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公开(公告)号:US20130209672A1
公开(公告)日:2013-08-15
申请号:US13763223
申请日:2013-02-08
IPC分类号: H05K3/00
CPC分类号: H05K3/0094 , B81B2201/0235 , B81B2207/096 , B81C1/00301 , H01L21/743 , H01L21/76898 , H01L2224/02372 , H01L2224/0401 , H01L2224/04042 , H01L2224/05548 , H01L2924/1461 , H05K3/4061 , H05K2201/09563 , H01L2924/00
摘要: A method for manufacturing a component having a through-connection. The method includes providing a semiconductor substrate, forming a recess in the semiconductor substrate, and introducing into the recess a pourable starting material which has a metal. The method furthermore includes carrying out a heating process, an electrically conductive structure forming the through-connection being developed from the pourable starting material.
摘要翻译: 一种用于制造具有通过连接的部件的方法。 该方法包括提供半导体衬底,在半导体衬底中形成凹陷,并将具有金属的可倾倒起始材料引入凹槽中。 该方法还包括进行加热过程,形成从可倾倒起始材料形成的贯通连接的导电结构。