公开(公告)号：US07202934B2

公开(公告)日：2007-04-10

申请号：US11015770

申请日：2004-12-20

申请人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

发明人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/00

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

公开(公告)号：US06781673B2

公开(公告)日：2004-08-24

申请号：US09934698

申请日：2001-08-23

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

IPC分类号： G03B2762

CPC分类号： G03F7/70558 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

摘要翻译： 在光刻投影装置中，通过使用电磁场的粒子屏蔽物将诸如掩模的物体与杂散颗粒屏蔽。 这些场可以是均匀的电场，不均匀的电场或光学微风。 颗粒屏蔽固定在面罩支架而不是面罩上。

公开(公告)号：US07361911B2

公开(公告)日：2008-04-22

申请号：US11007579

申请日：2004-12-09

申请人： Johannes Hubertus Josephina Moors ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Vadim Yevgenyevich Banine ,  Gert-Jan Heerens ,  Frederik Theodorus Elisabeth Heuts ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Hendrik Antony Johannes Neerhof

发明人： Johannes Hubertus Josephina Moors ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Vadim Yevgenyevich Banine ,  Gert-Jan Heerens ,  Frederik Theodorus Elisabeth Heuts ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Hendrik Antony Johannes Neerhof

IPC分类号： B21D53/84

CPC分类号： G03F7/70916 ,  G03F7/70883 ,  G03F7/70908

摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.

摘要翻译： 一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在 衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个 隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子 渠道。

公开(公告)号：US07248340B2

公开(公告)日：2007-07-24

申请号：US10874690

申请日：2004-06-24

申请人： Erik Leonardus Ham ,  Robert Gabriël Maria Lansbergen ,  Ellart Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Gert-Jan Heerens

发明人： Erik Leonardus Ham ,  Robert Gabriël Maria Lansbergen ,  Ellart Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Gert-Jan Heerens

IPC分类号： G03B27/42 ,  G03B27/62

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.

摘要翻译： 提出了用于传送平版印刷图案形成装置的传送箱和适于与传送箱配合的光刻设备。 输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。 该箱还包括用于封闭开口的封闭部分，以及用于将气体从箱体内部空间排出和/或送入箱体的内部空间的通道系统。

公开(公告)号：US07151589B2

公开(公告)日：2006-12-19

申请号：US10972755

申请日：2004-10-26

申请人： Erik Leonardus Ham ,  Gert-Jan Heerens ,  Robert Gabriël Maria Lansbergen ,  Ellard Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors

发明人： Erik Leonardus Ham ,  Gert-Jan Heerens ,  Robert Gabriël Maria Lansbergen ,  Ellard Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/32 ,  G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

摘要翻译： 根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。 运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。 在将图案形成装置从内部空间传送到装置之前，内部空间被加压。 箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。 其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

公开(公告)号：US08373846B2

公开(公告)日：2013-02-12

申请号：US12553368

申请日：2009-09-03

申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

公开(公告)号：US08368040B2

公开(公告)日：2013-02-05

申请号：US12832258

申请日：2010-07-08

申请人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

发明人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

IPC分类号： G21K5/04 ,  H01J35/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。

公开(公告)号：US07459690B2

公开(公告)日：2008-12-02

申请号：US11432365

申请日：2006-05-12

申请人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

发明人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

IPC分类号： G01J1/42

CPC分类号： G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

摘要翻译： 公开了一种用于光刻设备的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。

公开(公告)号：US06750949B2

公开(公告)日：2004-06-15

申请号：US10193688

申请日：2002-07-12

申请人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

发明人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。