公开(公告)号：US20230416451A1

公开(公告)日：2023-12-28

申请号：US18239373

申请日：2023-08-29

Applicant: JSR CORPORATION

Inventor： Shuhei YAMADA ,  Shinya ABE ,  Takashi TSUJI ,  Kanako UEDA ,  Hiroki NAKATSU ,  Hiroyuki MIYAUCHI

IPC: C08G61/02 ,  G03F7/004 ,  G03F7/039 ,  G03F7/038

CPC classification number: C08G61/02 ,  G03F7/0048 ,  G03F7/0388 ,  G03F7/0382 ,  G03F7/0397

Abstract: A composition includes: a polymer including a repeating unit represented by formula (1); and a solvent. In the formula (1), Ar1 is a divalent group including an aromatic ring having 5 to 40 ring atoms; and R0 is a group represented by formula (1-1) or (1-2). In the formulas (1-1) and (1-2), X1 and X2 are each independently a group represented by formula (i), (ii), (iii) or (iv); * is a bond with the carbon atom in the formula (1); and Ar2, Ar3 and Ar4 are each independently a substituted or unsubstituted aromatic ring having 6 to 20 ring atoms that forms a fused ring structure together with the two adjacent carbon atoms in the formulas (1-1) and (1-2).

公开(公告)号：US20210181630A1

公开(公告)日：2021-06-17

申请号：US16710277

申请日：2019-12-11

Applicant: JSR CORPORATION

Inventor： Sosuke OSAWA ,  Kosuke TERAYAMA ,  Hajime INAMI ,  Kanako UEDA ,  Atsuto NISHII

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/039 ,  G03F7/11 ,  G03F7/028 ,  G03F7/032 ,  G03F7/16 ,  C08F220/18

Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.