专利检索 ap:("Jean-Christophe Rostaing" OR "Daniel Guerin" OR "Frederic Noel" OR "Helene Daniel") AND inv:"Helene Daniel" 第 1 页

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发明申请
Device and Process for Very High-Frequency Plasma-Assisted CVD under Atmospheric Pressure, and Applications Thereof 审中-公开
标题翻译：在大气压下进行超高频等离子体辅助CVD的器件和工艺及其应用

公开(公告)号：US20110045205A1

公开(公告)日：2011-02-24

申请号：US12679239

申请日：2008-09-16

申请人： Jean-Christophe Rostaing , Daniel Guerin , Frederic Noel , Helene Daniel

发明人： Jean-Christophe Rostaing , Daniel Guerin , Frederic Noel , Helene Daniel

IPC分类号： C23C16/511 , C23C16/50 , C23C16/42 , C23C16/00 , C23C16/40

CPC分类号： C23C16/511 , H05H1/46 , H05H2001/463

摘要： The invention relates to a method for CVD on a substrate under atmospheric pressure, characterized in that it is assisted by a very-high-frequency plasma generated by a field applicator with an elongated conductor of the micro-ribbon or hollow conducting line type. The invention also relates to the use thereof for applying an electrically conductive inorganic layer on elements of vehicle bodywork, particularly the bumpers.

摘要翻译： 本发明涉及一种在大气压下的基板上CVD的方法，其特征在于，其由具有微带或中空导线类型的细长导体的场施加器产生的非常高频等离子体辅助。本发明还涉及其用于将导电无机层施加在车辆车体的元件上，特别是保险杠上的用途。