Isao Chinzei , Takumi Tojo , Masahide Miura , Nobusuke Kabashima , Minoru Ito , Naoto Fujita
CPC分类号: F01N13/0097 , F01N3/28 , F01N3/2807 , F01N3/2825 , F01N13/0093 , F01N2510/0682 , F01N2510/0684
摘要: An exhaust gas purification device includes a substrate including an upstream end and a downstream end, the substrate having a length Ls between the upstream end and the downstream end; a first catalyst layer containing first catalyst particles, extending across a first region, and being in contact with the substrate, the first region extending between the upstream end and a first position, the first position being at a first distance La from the upstream end toward the downstream end; and a second catalyst layer containing second catalyst particles, extending across a second region, and being in contact with the substrate, the second region extending between the downstream end and a second position, the second position being at a second distance Lb from the downstream end toward the upstream end. The first catalyst layer has an inner surface defining macropores.
-
公开(公告)号:US11725556B2
公开(公告)日:2023-08-15
申请号:US17682646
申请日:2022-02-28
申请人: Isao Chinzei , Takumi Tojo , Takahiro Nishio , Yosuke Toda , Hirotaka Ori , Minoru Ito , Sho Hoshino
发明人: Isao Chinzei , Takumi Tojo , Takahiro Nishio , Yosuke Toda , Hirotaka Ori , Minoru Ito , Sho Hoshino
IPC分类号: B01J21/04 , B01J21/06 , B01J23/02 , B01J23/10 , B01J23/42 , B01J23/44 , B01J23/46 , B01J23/56 , B01J23/58 , B01J23/63 , B01J35/04 , F01N3/10
CPC分类号: F01N3/105 , B01J21/04 , B01J21/066 , B01J23/10 , B01J23/42 , B01J23/44 , B01J23/464 , F01N3/101 , F01N2330/02 , F01N2370/02 , F01N2430/06
摘要: Provided is an exhaust gas purification catalyst having an improved catalyst performance while securing an OSC in an air-fuel ratio (A/F) rich atmosphere where HC poisoning is likely to occur. The present disclosure relates to an exhaust gas purification catalyst including a substrate and a catalyst coating layer coated on the substrate. The catalyst coating layer has an upstream coat layer formed from an end portion in an upstream side with respect to an exhaust gas flow direction in the exhaust gas purification catalyst and a downstream coat layer formed from an end portion in a downstream side with respect to the exhaust gas flow direction in the exhaust gas purification catalyst. The downstream coat layer includes Rh as a catalytic metal, alumina-ceria-zirconia complex oxide, and alkaline earth metal.
-
公开(公告)号:US20240139716A1
公开(公告)日:2024-05-02
申请号:US18488353
申请日:2023-10-17
申请人: Takahiro NISHIO , Nobuyuki Takagl , Takumi Tojo , Shogo Shirakawa , Kengo Shimizu , Sho Hoshino , Shun Sakamoto , Yosuke Toda
发明人: Takahiro NISHIO , Nobuyuki Takagl , Takumi Tojo , Shogo Shirakawa , Kengo Shimizu , Sho Hoshino , Shun Sakamoto , Yosuke Toda
IPC分类号: B01J23/56
CPC分类号: B01J23/56 , B01J2523/822 , B01J2523/824 , B01J2523/828
摘要: Provided is an exhaust gas purification catalyst providing a catalyst performance and an OSC performance at the same time even at low temperature. The present disclosure relates to an exhaust gas purification catalyst including a substrate and a catalyst coating layer coated on the substrate. The catalyst coating layer includes a first catalyst coating layer containing Pd and/or Pt and a second catalyst coating layer containing Rh. The first catalyst coating layer is formed from an end portion in an upstream side with respect to an exhaust gas flow direction in the exhaust gas purification catalyst. The second catalyst coating layer includes an upstream coating layer and a downstream coating layer. Rh in the upstream coating layer and the downstream coating layer are supported on specific carrier particles. Further, a particle diameter of Rh is controlled.
-
-
-
-