公开(公告)号：US07235188B2

公开(公告)日：2007-06-26

申请号：US10688900

申请日：2003-10-21

申请人： Jerome Daviot ,  Christopher Reid ,  Douglas Holmes

发明人： Jerome Daviot ,  Christopher Reid ,  Douglas Holmes

IPC分类号： C09K13/00

CPC分类号： H01L21/02071 ,  C11D7/06 ,  C11D7/08 ,  C11D7/3218 ,  C11D7/3227 ,  C11D7/3281 ,  C11D11/0047

摘要： The present invention relates to dilute aqueous solutions containing phosphoric acid and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The solution according to the invention may advantageous contain an alkaline compound, one or more other acid compounds, and/or a fluoride-containing compound and may optionally contain additional components such as organic solvents, chelating agents, amines, and/or surfactants.

摘要翻译： 本发明涉及含有磷酸的稀释水溶液和用于从包括这种稀水溶液的半导体衬底清洗等离子体蚀刻残留物的方法。 根据本发明的溶液可以有利地含有碱性化合物，一种或多种其它酸化合物和/或含氟化合物，并且可以任选地含有另外的组分如有机溶剂，螯合剂，胺和/或表面活性剂。

公开(公告)号：US20050202987A1

公开(公告)日：2005-09-15

申请号：US10920494

申请日：2004-08-17

申请人： Robert Small ,  Bakul Patel ,  Wai Mun Lee ,  Douglas Holmes ,  Jerome Daviot ,  Chris Reid

发明人： Robert Small ,  Bakul Patel ,  Wai Mun Lee ,  Douglas Holmes ,  Jerome Daviot ,  Chris Reid

IPC分类号： C09K13/08 ,  G03F7/42 ,  H01L21/02 ,  H01L21/306 ,  H01L21/311 ,  C11D1/00

CPC分类号： H01L21/02071 ,  C09K13/08 ,  G03F7/423 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02063 ,  H01L21/31133

摘要： A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

摘要翻译： 一种用于剥离光致抗蚀剂的组合物，以及用于清洁底物的残留物和用于氧化硅蚀刻的组合物，其包含约0.01重量％至约10重量％的一种或多种氟化物，约10重量％至约95重量％ 重量百分比的亚砜或砜溶剂，和约20％至约50％重​​量的水。 组合物可以含有腐蚀抑制剂，螯合剂，助溶剂，碱性胺化合物，表面活性剂，酸和碱。

公开(公告)号：US07456140B2

公开(公告)日：2008-11-25

申请号：US10920494

申请日：2004-08-17

申请人： Robert J. Small ,  Bakul P. Patel ,  Wai Mun Lee ,  Douglas Holmes ,  Jerome Daviot ,  Chris Reid

发明人： Robert J. Small ,  Bakul P. Patel ,  Wai Mun Lee ,  Douglas Holmes ,  Jerome Daviot ,  Chris Reid

IPC分类号： C11D7/50

CPC分类号： H01L21/02071 ,  C09K13/08 ,  G03F7/423 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02063 ,  H01L21/31133

摘要： A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

摘要翻译： 一种用于剥离光致抗蚀剂的组合物，以及用于清洁底物的残留物和用于氧化硅蚀刻的组合物，其包含约0.01重量％至约10重量％的一种或多种氟化物，约10重量％至约95重量％ 重量百分比的亚砜或砜溶剂，和约20％至约50％重​​量的水。 组合物可以含有腐蚀抑制剂，螯合剂，助溶剂，碱性胺化合物，表面活性剂，酸和碱。

公开(公告)号：US07012051B2

公开(公告)日：2006-03-14

申请号：US10257469

申请日：2001-04-12

申请人： Jerome Daviot ,  Stanley Affrossman ,  Douglas Holmes

发明人： Jerome Daviot ,  Stanley Affrossman ,  Douglas Holmes

IPC分类号： C11D3/30 ,  C11D3/20

CPC分类号： H01L21/02071 ,  C09D9/00 ,  G03F7/425 ,  H01L21/02063 ,  H01L21/31138

摘要： A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R1 and R3 are each independently selected from H, OH, CO2H, halogen, C1–C3 alkyl, C1–C3 alkoxy or (CH2)nOH wherein n is 1, 2 or 3; and R2 is selected from C9–C16 alkyl, or C9–C16 alkoxy

