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1.发明申请Symmetrization structures for process-tolerant integrated optical components 审中-公开用于过程容差集成光学元件的对称结构公开(公告)号：US20060013551A1
公开(公告)日：2006-01-19
申请号：US11146968
申请日：2005-06-07
申请人： James Foresi , Tairan Wang , Jean-Francois Viens , Dale Fried , Mohammad Khan , Michael Lim , Anuradha Agarwal , Gokhan Ulu
发明人： James Foresi , Tairan Wang , Jean-Francois Viens , Dale Fried , Mohammad Khan , Michael Lim , Anuradha Agarwal , Gokhan Ulu
IPC分类号： G02B6/10
CPC分类号： G02B6/122 , G02B6/12007 , G02B6/136 , G02B2006/12147 , G02B2006/12159
摘要： An integrated planar waveguide system including at least two primary waveguides for light propagation and coupling, and two or more mirror-imaged symmetrization structures in close proximity to the primary waveguides in order to provide micro-process-equalization during etch, growth, annealing and reflow processes. The primary waveguides are designed to carry light signals. The symmetrization waveguide structures are designed so that all the trenches between primary waveguides are identical to the desired degree. At the same time, the symmetrization structures are designed to have minimal detrimental impact on the optical performance of the coupler.
摘要翻译： 包括至少两个用于光传播和耦合的初级波导的集成平面波导系统以及紧邻主波导的两个或更多个镜像成像对称结构，以便在蚀刻，生长，退火和回流期间提供微加工均衡 过程。 主波导被设计为携带光信号。 对称化波导结构被设计成使得主波导之间的所有沟槽与期望的程度相同。 同时，对称结构被设计成对耦合器的光学性能具有最小的有害影响。
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公开(公告)号：US20050031284A1
公开(公告)日：2005-02-10
申请号：US10929271
申请日：2004-08-30
申请人： Guy Blalock , Howard Rhodes , Vishnu Agarwal , Gurtej Sandhu , James Foresi , Jean-Francois Viens , Dale Fried
发明人： Guy Blalock , Howard Rhodes , Vishnu Agarwal , Gurtej Sandhu , James Foresi , Jean-Francois Viens , Dale Fried
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US20100220958A1
公开(公告)日：2010-09-02
申请号：US12780601
申请日：2010-05-14
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US07936955B2
公开(公告)日：2011-05-03
申请号：US12780601
申请日：2010-05-14
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/26
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本上相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US07359607B2
公开(公告)日：2008-04-15
申请号：US10929271
申请日：2004-08-30
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/10
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US08111965B2
公开(公告)日：2012-02-07
申请号：US13099126
申请日：2011-05-02
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/10
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US20110206332A1
公开(公告)日：2011-08-25
申请号：US13099126
申请日：2011-05-02
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtel Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtel Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/10
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US07720341B2
公开(公告)日：2010-05-18
申请号：US12047927
申请日：2008-03-13
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/10
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US20080226247A1
公开(公告)日：2008-09-18
申请号：US12047927
申请日：2008-03-13
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/10
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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公开(公告)号：US07006746B2
公开(公告)日：2006-02-28
申请号：US10233000
申请日：2002-08-29
申请人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
发明人： Guy T. Blalock , Howard E. Rhodes , Vishnu K. Agarwal , Gurtej Singh Sandhu , James S. Foresi , Jean-Francois Viens , Dale G. Fried
IPC分类号： G02B6/10
CPC分类号： G02F1/025 , G02B6/125 , G02B6/136 , G02B2006/12107 , G02B2006/12164 , G02F1/0147 , G02F2203/15
摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.
摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。
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