-
公开(公告)号：US06764605B2
公开(公告)日：2004-07-20
申请号：US10061923
申请日：2002-01-31
申请人： Jeremy Donaldson , Naoto A. Kawamura , Daniel A. Kearl , Donald J. Milligan , J. Daniel Smith , Martha A. Truninger , Diane Lai , Norman L. Johnson , William Edwards , Sadiq Bengali , Timothy R. Emery
发明人： Jeremy Donaldson , Naoto A. Kawamura , Daniel A. Kearl , Donald J. Milligan , J. Daniel Smith , Martha A. Truninger , Diane Lai , Norman L. Johnson , William Edwards , Sadiq Bengali , Timothy R. Emery
IPC分类号： C03C1500
CPC分类号： B41J2/17513 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1642
摘要： In one embodiment, a fluid ejection device comprises a substrate having a fluid slot defined from a first surface through to a second opposite surface; an ejection element formed over the first surface and that ejects fluid therefrom; and a filter having feed holes positioned over the fluid slot near the first surface. Fluid moves from the second surface through the feed holes to the ejection element. In a particular embodiment, the filter is formed of a first material that is surrounded by a second material. In another particular embodiment, the filter is formed from the back side and is formed of the same material as the substrate.
摘要翻译： 在一个实施例中，流体喷射装置包括具有从第一表面到第二相对表面限定的流体槽的基板; 形成在所述第一表面上并从其喷出流体的喷射元件; 以及具有位于第一表面附近的流体槽上方的进料孔的过滤器。 流体从第二表面通过进料孔移动到喷射元件。 在特定实施例中，过滤器由被第二材料包围的第一材料形成。 在另一特定实施例中，过滤器由背面形成并且由与基底相同的材料形成。
-
公开(公告)号：US06475402B2
公开(公告)日：2002-11-05
申请号：US09798477
申请日：2001-03-02
申请人： Terry V. Nordstrom , Timothy R. Emery , Sadiq Bengali , Victorio A. Chavarria , Michael G. Monroe , George Radominski
发明人： Terry V. Nordstrom , Timothy R. Emery , Sadiq Bengali , Victorio A. Chavarria , Michael G. Monroe , George Radominski
IPC分类号： B41J216
CPC分类号： B41J2/1628 , B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1632
摘要： An ink-jet printhead fabrication process and product that uses selectivity rate controlled etch techniques to produce trenches on the frontside of a silicon substrate to define ink feed channels and resistor support regions. Location and size of features is made independent of etch rate by providing a selective etch for the silicon trench etch steps that is greater than 10,000:1 for the silicon:oxide that defines ink feed channels and resistor support areas.
摘要翻译： 一种喷墨打印头制造工艺和产品，其使用选择率控制蚀刻技术在硅衬底的前侧上产生沟槽以限定油墨供给通道和电阻器支撑区域。 通过为限定供墨通道和电阻器支撑区域的硅：氧化物大于10,000:1的硅沟槽蚀刻步骤提供选择性蚀刻，使特征的位置和尺寸独立于蚀刻速率。
-
公开(公告)号：US06599761B2
公开(公告)日：2003-07-29
申请号：US09917067
申请日：2001-07-26
申请人： Jeffery S. Hess , Steven D. Leith , Donald W. Schulte , William Edwards , Jeffrey S. Obert , Timothy R. Emery
发明人： Jeffery S. Hess , Steven D. Leith , Donald W. Schulte , William Edwards , Jeffrey S. Obert , Timothy R. Emery
IPC分类号： H01L2100
CPC分类号： H01L21/67253 , B41J2/16 , B41J2/1626 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A through-substrate etching process is monitored by providing a sacrificial electrode in proximity to a desired etch window on the substrate. An etch process is performed on the substrate. The etch process is monitored by measuring an electrical property of either the substrate or the sacrificial electrode or both.
-
4.发明授权Discharge of MEM devices having charge induced via focused beam to enter different states 失效具有通过聚焦光束诱导的电荷进入不同状态的MEM器件的放电公开(公告)号：US07268933B2
公开(公告)日：2007-09-11
申请号：US11115790
申请日：2005-04-27
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , G09G3/002 , G09G3/346 , G09G2320/043 , G09G2360/141 , H04N5/7416
摘要： An apparatus includes micro-electromechanical (MEM) devices, a charge source, and a discharge mechanism. Each MEM device has different states based on a charged induced thereon. The charge source is to induce the charge thereon such that the MEM devices each enter one of the different states thereof. The discharge mechanism for the MEM devices is to discharge the induced thereon. The discharge mechanism includes one of a resistor for each MEM device and an ultraviolet (UV) light source. The resistor is to discharge the charge on its MEM device to ground. The UV light source is to emit photons onto the MEM devices, such that the photons discharge the charge on the MEM devices via photoelectric effect.