摘要翻译： 用于从包含钛或其合金的基底去除抗蚀剂，聚合物材料和/或蚀刻残留物的组合物，所述组合物包含羟胺或其衍生物和至少一种具有通式（I）的化合物，其中：R 1 R 3和R 3各自独立地选自H，OH，CO 2 H，卤素，C 1 -C 3烷基， 3个C 1 -C 3烷基，C 1 -C 3烷氧基或（CH 2 CH 2）n OH其中n 是1，2或3; 并且R 2选自C 9 -C 16烷基或C 9 -C 16烷基 烷氧基

公开(公告)号：US06777380B2

公开(公告)日：2004-08-17

申请号：US09903064

申请日：2001-07-10

申请人： Robert J. Small ,  Bakul P. Patel ,  Wai Mun Lee ,  Douglas Holmes ,  Jerome Daviot ,  Chris Reid

发明人： Robert J. Small ,  Bakul P. Patel ,  Wai Mun Lee ,  Douglas Holmes ,  Jerome Daviot ,  Chris Reid

IPC分类号： G03C500

CPC分类号： G03F7/423 ,  C09K13/08 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02052 ,  H01L21/02063 ,  H01L21/02071 ,  H01L21/31111 ,  H01L21/31133

摘要： A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

摘要翻译： 一种用于剥离光致抗蚀剂的组合物，以及用于清洁底物的残留物和用于氧化硅蚀刻的组合物，其包含约0.01重量％至约10重量％的一种或多种氟化物，约10重量％至约95重量％ 重量百分比的亚砜或砜溶剂，和约20％至约50％重​​量的水。 组合物可以含有腐蚀抑制剂，螯合剂，助溶剂，碱性胺化合物，表面活性剂，酸和碱。

公开(公告)号：US5021741A

公开(公告)日：1991-06-04

申请号：US507768

申请日：1990-04-12

申请人： Michael G. Kornely, Jr. ,  Douglas Holmes ,  Robert G. Micich

发明人： Michael G. Kornely, Jr. ,  Douglas Holmes ,  Robert G. Micich

IPC分类号： H01J9/24 ,  H01J23/00 ,  H05H7/02

CPC分类号： H05H7/02 ,  H01J23/005 ,  H01J9/24

摘要： A linear accelerator drift tube is formed by a casting technique. Coolant circualting grooves are integrally formed in the central body of the drift tube as well as face plates. This minimizes the temperature of the drift tube in an operating environment thereby maximizing the R.F. efficiency of the unit. The face plates are attached to the central body of the drift tube by means of a solder/electroform joining. The stem of the drift tube includes concentric passages integrally formed in the cast central body which enables efficient circulation of coolant through the drift tube.

摘要翻译： 通过铸造技术形成线性加速器漂移管。 冷却剂循环槽一体地形成在漂移管的中心体以及面板中。 这使得在操作环境中漂移管的温度最小化，从而使R.F. 单位的效率。 面板通过焊料/电铸连接件附接到漂移管的中心体。 漂移管的杆包括一体地形成在铸造中心体中的同心通道，其使得冷却剂能够有效地循环穿过漂移管。

公开(公告)号：US4829693A

公开(公告)日：1989-05-16

申请号：US930888

申请日：1986-11-17

申请人： Douglas Holmes

发明人： Douglas Holmes

IPC分类号： F41A9/83

CPC分类号： F41A9/83

摘要： A first embodiment of an ammunition clip reloading device comprises an L-shaped member attachable to the pin associated with the spring of a conventional clip. An outwardly extending portion of the member is designed to receive the thumb of a user so as to depress the clip spring to thus make the loading of ammunition substantially easier. A second embodiment of the invention comprises a thumb manipulated slide member positionable over a conventional ammunition clip. An adjustable guide extends above the body portion of the member and is operable to push a bullet into the clip in response to a downward pressure by the user's thumb.

摘要翻译： 弹药夹重装装置的第一实施例包括可附接到与常规夹子的弹簧相关联的销的L形构件。 该构件的向外延伸的部分被设计成接收使用者的拇指以便按压夹子弹簧，从而使弹药的装载更加容易。 本发明的第二实施例包括可以定位在常规弹药夹上的拇指操纵的滑动构件。 可调节引导件在构件的主体部分上方延伸，并且可操作以响应于使用者的拇指的向下的压力将子弹推入夹子。