Sealing structure and method of manufacturing the same
    1.
    发明授权
    Sealing structure and method of manufacturing the same 有权
    密封结构及其制造方法

    公开(公告)号:US08592228B2

    公开(公告)日:2013-11-26

    申请号:US12515590

    申请日:2007-11-15

    IPC分类号: H01L21/00

    摘要: A method of manufacturing a structure (1100), the method comprising forming a cap element (401) on a substrate (101), removing material (103) of the substrate (101) below the cap element (401) to thereby form a gap (802) between the cap element (401) and the substrate (101), and rearranging material of the cap element (401) and/or of the substrate (101) to thereby merge the cap element (401) and the substrate (101) to bridge the gap (802).

    摘要翻译: 一种制造结构(1100)的方法,所述方法包括在基板(101)上形成盖元件(401),在盖元件(401)下方去除基板(101)的材料(103),从而形成间隙 (401)和基板(101)之间的盖(802)和盖元件(401)和/或基板(101)的重新排列材料,从而合并盖元件(401)和基板(101) )弥合差距(802)。

    A SEALING STRUCTURE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    A SEALING STRUCTURE AND METHOD OF MANUFACTURING THE SAME 有权
    密封结构及其制造方法

    公开(公告)号:US20100052081A1

    公开(公告)日:2010-03-04

    申请号:US12515590

    申请日:2007-11-15

    IPC分类号: H01L29/84 H01L21/306

    摘要: A method of manufacturing a structure (1100), the method comprising forming a cap element (401) on a substrate (101), removing material (103) of the substrate (101) below the cap element (401) to thereby form a gap (802) between the cap element (401) and the substrate (101), and rearranging material of the cap element (401) and/or of the substrate (101) to thereby merge the cap element (401) and the substrate (101) to bridge the gap (802).

    摘要翻译: 一种制造结构(1100)的方法,所述方法包括在基板(101)上形成盖元件(401),在盖元件(401)下方去除基板(101)的材料(103),从而形成间隙 (401)和基板(101)之间的盖(802)和盖元件(401)和/或基板(101)的重新排列材料,从而合并盖元件(401)和基板(101) )弥合差距(802)。

    Semiconductor device and method of manufacturing such a device
    3.
    发明授权
    Semiconductor device and method of manufacturing such a device 有权
    半导体装置及其制造方法

    公开(公告)号:US08373236B2

    公开(公告)日:2013-02-12

    申请号:US12304506

    申请日:2007-06-12

    IPC分类号: H01L27/06

    摘要: The invention relates to a semiconductor device (10) with a substrate (11) and a semiconductor body (1) comprising a bipolar transistor with in that order a collector region (2), a base region (3), and an emitter region (4), wherein the semiconductor body comprises a projecting mesa (5) comprising at least a portion of the collector region (2) and the base region (3), which mesa is surrounded by an isolation region (6). According to the invention, the semiconductor device (10) also comprises a field effect transistor with a source region, a drain region, an interposed channel region, a superimposed gate dielectric (7), and a gate region (8), which gate region (8) forms a highest part of the field effect transistor, and the height of the mesa (5) is greater than the height of the gate region (8). This device can be manufactured inexpensively and easily by a method according to the invention, and the bipolar transistor can have excellent high-frequency characteristics.

    摘要翻译: 本发明涉及具有基板(11)和半导体本体(1)的半导体器件(10),该半导体器件(1)包括双极晶体管,依次具有集电极区域(2),基极区域(3)和发射极区域 4),其中半导体主体包括包括集电极区域(2)和基极区域(3)的至少一部分的突出台面(5),该台面由隔离区域(6)包围。 根据本发明,半导体器件(10)还包括具有源极区域,漏极区域,插入沟道区域,叠加栅极电介质(7)和栅极区域(8)的场效应晶体管,该栅极区域 (8)形成场效应晶体管的最高部分,台面(5)的高度大于栅极区域(8)的高度。 该装置可以通过根据本发明的方法廉价且容易地制造,并且双极晶体管可以具有优异的高频特性。

    Self-aligned epitaxially grown bipolar transistor
    4.
    发明授权
    Self-aligned epitaxially grown bipolar transistor 有权
    自对准外延生长双极晶体管

