OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES WITHIN A PROCESSING CHAMBER
    1.
    发明申请
    OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES WITHIN A PROCESSING CHAMBER 有权
    用于在加工室中定位基板的偏移校正技术

    公开(公告)号:US20090088887A1

    公开(公告)日:2009-04-02

    申请号:US12237155

    申请日:2008-09-24

    IPC分类号: G06F19/00

    CPC分类号: H01L21/681 H01L21/68

    摘要: A method for aligning a substrate to a process center of a support mechanism is provided. The method includes determining substrate thickness after substrate processing at a plurality of orientations and at a plurality of radial distances from a geometric center of the substrate. The method also includes deriving a set of process rate values from substrate thickness and process duration. The method further includes creating for a process rate an off-centered plot which represents a substantially concentric circle whose points are a circumference of the off-centered plot having substantially the first process rate. The method yet also includes applying a curve-fitting equation to the off-centered plot to determine a set of parameters. The method yet further includes teaching a set of robot arms the set of parameters, thereby enabling the set of robot arms to align another substrate that is supported by the support mechanism with the process center.

    摘要翻译: 提供了一种将基板对准支撑机构的处理中心的方法。 该方法包括在基板处理之后确定基板厚度,该基板在多个取向并且距离基板的几何中心的多个径向距离处。 该方法还包括从衬底厚度和工艺持续时间导出一组工艺速率值。 该方法还包括为处理速率创建一个偏心图,该偏心图表示基本上同心的圆,其点是具有基本上第一处理速率的偏心图的周长。 该方法还包括将曲线拟合方程应用于偏心图以确定一组参数。 该方法还包括向一组机器人手臂提供一组参数,从而使得该组机器人臂将由支撑机构支撑的另一个基板与处理中心对准。

    OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES
    2.
    发明申请
    OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES 有权
    偏移校正方法和布置定位和检查基板

    公开(公告)号:US20080080845A1

    公开(公告)日:2008-04-03

    申请号:US11612370

    申请日:2006-12-18

    IPC分类号: G03B15/02

    摘要: A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.

    摘要翻译: 提供了一种用于捕获基板的图像的斜面检查模块。 模块包括旋转马达,其连接到基板卡盘并且构造成旋转基板卡盘,从而允许基板旋转。 该模块还包括照相机和光学外壳,其附接到相机并且被配置为旋转,使得光能够被引向基板。 照相机从照相机安装座安装,照相机安装件被配置为使照相机能够在180度平面上旋转,允许照相机拍摄基板的顶视图,底视图和侧视图中的至少一个的图像。 该模块还包括背光布置,其被配置为向基板提供照明,从而使得相机能够捕获显示基板和背景之间的对比度的图像。

    Offset correction techniques for positioning substrates within a processing chamber
    3.
    发明授权
    Offset correction techniques for positioning substrates within a processing chamber 有权
    用于将衬底定位在处理室内的偏移校正技术

    公开(公告)号:US08135485B2

    公开(公告)日:2012-03-13

    申请号:US12237155

    申请日:2008-09-24

    CPC分类号: H01L21/681 H01L21/68

    摘要: A method for aligning a substrate to a process center of a support mechanism is provided. The method includes determining substrate thickness after substrate processing at a plurality of orientations and at a plurality of radial distances from a geometric center of the substrate. The method also includes deriving a set of process rate values from substrate thickness and process duration. The method further includes creating for a process rate an off-centered plot, which represents a substantially concentric circle whose points are a circumference of the off-centered plot having substantially the first process rate. The method yet also includes applying a curve-fitting equation to the off-centered plot to determine a set of parameters. The method yet further includes teaching a set of robot arms the set of parameters, thereby enabling the set of robot arms to align another substrate that is supported by the support mechanism with the process center.

