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    Lithographic apparatus and device manufacturing method
    1.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07202934B2

    公开(公告)日：2007-04-10

    申请号：US11015770

    申请日：2004-12-20

    申请人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    发明人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/00

    CPC分类号： G03F7/70933 ,  G03F7/70908

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

    摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

    Lithographic device
    3.
    发明授权
    Lithographic device 有权
    平版印刷设备

    公开(公告)号：US06459472B1

    公开(公告)日：2002-10-01

    申请号：US09302850

    申请日：1999-04-30

    申请人： Pieter Willem Herman De Jager ,  Henri Gerard Cato Werij ,  Peter Van Zuylen

    发明人： Pieter Willem Herman De Jager ,  Henri Gerard Cato Werij ,  Peter Van Zuylen

    IPC分类号： G03B2774

    CPC分类号： G03F7/70933 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70866 ,  G03F7/70916

    摘要： A lithographic device has a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. The projection system is separated from the table by an intervening space which can be at least partially evacuated and which is delimited at the location of the projection system by a mirror from which the employed radiation is directed toward the substrate table. The intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of radiation, the form and size of the tube being such that radiation focused by the de Jager et al. projection system onto the substrate table does not intercept a wall of the hollow tube. A gas flushing unit is provided for continually flushing the inside of the hollow tube with a flow of gas.

    摘要翻译： 平版印刷设备具有用于提供投影射线束的辐射系统; 设置有用于保持面罩的面罩座的面罩台; 设置有用于保持基板的基板保持器的基板台; 以及用于将掩模的照射部分成像到基板的目标部分上的投影系统。 投影系统通过一个可以至少部分抽真空的中间空间与桌子分开，并且通过反射镜在投影系统的位置处被界定，所用的辐射从该反射镜引导到基板台。 中间空间包含位于固体表面和基板台之间的中空管，并且位于辐射路径周围，管的形状和尺寸使得由de Jager等人聚焦的辐射 投影系统不会拦截中空管的壁。 提供一种气体冲洗单元，用于以气流连续冲洗中空管的内部。