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    Substrate edge detection
    2.
    发明授权
    Substrate edge detection 有权
    基板边缘检测

    公开(公告)号：US07153185B1

    公开(公告)日：2006-12-26

    申请号：US10921485

    申请日：2004-08-18

    申请人： Manoocher Birang ,  Jeffrey Drue David ,  Boguslaw A. Swedek

    发明人： Manoocher Birang ,  Jeffrey Drue David ,  Boguslaw A. Swedek

    IPC分类号： B24B49/00 ,  B24B51/00 ,  B24B1/00

    CPC分类号： B24B37/005 ,  B24B49/105 ,  B24B49/12

    摘要： A chemical mechanical polishing apparatus and method can use an eddy current monitoring system and an optical monitoring system. Signals from the monitoring systems can be combined on an output line and extracted by a computer. The eddy current monitoring system or the optical monitoring system can be used to determine the substrate edge. A focusing optic can be used to improve the accuracy of the optical monitoring system in detecting the edge of the substrate.

    摘要翻译： 化学机械抛光装置和方法可以使用涡流监测系统和光学监测系统。 来自监控系统的信号可以组合在输出线上并由计算机提取。 涡流监测系统或光学监测系统可用于确定衬底边缘。 可以使用聚焦光学器件来提高光学监测系统在检测衬底的边缘方面的精度。

    Determination of position of sensor measurements during polishing
    3.
    发明授权
    Determination of position of sensor measurements during polishing 有权
    抛光过程中传感器测量位置的确定

    公开(公告)号：US07097537B1

    公开(公告)日：2006-08-29

    申请号：US10922110

    申请日：2004-08-18

    申请人： Jeffrey Drue David ,  Nils Johansson ,  Manoocher Birang ,  Boguslaw A. Swedek ,  Ingemar Carlsson

    发明人： Jeffrey Drue David ,  Nils Johansson ,  Manoocher Birang ,  Boguslaw A. Swedek ,  Ingemar Carlsson

    IPC分类号： B49D1/00

    CPC分类号： B24B37/013 ,  B24B49/105

    摘要： A chemical mechanical polishing apparatus and method can use an in-situ monitoring system. A measurement of a position of a carrier head and a sinusoidal first function can be used to define a second function that associates measurements from the series with positions on the substrate. For each measurement in a series from the in-situ monitoring system, the second function can be used to determine a position on the substrate where the measurement was taken. In addition, a measurement of the position of the carrier head, a time when the measurement of the substrate property is made, and a phase correction representing lag resulting from a processing delay in generating the measurement of the position of the carrier head can be used in determining a position on the substrate where a measurement of a substrate property was taken.

    摘要翻译： 化学机械抛光装置和方法可以使用原位监测系统。 可以使用载波头位置和正弦第一函数的测量来定义将来自串联的测量与基板上的位置相关联的第二函数。 对于来自原位监测系统的一系列中的每个测量，第二功能可用于确定在测量被测量的基板上的位置。 此外，可以使用载波头的位置的测量，进行基板特性的测量的时间，以及表示在产生载波头的位置的测量的处理延迟时产生的延迟的相位校正 在确定基板特性的测量时在基板上的位置。

    AUTOMATIC SELECTION OF REFERENCE SPECTRA LIBRARY
    7.
    发明申请
    AUTOMATIC SELECTION OF REFERENCE SPECTRA LIBRARY 有权
    自动选择参考光谱库

    公开(公告)号：US20120276814A1

    公开(公告)日：2012-11-01

    申请号：US13095802

    申请日：2011-04-27

    申请人： Jimin Zhang ,  Harry Q. Lee ,  Zhihong Wang ,  Jeffrey Drue David ,  Boguslaw A. Swedek ,  Dominic J. Benvegnu

    发明人： Jimin Zhang ,  Harry Q. Lee ,  Zhihong Wang ,  Jeffrey Drue David ,  Boguslaw A. Swedek ,  Dominic J. Benvegnu

    IPC分类号： B24B51/00

    CPC分类号： B24B37/013 ,  B24B37/042 ,  B24B49/05 ,  B24B49/12 ,  G01J3/28

    摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.

    摘要翻译： 产生参考光谱的计算机实现的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列 在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个 最佳匹配多个序列的剩余序列，并存储确定为提​​供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

    Automatic selection of reference spectra library
    8.
    发明授权
    Automatic selection of reference spectra library 有权
    自动选择参考光谱库

    公开(公告)号：US08755928B2

    公开(公告)日：2014-06-17

    申请号：US13095802

    申请日：2011-04-27

    申请人： Jimin Zhang ,  Harry Q. Lee ,  Zhihong Wang ,  Jeffrey Drue David ,  Boguslaw A. Swedek ,  Dominic J. Benvegnu

    发明人： Jimin Zhang ,  Harry Q. Lee ,  Zhihong Wang ,  Jeffrey Drue David ,  Boguslaw A. Swedek ,  Dominic J. Benvegnu

    IPC分类号： G06F19/24

    CPC分类号： B24B37/013 ,  B24B37/042 ,  B24B49/05 ,  B24B49/12 ,  G01J3/28

    摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.

    摘要翻译： 计算机实现的产生参考光谱的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列 在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个 最佳匹配多个序列的剩余序列，并存储确定为提​​供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

    ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING
    9.
    发明申请
    ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
    在化学机械抛光中在同一板上具有多个区域的多个基板的端点控制

    公开(公告)号：US20110282477A1

    公开(公告)日：2011-11-17

    申请号：US12781654

    申请日：2010-05-17

    申请人： Harry Q. Lee ,  Jimin Zhang ,  Jeffrey Drue David ,  Boguslaw A. Swedek

    发明人： Harry Q. Lee ,  Jimin Zhang ,  Jeffrey Drue David ,  Boguslaw A. Swedek

    IPC分类号： G06F19/00

    CPC分类号： B24B37/013 ,  B24B37/042

    摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.

    摘要翻译： 多个基板在同一抛光垫上同时被抛光。 从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。 对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。 对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域 的至少一个基板在投影时间比没有这种调整更接近于目标指标。