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公开(公告)号：US20060172472A1
公开(公告)日：2006-08-03
申请号：US11395434
申请日：2006-03-30
申请人： Jeong-Young Lee , Se-Hwam Yu , Sang-Jin Jeon , Min-Wook Park
发明人： Jeong-Young Lee , Se-Hwam Yu , Sang-Jin Jeon , Min-Wook Park
CPC分类号： H01L27/12 , G02F1/13458 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/13629 , H01L27/124 , H01L27/1288
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
摘要翻译： 提供一种制造薄膜晶体管阵列面板的方法，包括：在基板上形成栅极线; 在栅极线上依次沉积栅极绝缘层和半导体层; 在半导体层上沉积下导电膜和上导电膜; 对上导电膜，下导电膜和半导体层进行光蚀刻; 沉积钝化层; 对所述钝化层进行光蚀刻以暴露所述上导电膜的第一和第二部分; 去除上导电膜的第一和第二部分以暴露下导电膜的第一和第二部分; 在所述下导电膜的第一部分上形成像素电极; 去除下导电膜的第二部分以暴露半导体层的一部分; 以及在半导体层的暴露部分上形成柱状间隔物。
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公开(公告)号：US07320906B2
公开(公告)日：2008-01-22
申请号：US10922343
申请日：2004-08-19
申请人： Min-Wook Park , Bum-Ki Baek , Jeong-Young Lee , Kwon-Young Choi , Sang-Ki Kwak , Sang-Jin Jeon
发明人： Min-Wook Park , Bum-Ki Baek , Jeong-Young Lee , Kwon-Young Choi , Sang-Ki Kwak , Sang-Jin Jeon
IPC分类号： H01L21/84
CPC分类号： H01L29/41733 , H01L27/124
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
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公开(公告)号：US07459323B2
公开(公告)日：2008-12-02
申请号：US11512805
申请日：2006-08-30
申请人： Min-Wook Park , Sang-Jin Jeon , Jung-Joon Park , Jeong-Young Lee , Bum-Ki Baek , Se-Hwan Yu , Sang-Ki Kwak , Han-Ju Lee , Kwon-Young Choi
发明人： Min-Wook Park , Sang-Jin Jeon , Jung-Joon Park , Jeong-Young Lee , Bum-Ki Baek , Se-Hwan Yu , Sang-Ki Kwak , Han-Ju Lee , Kwon-Young Choi
IPC分类号： H01L21/00
CPC分类号： G02F1/1368 , G02F1/1339
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode and a pair of redundant electrodes on the first and the second portions of the lower conductive film, respectively, the redundant electrodes exposing a part of the second portion of the lower conductive film; removing the exposed part of the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
摘要翻译： 提供一种制造薄膜晶体管阵列面板的方法，包括：在基板上形成栅极线; 在栅极线上依次沉积栅极绝缘层和半导体层; 在半导体层上沉积下导电膜和上导电膜; 对上导电膜，下导电膜和半导体层进行光蚀刻; 沉积钝化层; 对所述钝化层进行光蚀刻以暴露所述上导电膜的第一和第二部分; 去除上导电膜的第一和第二部分以暴露下导电膜的第一和第二部分; 在下导电膜的第一和第二部分上形成像素电极和一对冗余电极，所述冗余电极暴露下导电膜的第二部分的一部分; 去除下导电膜的第二部分的暴露部分以暴露半导体层的一部分; 以及在半导体层的暴露部分上形成柱状间隔物。
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公开(公告)号：US07358123B2
公开(公告)日：2008-04-15
申请号：US11395434
申请日：2006-03-30
申请人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
发明人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
IPC分类号： H01L21/00
CPC分类号： H01L27/12 , G02F1/13458 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/13629 , H01L27/124 , H01L27/1288
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
摘要翻译： 提供一种制造薄膜晶体管阵列面板的方法，包括：在基板上形成栅极线; 在栅极线上依次沉积栅极绝缘层和半导体层; 在半导体层上沉积下导电膜和上导电膜; 对上导电膜，下导电膜和半导体层进行光蚀刻; 沉积钝化层; 对所述钝化层进行光蚀刻以暴露所述上导电膜的第一和第二部分; 去除上导电膜的第一和第二部分以暴露下导电膜的第一和第二部分; 在所述下导电膜的第一部分上形成像素电极; 去除下导电膜的第二部分以暴露半导体层的一部分; 以及在半导体层的暴露部分上形成柱状间隔物。
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公开(公告)号：US20060289965A1
公开(公告)日：2006-12-28
申请号：US11512805
申请日：2006-08-30
申请人： Min-Wook Park , Sang-Jin Jeon , Jung-Joon Park , Jeong-Young Lee , Bum-Ki Baek , Se-Hwan Yu , Sang-Ki Kwak , Han-Ju Lee , Kwon-Young Choi
发明人： Min-Wook Park , Sang-Jin Jeon , Jung-Joon Park , Jeong-Young Lee , Bum-Ki Baek , Se-Hwan Yu , Sang-Ki Kwak , Han-Ju Lee , Kwon-Young Choi
IPC分类号： H01L27/082 , H01L27/102 , H01L29/70 , H01L31/11
CPC分类号： G02F1/1368 , G02F1/1339
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode and a pair of redundant electrodes on the first and the second portions of the lower conductive film, respectively, the redundant electrodes exposing a part of the second portion of the lower conductive film; removing the exposed part of the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