摘要翻译： 一种装置包括微机电（MEM）装置，电荷源和放电机构。 每个MEM器件基于其上引入的电荷而具有不同的状态。 电荷源是在其上诱导电荷，使得MEM器件各自进入其不同状态之一。 用于MEM器件的放电机构是在其上放电。 放电机构包括用于每个MEM器件的电阻器和紫外线（UV）光源之一。 电阻器将其MEM器件上的电荷放电到地。 UV光源将光子发射到MEM器件上，使得光子通过光电效应对MEM器件上的电荷进行放电。
-
公开(公告)号：US20090127225A1
公开(公告)日：2009-05-21
申请号：US12356942
申请日：2009-01-21
IPC分类号： B44C1/22
CPC分类号： B41J2/1626 , B41J2/1603
摘要： Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
摘要翻译： 通过将检测器元件邻近待蚀刻材料的一部分定位来确定材料中蚀刻程度的方法和装置。 元素的宽度不同。 在蚀刻该部分时测量元件的电阻。
-
公开(公告)号：US20130162724A1
公开(公告)日：2013-06-27
申请号：US13332797
申请日：2011-12-21
CPC分类号： B41J2/1603 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1642 , B41J2/1646 , H01C7/006 , H01C17/075 , H01L28/24
摘要： In an embodiment, a method of fabricating a fluid ejection device includes forming a resistor on the front side of a substrate, depositing a dielectric film on the resistor to protect the resistor from chemical exposure during a slot formation process, and forming a slot in the substrate that extends from the back side to the front side of the substrate.
摘要翻译： 在一个实施例中，制造流体喷射装置的方法包括在衬底的正面上形成电阻器，在电阻器上沉积电介质膜，以在缝隙形成过程中保护电阻器免受化学暴露，并在 衬底，其从衬底的背面延伸到前侧。
-
公开(公告)号：US07334871B2
公开(公告)日：2008-02-26
申请号：US10810270
申请日：2004-03-26
摘要： The described embodiments relate to fluid-ejection devices and methods of forming same. One exemplary embodiment includes a plurality of fluid drop generators and associated electrically conductive paths, and at least one electron beam generation assembly configured to selectively direct at least one electron beam at individual electrically conductive paths sufficiently to cause fluid to be ejected from an associated fluid drop generator.
摘要翻译： 所描述的实施例涉及流体喷射装置及其形成方法。 一个示例性实施例包括多个流体液滴发生器和相关联的导电路径，以及至少一个电子束产生组件，被配置为在各个导电路径下选择性地引导至少一个电子束，以使流体从相关联的液滴 发电机。
-
公开(公告)号：US08727499B2
公开(公告)日：2014-05-20
申请号：US13332797
申请日：2011-12-21
CPC分类号： B41J2/1603 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1642 , B41J2/1646 , H01C7/006 , H01C17/075 , H01L28/24
摘要： In an embodiment, a method of fabricating a fluid ejection device includes forming a resistor on the front side of a substrate, depositing a dielectric film on the resistor to protect the resistor from chemical exposure during a slot formation process, and forming a slot in the substrate that extends from the back side to the front side of the substrate.
摘要翻译： 在一个实施例中，制造流体喷射装置的方法包括在衬底的正面上形成电阻器，在电阻器上沉积电介质膜，以在缝隙形成过程中保护电阻器免受化学暴露，并在 衬底，其从衬底的背面延伸到前侧。
-
公开(公告)号：US08173032B2
公开(公告)日：2012-05-08
申请号：US12356942
申请日：2009-01-21
IPC分类号： B44C1/22
CPC分类号： B41J2/1626 , B41J2/1603
摘要： Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
摘要翻译： 通过将检测器元件邻近待蚀刻材料的一部分定位来确定材料中蚀刻程度的方法和装置。 元素的宽度不同。 在蚀刻该部分时测量元件的电阻。
-
10.发明授权Discharge of MEM devices having charge induced via focused beam to enter different states 失效具有通过聚焦光束诱导的电荷进入不同状态的MEM器件的放电公开(公告)号：US07535619B2
公开(公告)日：2009-05-19
申请号：US11831797
申请日：2007-07-31
CPC分类号： G02B26/0833 , G02B26/0841 , H04N9/312
摘要： An apparatus includes micro-electromechanical (MEM) devices, a charge source, and a discharge mechanism. Each MEM device has different states based on a charged induced thereon. The charge source is to induce the charge thereon such that the MEM devices each enter one of the different states thereof. The discharge mechanism for the MEM devices is to discharge the induced thereon. The discharge mechanism includes one of a resistor for each MEM device and an ultraviolet (UV) light source. The resistor is to discharge the charge on its MEM device to ground. The UV light source is to emit photons onto the MEM devices, such that the photons discharge the charge on the MEM devices via photoelectric effect.
摘要翻译： 一种装置包括微机电（MEM）装置，电荷源和放电机构。 每个MEM器件基于其上引入的电荷而具有不同的状态。 电荷源是在其上诱导电荷，使得MEM器件各自进入其不同状态之一。 用于MEM器件的放电机构是在其上放电。 放电机构包括用于每个MEM器件的电阻器和紫外线（UV）光源之一。 电阻器将其MEM器件上的电荷放电到地。 UV光源将光子发射到MEM器件上，使得光子通过光电效应对MEM器件上的电荷进行放电。
-
-
-
-
-
-
-
-
-
搜索结果
14 条记录 (耗时 0.041 秒)