    摘要翻译: 提供了一种将基板对准支撑机构的处理中心的方法。 该方法包括在基板处理之后确定基板厚度,该基板在多个取向并且距离基板的几何中心的多个径向距离处。 该方法还包括从衬底厚度和工艺持续时间导出一组工艺速率值。 该方法还包括为处理速率创建偏心图,其表示基本上同心的圆,其点是具有基本上第一处理速率的偏心图的圆周。 该方法还包括将曲线拟合方程应用于偏心图以确定一组参数。 该方法还包括向一组机器人手臂提供一组参数,从而使得该组机器人臂将由支撑机构支撑的另一个基板与处理中心对准。

    Offset correction methods and arrangement for positioning and inspecting substrates
    4.
    发明授权
    Offset correction methods and arrangement for positioning and inspecting substrates 有权
    用于定位和检查基板的偏移校正方法和布置

    公开(公告)号:US07486878B2

    公开(公告)日:2009-02-03

    申请号:US11612370

    申请日:2006-12-18

    摘要: A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.

    摘要翻译: 提供了一种用于捕获基板的图像的斜面检查模块。 模块包括旋转马达,其连接到基板卡盘并且构造成旋转基板卡盘,从而允许基板旋转。 该模块还包括照相机和光学外壳,其附接到相机并且被配置为旋转,使得光能够被引向基板。 照相机从照相机安装座安装,照相机安装件被配置为使照相机能够在180度平面上旋转,允许照相机拍摄基板的俯视图,底视图和侧视图中的至少一个的图像。 该模块还包括背光布置,其被配置为向基板提供照明,从而使得相机能够捕获显示基板和背景之间的对比度的图像。

    Offset correction techniques for positioning substrates
    5.
    发明授权
    Offset correction techniques for positioning substrates 有权
    用于定位基板的偏移校正技术

    公开(公告)号:US07479236B2

    公开(公告)日:2009-01-20

    申请号:US11612355

    申请日:2006-12-18

    IPC分类号: G01L21/30 G05B15/00

    摘要: A method for calculating a process center for a chuck in a processing chamber is provided. The method includes generating pre-processing and post-processing measurement data points, which is perform by measuring thickness of a film substrate at a set of orientations and a set of distances from a geometric center of the substrate. The method also includes comparing the pre-processing and post-processing measurement data points to calculate a set of etch depth numbers. The method further includes generating etch profiles for the set of orientations. The method yet also includes extrapolating a set of radiuses, which is associated with a first etch depth, from the etch profiles. The method yet further includes generating an off-centered plot, which is a graphical representation of the set of radiuses versus the set of orientations. The method more over includes calculating the process center by applying a curve-fitting equation to the off-centered plot.

    摘要翻译: 提供了一种用于计算处理室中的卡盘的处理中心的方法。 该方法包括产生预处理和后处理测量数据点,其通过以一组取向和距衬底几何中心的一组距离测量薄膜衬底的厚度来执行。 该方法还包括比较预处理和后处理测量数据点以计算一组蚀刻深度数。 该方法还包括为该组取向生成蚀刻轮廓。 该方法还包括从蚀刻轮廓推断与第一蚀刻深度相关联的一组半径。 该方法还包括生成偏心图,其是该组半径与该组取向的图形表示。 更多的方法包括通过对偏心图应用曲线拟合方程来计算过程中心。

    OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES
    6.
    发明申请
    OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES 有权
    用于定位基板的偏移校正技术

    公开(公告)号:US20080081383A1

    公开(公告)日:2008-04-03

    申请号:US11612355

    申请日:2006-12-18

    IPC分类号: H01L21/66 G06F19/00

    摘要: A method for calculating a process center for a chuck in a processing chamber is provided. The method includes generating pre-processing and post-processing measurement data points, which is perform by measuring thickness of a film substrate at a set of orientations and a set of distances from a geometric center of the substrate. The method also includes comparing the pre-processing and post-processing measurement data points to calculate a set of etch depth numbers. The method further includes generating etch profiles for the set of orientations. The method yet also includes extrapolating a set of radiuses, which is associated with a first etch depth, from the etch profiles. The method yet further includes generating an off-centered plot, which is a graphical representation of the set of radiuses versus the set of orientations. The method more over includes calculating the process center by applying a curve-fitting equation to the off-centered plot.

