N-CHANNEL AND P-CHANNEL FINFET CELL ARCHITECTURE WITH INTER-BLOCK INSULATOR
    1.
    发明申请
    N-CHANNEL AND P-CHANNEL FINFET CELL ARCHITECTURE WITH INTER-BLOCK INSULATOR 有权
    具有隔离绝缘体的N沟道和P沟道FinFET单元结构

    公开(公告)号:US20130026571A1

    公开(公告)日:2013-01-31

    申请号:US13194835

    申请日:2011-07-29

    IPC分类号: H01L27/12 H01L21/82 G06F17/50

    摘要: A finFET block architecture includes a first set of semiconductor fins having a first conductivity type, and a second set of semiconductor fins having a second conductivity type. An inter-block insulator is placed between outer fins of the first and second sets. A patterned gate conductor layer includes a first plurality of gate traces extending across the set of fins in the first block without crossing the inter-block insulator, and a second plurality of gate traces extending across the set of fins in the second block without crossing the inter-block insulator. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and include an inter-block connector arranged to connect gate traces in the first and second blocks.

    摘要翻译: finFET块结构包括具有第一导电类型的第一组半导体鳍片和具有第二导电类型的第二组半导体鳍片。 在第一和第二组的外部散热片之间放置一个块间绝缘体。 图案化栅极导体层包括跨越第一块中的翅片集合延伸的第一多个栅极迹线,而不跨越块间绝缘体;以及第二多个栅极迹线,跨越第二块中的翅片组延伸,而不跨越 块间​​绝缘体。 栅极导体层上的图案化导体层以正交布局图案布置,并且包括布置成连接第一和第二块中的栅极迹线的块间连接器。

    N-CHANNEL AND P-CHANNEL FINFET CELL ARCHITECTURE
    2.
    发明申请
    N-CHANNEL AND P-CHANNEL FINFET CELL ARCHITECTURE 有权
    N沟道和P沟道FinFET细胞结构

    公开(公告)号:US20130026572A1

    公开(公告)日:2013-01-31

    申请号:US13194862

    申请日:2011-07-29

    IPC分类号: H01L27/12 G06F17/50 H01L21/82

    摘要: A finFET block architecture suitable for use of a standard cell library, is based on an arrangement including a first set of semiconductor fins in a first region of the substrate having a first conductivity type, and a second set of semiconductor fins in a second region of the substrate, the second region having a second conductivity type. A patterned gate conductor layer including gate traces in the first and second regions, arranged over channel regions of the first and second sets of semiconductor fins is used for transistor gates. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and can include a plurality of floating power buses over the fins in the first and second regions.

    摘要翻译: 适用于标准单元库的finFET块结构基于包括第一组半导体鳍片的布置,该第一组半导体鳍片在具有第一导电类型的基板的第一区域中,第二组半导体鳍片在第二区域中 所述基板,所述第二区域具有第二导电类型。 在第一和第二区域中包括布置在第一和第二组半导体鳍片的沟道区域上的栅极迹线的图案化栅极导体层用于晶体管栅极。 栅极导体层上的图案化导体层以正交布局图案布置,并且可以包括在第一和第二区域中的翅片上方的多个浮动电源总线。