摘要:
A lithographic apparatus including an illumination system configured to condition a radiation beam is described. The illumination system includes radiation beam uniformity adjuster for adjusting the uniformity of the radiation beam using segments that are at least partly arranged in the radiation beam and that are mounted on a frame by a torsion bar. The device further includes an actuator configured to rotate the segment in order to change the amount of radiation of the radiation beam that is blocked. The device also includes a first magnetic member mounted on the torsion bar configured to co-operate with a second magnetic member mounted on the frame for generating a position dependent torque about the longitudinal axis that is configured to at least partly compensate a torque exerted on the segment by the torsion bar.
摘要:
A lithographic optical system is presented herein. The optical system comprises a housing with two optically transparent windows and at least one moveable lens therein, as well as at least one other optical element outside said housing. By providing at least one optical element outside the housing, possible deleterious influences thereof on the optical quality of the moveable lens may be diminished. The housing with the moveable lens may be purged, and may be provided with a linear motor and a gas bearing for contactless moving of the lens.
摘要:
A lithographic projection apparatus includes a passive magnetic bearing configured to provide support between a first and second part of the lithographic apparatus and allow both parts to be displaced relative to each other in a direction perpendicular to the support direction. The passive magnetic bearing includes first and second magnetic assemblies. Each magnetic assembly includes at least one permanent magnet.
摘要:
A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing part is at least partly ferromagnetic, and the second bearing part has at least one permanent magnet interacting with the first bearing part for pre-tensioning the gas bearing. The gas bearing may be part of a lithographic apparatus.
摘要:
A positioning device for positioning an object table relative to a reference frame with a drive unit including a first part connectable to the reference frame and a second part for holding the object table is described. The drive unit is constructed to displace the object table in a first direction by generating a force in the first direction on the second part, and a torque acting on the second part about an axis substantially perpendicular to the first direction such that the resulting force of the force and the torque is directed substantially through the center of gravity of the assembly including the object table and the second part.
摘要:
A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate and includes an electromagnetic actuator to actuate a part of the lithographic apparatus in a linear direction or in a rotational direction. The actuator has a substantially stationary part and a movable part interacting with each other. The stationary part has a plurality of coils and a magnetic circuit of magnetizable material, and the movable part has a magnet system. The magnet system has an array of magnets forming a magnet array having opposite ends. The magnet array has an array of primary magnets and an array of subsidiary magnets alternating with the primary magnets. A direction of polarization of an end primary magnet at an end position of the array of primary magnets differs from a direction of polarization of an intermediate primary magnet at an intermediate position between the end primary magnets.
摘要:
A supporting device for supporting in a lithographic projection apparatus a supported part relative to a supporting part, is presented. The supporting device includes a first part that engages the supporting part of the lithographic projection apparatus; a second part that engages the supported part of the lithographic projection apparatus; a supporting spring system disposed between the first part and the second part; and a position control system configured to control a position of the supported part. The position control system comprises at least one reference object that is movable relative to the supporting part; a reference support device that supports the reference object relative to the first part, wherein the reference object and the reference support device form a reference mass-spring system; at least one position sensor that detects at least one attribute of the position of the second part relative to at least one of the reference objects, the position sensor including a sensor output for outputting a position signal representing at least one of the attributes; and an actuator, communicatively coupled to the position sensor, that is configured to adjust the position of the second part relative to the first part, in response to the position signal.