公开(公告)号：US08928847B2

公开(公告)日：2015-01-06

申请号：US13790590

申请日：2013-03-08

Applicant: Japan Display Inc.

Inventor： Takato Hiratsuka ,  Osamu Itou ,  Masanao Yamamoto ,  Daisuke Sonoda

IPC: G02F1/1343 ,  G02F1/1339 ,  G02F1/1333 ,  G02F1/1337

CPC classification number: G02F1/134363 ,  G02F1/133377 ,  G02F1/133707

Abstract: The liquid crystal display device includes a pixel structure provided with a large wall formed along a long side of a pixel with a rectangular plane, a small wall formed at a center of the pixel and extending in the same direction as the large wall, a wall electrode formed on a wall surface of the large wall, a plane electrode formed between the small and large walls, in which the wall electrode and the plane electrode form a pixel electrode, and a common electrode formed on a surface of the small wall. The large wall has a part with an increased thickness at an end part of the pixel. The wall electrode is bent toward the center of the pixel. This structure prevents decrease of reverse twist of liquid crystal at an end part of the pixel as well as generation of domain, thus improving transmittance of the screen.

Abstract translation: 该液晶显示装置包括像素结构，该像素结构设置有沿着像素的长边形成的具有矩形平面的大壁，形成在像素的中心并沿与大壁相同的方向延伸的小壁，壁 形成在大壁的壁面上的电极，形成在小壁和大壁之间的平面电极，其中壁电极和平面电极形成像素电极，以及形成在小壁表面上的公共电极。 大壁部在像素的端部具有增加的厚度部分。 壁电极朝向像素的中心弯曲。 该结构可以防止像素的端部处的液晶的反向扭转的减少以及畴的产生，从而提高了屏幕的透射率。

公开(公告)号：US09304362B2

公开(公告)日：2016-04-05

申请号：US13964133

申请日：2013-08-12

Applicant: Japan Display Inc.

Inventor： Chikae Matsui ,  Masanao Yamamoto ,  Noboru Kunimatsu ,  Hidehiro Sonoda

IPC: G02F1/1343 ,  G02F1/1333 ,  G02F1/136 ,  G02F1/1362

CPC classification number: G02F1/134309 ,  G02F1/1333 ,  G02F1/136 ,  G02F2001/133397 ,  G02F2001/134372 ,  G02F2001/136222

Abstract: In a liquid crystal display device including: TFT substrate; color filter; counter electrode; interlayer insulation film; pixel electrode; alignment film; liquid crystal layer; counter substrate; and Si semiconductor layer. The color filter, counter electrode, interlayer insulation film, pixel electrode, and alignment film being formed on the side where the TFT substrate is provided, the counter substrate being disposed in facing relation to the TFT substrate with the liquid crystal layer put between the counter substrate and TFT substrate, the Si semiconductor layer is formed between the pixel electrode and interlayer insulation film. Even when light from a backlight is absorbed by the color filter and sufficient light cannot reach the alignment film, electric charges accumulated on the alignment film can escape to the pixel electrode in an early stage by the Si semiconductor layer formed under the alignment film, thereby capable of erasing the afterimage in an early stage.

Abstract translation: 一种液晶显示装置，包括：TFT基板; 滤色片; 对电极 层间绝缘膜; 像素电极; 取向膜; 液晶层; 对衬底 和Si半导体层。 在设置有TFT基板的一侧形成有滤色器，对电极，层间绝缘膜，像素电极和取向膜，对置基板与TFT基板相对配置，液晶层位于计数器之间 衬底和TFT衬底，在像素电极和层间绝缘膜之间形成Si半导体层。 即使当来自背光源的光被滤色器吸收并且足够的光不能到达取向膜时，积累在取向膜上的电荷可以通过在取向膜下面形成的Si半导体层在早期阶段中逸出到像素电极，从而 能够在早期消除残像。

公开(公告)号：US10310339B2

公开(公告)日：2019-06-04

申请号：US15157606

申请日：2016-05-18

Applicant: Japan Display Inc.

Inventor： Osamu Itou ,  Takato Hiratsuka ,  Masanao Yamamoto ,  Toshimasa Ishigaki ,  Daisuke Sonoda

IPC: G02F1/1333 ,  G02F1/1337 ,  G02F1/1339 ,  G02F1/1343 ,  H01L33/00

Abstract: In a wall electrode liquid crystal display device, planar distribution of the wall structure and the electrode is optimized to improve a yield. A liquid crystal display device includes a plurality of pixels arranged in a matrix, each of the pixels having an insulator wall structure formed at a border of pixels, a wall electrode formed at a side surface of the wall structure of the border of the pixels, a source electrode which is continuous with the wall electrode and formed of a planar electrode extending in a planar direction, a first common electrode provided between source electrodes at both sides of the pixel to form a retentive capacitance, and a second common electrode provided between wall electrodes on both sides of the pixel. A slit which becomes a border of the wall electrodes of two adjacent pixels is disposed only on a top of the wall structure.