    摘要翻译: 提供了一种用于计算处理室中的卡盘的处理中心的方法。 该方法包括产生预处理和后处理测量数据点,其通过以一组取向和距衬底的几何中心的一组距离测量薄膜衬底的厚度来执行。 该方法还包括比较预处理和后处理测量数据点以计算一组蚀刻深度数。 该方法还包括为该组取向生成蚀刻轮廓。 该方法还包括从蚀刻轮廓推断与第一蚀刻深度相关联的一组半径。 该方法还包括生成偏心图,其是该组半径与该组取向的图形表示。 更多的方法包括通过对偏心图应用曲线拟合方程来计算过程中心。

    Human powered watercraft or land vehicle

    公开(公告)号:US10442514B2

    公开(公告)日:2019-10-15

    申请号:US16164718

    申请日:2018-10-18

    申请人: Jack Chen

    发明人: Jack Chen

    摘要: A human powered watercraft or land vehicle is described herein. A watercraft or land vehicle may have two pedals that reciprocated are in a linear or slightly curved trajectory but not a circular motion. As the two pedals are reciprocated, an output shaft is rotated in either a clockwise or counterclockwise direction when the left pedal is pushed forward or when the right pedal is pushed forward. The output shaft may be connected to a propeller of a watercraft or a land vehicle so as to propel the watercraft or land vehicle forward. The output shaft may receive rotational input through two gears mounted to the output shaft with one-way bearings that enable the output shaft to rotate in the same direction regardless of whether the left pedal or the right pedal is being pushed forward.

    Methods and systems to perform a computer task in a reduced power consumption state
    9.
    发明授权
    Methods and systems to perform a computer task in a reduced power consumption state 有权
    在降低功耗状态下执行计算机任务的方法和系统

    公开(公告)号:US08910169B2

    公开(公告)日:2014-12-09

    申请号:US12241849

    申请日:2008-09-30

    IPC分类号: G06F1/32

    CPC分类号: G06F1/3203

    摘要: Methods and systems to perform a computer task in a reduced power consumption state, including to virtualize physical resources with respect to an operating environment and service environment, to exit the operating environment and enter the service environment, to place a first set of one or more of the physical resources in a reduced power consumption state, and to perform a task in the service environment utilizing a processor and a second set of one or more of the physical resources. A physical resource may be assigned to an operating environment upon an initialization of the operating environment, and re-assigned to the service environment to be utilized by the service environment while other physical resources are placed in a reduced power consumption state.

    摘要翻译: 在降低的功耗状态下执行计算机任务的方法和系统,包括虚拟化相对于操作环境和服务环境的物理资源,以退出操作环境并进入服务环境,以放置第一组一个或多个 的物理资源,并且使用处理器和一个或多个物理资源的第二组在服务环境中执行任务。 物理资源可以在操作环境的初始化时被分配给操作环境,并且被重新分配给要由服务环境利用的服务环境,而其他物理资源被置于降低的功耗状态。

    Tent
    10.
    发明授权
    Tent 失效
    帐篷

    公开(公告)号:US08555909B2

    公开(公告)日:2013-10-15

    申请号:US13242015

    申请日:2011-09-23

    申请人: Jack Chen

    发明人: Jack Chen

    IPC分类号: E04H15/44

    CPC分类号: E04H15/38 E04H6/005 E04H6/04

    摘要: A tent having two joints, multiple frames and a fly. The frames are mounted on the joints and are classified into a stationary frame, a supporting frame and at least one pivoting frame. The frames cooperate to define a parking space for receiving a cycle when unfolding. The fly covers the frames and the parking space. The frames are capable of folding and overlapping one another to facilitate carrying and storage of the tent.

    摘要翻译: 一个帐篷有两个关节,多个框架和飞行。 框架安装在接头上,并分为固定框架,支撑框架和至少一个枢转框架。 这些框架协作以定义用于在展开时接收周期的停车空间。 苍蝇覆盖框架和停车位。 这些框架能够彼此折叠和重叠,以便于帐篷的搬运和储存。