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公开(公告)号:US20060110943A1
公开(公告)日:2006-05-25
申请号:US11212503
申请日:2005-08-24
申请人: Johan Swerts , Hilde De Witte , Jan Maes , Christophe Pomarede , Ruben Haverkort , Yuet Wan , Marinus De Blank , Cornelius Van Der Jeugd , Jacobus Beulens
发明人: Johan Swerts , Hilde De Witte , Jan Maes , Christophe Pomarede , Ruben Haverkort , Yuet Wan , Marinus De Blank , Cornelius Van Der Jeugd , Jacobus Beulens
IPC分类号: H01L21/31
CPC分类号: H01L21/28194 , C23C16/345 , C23C16/452 , C23C16/45523 , C23C16/45578 , C23C16/515 , H01L21/02381 , H01L21/02422 , H01L21/02532 , H01L21/0262 , H01L21/28202 , H01L21/28211 , H01L21/3141 , H01L21/3144 , H01L21/3145 , H01L21/3148 , H01L21/3185 , H01L29/518
摘要: A nitrogen precursor that has been activated by exposure to a remotely excited species is used as a reactant to form nitrogen-containing layers. The remotely excited species can be, e.g., N2, Ar, and/or He, which has been excited in a microwave radical generator. Downstream of the microwave radical generator and upstream of the substrate, the flow of excited species is mixed with a flow of NH3. The excited species activates the NH3. The substrate is exposed to both the activated NH3 and the excited species. The substrate can also be exposed to a precursor of another species to form a compound layer in a chemical vapor deposition. In addition, already-deposited layers can be nitrided by exposure to the activated NH3 and to the excited species, which results in higher levels of nitrogen incorporation than plasma nitridation using excited N2 alone, or thermal nitridation using NH3 alone, with the same process temperatures and nitridation durations.
摘要翻译: 通过暴露于远程激发的物质而活化的氮前体被用作形成含氮层的反应物。 远程激发的物质可以是例如已经在微波自由基发生器中被激发的N 2,Ar和/或He。 微波自由基发生器下游和衬底上游,受激物质的流动与NH 3 3流混合。 激发的物质激活NH 3。 底物暴露于活化的NH 3和被激发的物质。 衬底也可以暴露于另一物质的前体,以在化学气相沉积中形成化合物层。 此外,已经沉积的层可以通过暴露于活化的NH 3和所激发的物质而被氮化,这导致使用激发的N 2 O 3的等离子体氮化导致更高的氮掺入水平, 单独使用NH 3或单独使用相同工艺温度和氮化持续时间的氮化。
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公开(公告)号:US07629270B2
公开(公告)日:2009-12-08
申请号:US11212503
申请日:2005-08-24
申请人: Johan Swerts , Hilde De Witte , Jan Willem Maes , Christophe F. Pomarede , Ruben Haverkort , Yuet Mei Wan , Marinus J. De Blank , Cornelius A. Van Der Jeugd , Jacobus Johannes Beulens
发明人: Johan Swerts , Hilde De Witte , Jan Willem Maes , Christophe F. Pomarede , Ruben Haverkort , Yuet Mei Wan , Marinus J. De Blank , Cornelius A. Van Der Jeugd , Jacobus Johannes Beulens
IPC分类号: H01L21/31
CPC分类号: H01L21/28194 , C23C16/345 , C23C16/452 , C23C16/45523 , C23C16/45578 , C23C16/515 , H01L21/02381 , H01L21/02422 , H01L21/02532 , H01L21/0262 , H01L21/28202 , H01L21/28211 , H01L21/3141 , H01L21/3144 , H01L21/3145 , H01L21/3148 , H01L21/3185 , H01L29/518
摘要: A nitrogen precursor that has been activated by exposure to a remotely excited species is used as a reactant to form nitrogen-containing layers. The remotely excited species can be, e.g., N2, Ar, and/or He, which has been excited in a microwave radical generator. Downstream of the microwave radical generator and upstream of the substrate, the flow of excited species is mixed with a flow of NH3. The excited species activates the NH3. The substrate is exposed to both the activated NH3 and the excited species. The substrate can also be exposed to a precursor of another species to form a compound layer in a chemical vapor deposition. In addition, already-deposited layers can be nitrided by exposure to the activated NH3 and to the excited species, which results in higher levels of nitrogen incorporation than plasma nitridation using excited N2 alone, or thermal nitridation using NH3 alone, with the same process temperatures and nitridation durations.
摘要翻译: 通过暴露于远程激发的物质而活化的氮前体被用作形成含氮层的反应物。 远程激发的物质可以是例如已经在微波自由基发生器中激发的N 2,Ar和/或He。 在微波自由基发生器的下游和衬底的上游,受激物质的流动与NH 3流混合。 激发的物质激活NH3。 底物暴露于活化的NH 3和被激发的物质。 衬底也可以暴露于另一物质的前体,以在化学气相沉积中形成化合物层。 此外,已经沉积的层可以通过暴露于活化的NH 3和被激发的物质而被氮化,这导致比等离子体氮化更高的氮掺入水平,使用单独的使用激发的N 2,或者使用单独的NH 3进行热氮化,具有相同的工艺温度 和氮化时间。
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