公开(公告)号：US09606389B2

公开(公告)日：2017-03-28

申请号：US13833941

申请日：2013-03-15

Applicant: Japan Display Inc.

Inventor： Takato Hiratsuka ,  Osamu Itou ,  Masanao Yamamoto ,  Daisuke Sonoda ,  Toshimasa Ishigaki

IPC: G02F1/1333 ,  G02F1/1343

CPC classification number: G02F1/133345 ,  G02F1/133377 ,  G02F1/134336

Abstract: The present invention provides a liquid crystal display device including: plural pixels disposed in a matrix shape, each pixel having insulating wall-shaped structures at the boundaries of the pixels and a small wall-shaped structure between the wall-shaped structures; wall electrodes, each having wall-shaped electrodes formed on the side faces of the wall-shaped structures, and planar electrodes that are connected to the wall-shaped electrodes and extend in the planar direction; electrodes, each having a TFT-side electrode covering the small wall-shaped structure and a storage capacitor electrode that is connected to the TFT-side electrode and extends in the planar direction of the substrate; and interlayer insulating films formed between the storage capacitor electrodes and the planar electrodes. And the interlayer insulating films of inorganic films are not formed on the upper and side faces and at the base portions of the wall-shaped structures at the boundaries of the pixels.

公开(公告)号：US09229285B2

公开(公告)日：2016-01-05

申请号：US13851211

申请日：2013-03-27

Applicant: Japan Display Inc.

Inventor： Masanao Yamamoto ,  Daisuke Sonoda ,  Osamu Itou ,  Takato Hiratsuka

IPC: G02F1/1337 ,  C09K13/00 ,  G02F1/1343 ,  G02F1/1333

CPC classification number: G02F1/13439 ,  C09K13/00 ,  G02F1/133377 ,  G02F1/133707 ,  G02F1/134309 ,  G02F2201/128

Abstract: Provided is a method of manufacturing a display device that includes a structure formed so as to protrude at least in a normal direction of a first substrate, and an electrode formed in a side wall surface of the structure, the method including: forming a transparent conductive film for the electrode; forming a low-affinity material having a low affinity for a resist film on an upper surface of the transparent conductive film formed in a head surface of the structure; forming a resist film by applying a liquid resist material to an upper layer of the transparent conductive film and then fixing the resist material; forming an opening that exposes the transparent conductive film in the resist film by removing the low-affinity material; etching the transparent conductive film which is a lower layer using the resist film as a protective film; and removing the resist film.

Abstract translation: 提供一种制造显示装置的方法，该显示装置包括形成为至少沿第一基板的法线方向突出的结构和形成在该结构的侧壁表面中的电极的方法，该方法包括：形成透明导电 电极膜; 在形成在所述结构的头表面中的所述透明导电膜的上表面上形成对抗蚀剂膜具有低亲和力的低亲和力材料; 通过将液体抗蚀剂材料施加到所述透明导电膜的上层，然后固定所述抗蚀剂材料来形成抗蚀剂膜; 形成通过除去低亲和性材料而使抗蚀剂膜中的透明导电膜露出的开口; 使用抗蚀剂膜作为保护膜来蚀刻作为下层的透明导电膜; 并除去抗蚀剂膜。

公开(公告)号：US09035310B2

公开(公告)日：2015-05-19

申请号：US13633151

申请日：2012-10-02

Applicant: Japan Display Inc.

Inventor： Yoshinori Ishii ,  Daisuke Sonoda ,  Masanao Yamamoto

IPC: H01L29/43 ,  H01L29/78 ,  H01L33/40 ,  G09G1/00 ,  H01L29/423 ,  H01L29/49 ,  H01L27/12

CPC classification number: H01L33/40 ,  G09G1/00 ,  H01L27/1244 ,  H01L29/42384 ,  H01L29/4908

Abstract: The invention prevents disconnection of data lines that traverse two-layered gate lines via an insulating film.Data lines 20 override and thereby traverse gate lines 10 with an insulating film deposited therebetween. The gate lines 10 each have a two-layered structure including a lower AlCu layer 11 and an upper MoCr layer 12. When the thickness ratio of the upper layer 12 to the lower layer 11 is in the range of 0.4 to 1.0, it is possible to prevent a decrease in the etch speed of the upper layer 12 near the side edges of the gate line 10, which occurs due to galvanization. As a result, the upper layer 12 is prevented from having an overhang. The absence of overhangs on the gate lines 10 prevents the data lines 20 from being disconnected at the intersections of the gate lines 10 and the data lines 20.

Abstract translation: 本发明防止经由绝缘膜穿过两层栅极线的数据线断开。 数据线20被覆盖并由此横穿栅极线10，其间沉积有绝缘膜。 栅极线10各自具有包括下部AlCu层11和上部MoCr层12的两层结构。当上层12与下层11的厚度比在0.4〜1.0的范围内时， 以防止由于镀锌而发生的栅极线10的侧边缘附近的上层12的蚀刻速度降低。 结果，防止了上层12的突出。 栅极线10上不存在突出端阻止数据线20在栅极线10和数据线20的交叉处断开。