摘要翻译： 提供一种制造薄膜晶体管阵列面板的方法，包括：在基板上形成栅极线; 在栅极线上依次沉积栅极绝缘层和半导体层; 在半导体层上沉积下导电膜和上导电膜; 对上导电膜，下导电膜和半导体层进行光蚀刻; 沉积钝化层; 对所述钝化层进行光蚀刻以暴露所述上导电膜的第一和第二部分; 去除上导电膜的第一和第二部分以暴露下导电膜的第一和第二部分; 在下导电膜的第一和第二部分上形成像素电极和一对冗余电极，所述冗余电极暴露下导电膜的第二部分的一部分; 去除下导电膜的第二部分的暴露部分以暴露半导体层的一部分; 以及在半导体层的暴露部分上形成柱状间隔物。
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公开(公告)号：US07119368B2
公开(公告)日：2006-10-10
申请号：US10926719
申请日：2004-08-26
申请人： Min-Wook Park , Sang-Jin Jeon , Jung-Joon Park , Jeong-Young Lee , Bum-Ki Baek , Se-Hwan Yu , Sang-Ki Kwak , Han-Ju Lee , Kwon-Young Choi
发明人： Min-Wook Park , Sang-Jin Jeon , Jung-Joon Park , Jeong-Young Lee , Bum-Ki Baek , Se-Hwan Yu , Sang-Ki Kwak , Han-Ju Lee , Kwon-Young Choi
IPC分类号： H01L31/0376
CPC分类号： G02F1/1368 , G02F1/1339
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode and a pair of redundant electrodes on the first and the second portions of the lower conductive film, respectively, the redundant electrodes exposing a part of the second portion of the lower conductive film; removing the exposed part of the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
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公开(公告)号：US07023016B2
公开(公告)日：2006-04-04
申请号：US10884083
申请日：2004-07-01
申请人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
发明人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
IPC分类号： H01L29/04
CPC分类号： H01L27/12 , G02F1/13458 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/13629 , H01L27/124 , H01L27/1288
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
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公开(公告)号：US20050110014A1
公开(公告)日：2005-05-26
申请号：US10922343
申请日：2004-08-19
申请人： Min-Wook Park , Bum-Ki Baek , Jeong-Young Lee , Kwon-Young Choi , Sang-Ki Kwak , Sang-Jin Jeon
发明人： Min-Wook Park , Bum-Ki Baek , Jeong-Young Lee , Kwon-Young Choi , Sang-Ki Kwak , Sang-Jin Jeon
IPC分类号： G02F1/1339 , G02F1/136 , G02F1/1368 , G09F9/00 , G09F9/30 , H01L21/00 , H01L21/3205 , H01L21/3213 , H01L21/336 , H01L21/77 , H01L21/84 , H01L23/52 , H01L29/417 , H01L29/786 , H01L31/036
CPC分类号： H01L29/41733 , H01L27/124
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
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公开(公告)号：US07960732B2
公开(公告)日：2011-06-14
申请号：US12082495
申请日：2008-04-11
申请人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
发明人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
IPC分类号： H01L29/04
CPC分类号： H01L27/12 , G02F1/13458 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/13629 , H01L27/124 , H01L27/1288
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
摘要翻译： 提供一种制造薄膜晶体管阵列面板的方法，包括：在基板上形成栅极线; 在栅极线上依次沉积栅极绝缘层和半导体层; 在半导体层上沉积下导电膜和上导电膜; 对上导电膜，下导电膜和半导体层进行光蚀刻; 沉积钝化层; 对所述钝化层进行光蚀刻以暴露所述上导电膜的第一和第二部分; 去除上导电膜的第一和第二部分以暴露下导电膜的第一和第二部分; 在所述下导电膜的第一部分上形成像素电极; 去除下导电膜的第二部分以暴露半导体层的一部分; 以及在半导体层的暴露部分上形成柱状间隔物。
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公开(公告)号：US20080191212A1
公开(公告)日：2008-08-14
申请号：US12082495
申请日：2008-04-11
申请人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
发明人： Jeong-Young Lee , Se-Hwan Yu , Sang-Jin Jeon , Min-Wook Park
IPC分类号： H01L29/04
CPC分类号： H01L27/12 , G02F1/13458 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/13629 , H01L27/124 , H01L27/1288
摘要： A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
摘要翻译： 提供一种制造薄膜晶体管阵列面板的方法，包括：在基板上形成栅极线; 在栅极线上依次沉积栅极绝缘层和半导体层; 在半导体层上沉积下导电膜和上导电膜; 对上导电膜，下导电膜和半导体层进行光蚀刻; 沉积钝化层; 对所述钝化层进行光蚀刻以暴露所述上导电膜的第一和第二部分; 去除上导电膜的第一和第二部分以暴露下导电膜的第一和第二部分; 在所述下导电膜的第一部分上形成像素电极; 去除下导电膜的第二部分以暴露半导体层的一部分; 以及在半导体层的暴露部分上形成柱状间隔物。
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