公开(公告)号：US10146131B2

公开(公告)日：2018-12-04

申请号：US14862352

申请日：2015-09-23

Applicant: JSR CORPORATION

Inventor： Shin-ya Nakafuji ,  Fumihiro Toyokawa ,  Gouji Wakamatsu ,  Yoshio Takimoto ,  Katsuhisa Mizoguchi ,  Takashi Okada ,  Takaaki Uno ,  Takeshi Endo ,  Masaki Moritsugu

IPC: G03F7/11 ,  C07D493/10 ,  C08G65/40 ,  C07C255/54 ,  C08G65/38 ,  C09D171/00 ,  G03F7/16 ,  G03F7/36 ,  H01L21/02 ,  C09D171/10 ,  G03F7/09

Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.

公开(公告)号：US09091922B2

公开(公告)日：2015-07-28

申请号：US13714406

申请日：2012-12-14

Applicant: JSR CORPORATION

Inventor： Shin-ya Nakafuji ,  Satoru Murakami ,  Kazuhiko Koumura ,  Yuushi Matsumura ,  Masayuki Motonari ,  Katsuhisa Mizoguchi

IPC: G03F7/11 ,  G03F7/09 ,  H01L21/027

CPC classification number: G03F7/11 ,  G03F7/091 ,  H01L21/0276

Abstract: A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NRA—. R1 represents a hydrogen atom or a C1-30 monovalent hydrocarbon group. R2 represents a hydroxy group, a sulfanil group, a cyano group, a nitro group, a C1-30 monovalent hydrocarbon group, a C1-30 monovalent oxyhydrocarbon group or a C1-30 monovalent sulfanilhydrocarbon group. p is an integer of 1 to 3.

Abstract translation: 用于形成抗蚀剂下层膜的树脂组合物包括具有芳环的树脂和具有由下式（i）表示的部分结构的交联剂。 X表示氧原子，硫原子，* -COO-或-NRA-。 R1表示氢原子或C1-30一价烃基。 R2表示羟基，磺胺基，氰基，硝基，C1-30一价烃基，C1-30一价羟基烃基或C1-30一价硫代烃基。 p为1〜3的整数。