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公开(公告)号：US20210181630A1
公开(公告)日：2021-06-17
申请号：US16710277
申请日：2019-12-11
Applicant: JSR CORPORATION
Inventor： Sosuke OSAWA , Kosuke TERAYAMA , Hajime INAMI , Kanako UEDA , Atsuto NISHII
Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.
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