    公开(公告)号:US07883954B2

    公开(公告)日:2011-02-08

    申请号:US11574013

    申请日:2005-08-19

    IPC分类号: H01L21/8238

    CPC分类号: H01L29/66242 H01L21/8249

    摘要: The illumination system has a light source (1) with a plurality of light emitters (R, G, B). The light emitters comprise at least a first light-emitting diode of a first primary color and at least a second light-emitting diode of a second primary color, the first and the second primary colors being distinct from each other. The illumination system has a facetted light-collimator (2) for collimating light emitted by the light emitters. The facetted lightcollimator is arranged along a longitudinal axis (25) of the illumination system. Light propagation in the facetted light-collimator is based on total internal reflection or on reflection at a reflective coating provided on the facets of the facetted light-collimator. The facetted light-collimator merges into a facetted light-reflector (3) at a side facing away from the light source. The illumination system further comprises a light-shaping diffuser (17). The illumination system emits light with a uniform spatial and spatio-angular color distribution.

    摘要翻译: 照明系统具有具有多个发光体(R,G,B)的光源(1)。 光发射体至少包括第一原色的第一发光二极管和第二原色的至少第二发光二极管,第一和第二原色彼此不同。 照明系统具有用于准直由发光体发射的光的分面光准直器(2)。 分面光学增白器沿照明系统的纵向轴线(25)布置。 在分面光准直仪中的光传播基于全内反射或基于设置在刻面光准直仪的面上的反射涂层的反射。 分面光准直器在远离光源的一侧融合成分面的光反射器(3)。 照明系统还包括光成形漫射器(17)。 照明系统以均匀的空间和空间角色彩分布发光。

    Self-Aligned Epitaxially Grown Bipolar Transistor
    5.
    发明申请
    Self-Aligned Epitaxially Grown Bipolar Transistor 有权
    自对准外延生长双极晶体管

    公开(公告)号:US20090203184A1

    公开(公告)日:2009-08-13

    申请号:US11574013

    申请日:2005-08-19

    IPC分类号: H01L21/331

    CPC分类号: H01L29/66242 H01L21/8249

    摘要: The illumination system has a light source (1) with a plurality of light emitters (R, G, B). The light emitters comprise at least a first light-emitting diode of a first primary color and at least a second light-emitting diode of a second primary color, the first and the second primary colors being distinct from each other. The illumination system has a facetted light-collimator (2) for collimating light emitted by the light emitters. The facetted lightcollimator is arranged along a longitudinal axis (25) of the illumination system. Light propagation in the facetted light-collimator is based on total internal reflection or on reflection at a reflective coating provided on the facets of the facetted light-collimator. The facetted light-collimator merges into a facetted light-reflector (3) at a side facing away from the light source. The illumination system further comprises a light-shaping diffuser (17). The illumination system emits light with a uniform spatial and spatio-angular color distribution.

    摘要翻译: 照明系统具有具有多个发光体(R,G,B)的光源(1)。 光发射体至少包括第一原色的第一发光二极管和第二原色的至少第二发光二极管,第一和第二原色彼此不同。 照明系统具有用于准直由发光体发射的光的分面光准直器(2)。 分面光学增白器沿照明系统的纵向轴线(25)布置。 在分面光准直仪中的光传播基于全内反射或基于设置在刻面光准直仪的面上的反射涂层的反射。 分面光准直器在远离光源的一侧融合成分面的光反射器(3)。 照明系统还包括光成形漫射器(17)。 照明系统以均匀的空间和空间角色彩分布发光。

    Method of manufacturing transistor
    6.
    发明授权
    Method of manufacturing transistor 失效
    制造晶体管的方法

    公开(公告)号:US08202782B2

    公开(公告)日:2012-06-19

    申请号:US12676017

    申请日:2008-08-29

    IPC分类号: H01L21/336

    摘要: A method of manufacturing a transistor (300), the method comprising forming a gate (101) on a substrate (102), forming a spacer (201) on lateral side walls of the gate (101) and on an adjacent portion (202) of the substrate (102), modifying material of the spacer (201) so that the modified spacer (301) covers only a lower portion (303) of the lateral side walls of the gate (101), and providing source/drain regions (301) in the modified spacer (301).

    摘要翻译: 一种制造晶体管(300)的方法,所述方法包括在基板(102)上形成栅极(101),在栅极(101)的侧壁上形成间隔物(201)并在相邻部分(202)上形成 (101)的侧壁的下部(303),并且提供源极/漏极区域(101)的衬底(102)的改性材料, 301)。