公开(公告)号：US08585115B2

公开(公告)日：2013-11-19

申请号：US13268129

申请日：2011-10-07

申请人： John Robert Fairhurst ,  Jeffrey E. Krampert ,  Richard J. Hertel ,  Richard Muka

发明人： John Robert Fairhurst ,  Jeffrey E. Krampert ,  Richard J. Hertel ,  Richard Muka

IPC分类号： B66F19/00

CPC分类号： H01L21/67766 ,  H01L21/67778 ,  H01L21/67781

摘要： A system and method are disclosed for removing horizontally oriented substrates from a cassette. A substrate lifter has an engagement end for engaging a substrate and an adjustment end for engaging an adjustment assembly. The engagement end includes a recess having first and second arcuate sidewalls configured to engage an OD of the substrate, and a circular protrusion positioned between the first and second arcuate sidewalls. The circular protrusion allows lateral movement of the substrate up to a predetermined amount and prevents lateral movement of the substrate in excess of the predetermined amount. Other embodiments are described and claimed.

摘要翻译： 公开了用于从盒中去除水平取向的基板的系统和方法。 基板升降器具有用于接合基板的接合端和用于接合调节组件的调节端。 接合端包括具有第一和第二弓形侧壁的凹部，所述第一和第二弧形侧壁被配置为接合基板的外径，以及定位在第一和第二弧形侧壁之间的圆形突起。 圆形突起允许基板横向移动到预定量，并防止基板横向移动超过预定量。 描述和要求保护其他实施例。

公开(公告)号：US20130088028A1

公开(公告)日：2013-04-11

申请号：US13268129

申请日：2011-10-07

申请人： John Robert Fairhurst ,  Jeffrey E. Krampert ,  Richard J. Hertel ,  Richard Muka

发明人： John Robert Fairhurst ,  Jeffrey E. Krampert ,  Richard J. Hertel ,  Richard Muka

IPC分类号： B25J15/00

CPC分类号： H01L21/67766 ,  H01L21/67778 ,  H01L21/67781

摘要： A system and method are disclosed for removing horizontally oriented substrates from a cassette. A substrate lifter has an engagement end for engaging a substrate and an adjustment end for engaging an adjustment assembly. The engagement end includes a recess having first and second arcuate sidewalls configured to engage an OD of the substrate, and a circular protrusion positioned between the first and second arcuate sidewalls. The circular protrusion allows lateral movement of the substrate up to a predetermined amount and prevents lateral movement of the substrate in excess of the predetermined amount. Other embodiments are described and claimed.

摘要翻译： 公开了用于从盒中去除水平取向的基板的系统和方法。 基板升降器具有用于接合基板的接合端和用于接合调节组件的调节端。 接合端包括具有第一和第二弓形侧壁的凹部，所述第一和第二弧形侧壁被配置为接合基板的外径，以及定位在第一和第二弧形侧壁之间的圆形突起。 圆形突起允许基板横向移动到预定量，并防止基板横向移动超过预定量。 描述和要求保护其他实施例。

公开(公告)号：US20060171094A1

公开(公告)日：2006-08-03

申请号：US11263113

申请日：2005-10-31

申请人： Richard Muka ,  Paul Murphy ,  David Suuronen

发明人： Richard Muka ,  Paul Murphy ,  David Suuronen

IPC分类号： H01T23/00

CPC分类号： H01L21/6831 ,  H01L21/6875 ,  H01L21/68757

摘要： An apparatus is provided to improve clamping of a work piece to a support surface. The apparatus includes a support base, an insulator layer disposed on the support base, an electrode layer disposed on the insulator layer, and a clamping layer comprising aluminum oxynitride disposed on the electrode layer wherein the workpiece is clamped to the surface of the clamping layer. The apparatus provides a higher clamping force for the workpiece while reducing gas leakage and particle levels in addition to maintaining a declamping time suitable for high throughput processing. The apparatus may further provide a raised surface geometry or embossments on the dielectric or a dielectric comprising an outer ring a center cavity for reducing particle contamination to the backside of the workpiece. Also, a thin wall sleeve may be provided between the base and the insulator and alternating current may be applied to opposite ones of interdigitated electrode pairs to reduce particle contamination and improve the implantation uniformity.

公开(公告)号：US20070195482A1

公开(公告)日：2007-08-23

申请号：US11395744

申请日：2006-03-31

申请人： Richard Muka ,  Alexander Perel ,  Paul Murphy

发明人： Richard Muka ,  Alexander Perel ,  Paul Murphy

IPC分类号： H01T23/00

CPC分类号： H01L21/6833 ,  H02N13/00

摘要： An electrostatic chuck includes dielectric layer having at least one region, an electrode associated with the at least one region, and an AC power source configured to provide an AC voltage signal to the electrode. The dielectric property of the dielectric layer is configured to permit a charge migration about the dielectric layer to produce an electrostatic force to attract a workpiece to the dielectric layer when the AC voltage signal is applied to the electrode.

摘要翻译： 静电卡盘包括具有至少一个区域的电介质层，与该至少一个区域相关联的电极以及被配置为向该电极提供AC电压信号的AC电源。 电介质层的介电特性被配置成当AC电压信号被施加到电极时允许围绕电介质层的电荷迁移产生静电力以将工件吸引到电介质层。

公开(公告)号：US07595972B2

公开(公告)日：2009-09-29

申请号：US11263113

申请日：2005-10-31

申请人： Richard Muka ,  Paul Murphy ,  David E. Suuronen

发明人： Richard Muka ,  Paul Murphy ,  David E. Suuronen

IPC分类号： H01T23/00

CPC分类号： H01L21/6831 ,  H01L21/6875 ,  H01L21/68757

摘要： An apparatus is provided to improve clamping of a work piece to a support surface. The apparatus includes a support base, an insulator layer disposed on the support base, an electrode layer disposed on the insulator layer, and a clamping layer comprising aluminum oxynitride disposed on the electrode layer wherein the workpiece is clamped to the surface of the clamping layer. The apparatus provides a higher clamping force for the workpiece while reducing gas leakage and particle levels in addition to maintaining a declamping time suitable for high throughput processing. The apparatus may further provide a raised surface geometry or embossments on the dielectric or a dielectric comprising an outer ring a center cavity for reducing particle contamination to the backside of the workpiece. Also, a thin wall sleeve may be provided between the base and the insulator and alternating current may be applied to opposite ones of interdigitated electrode pairs to reduce particle contamination and improve the implantation uniformity.

摘要翻译： 提供了一种用于改进将工件夹持到支撑表面上的装置。 该装置包括支撑基座，设置在支撑基座上的绝缘体层，设置在绝缘体层上的电极层，以及包括设置在电极层上的氮氧化铝的夹持层，其中工件被夹持在夹持层的表面上。 该设备为工件提供更高的夹紧力，同时减少气体泄漏和颗粒水平，同时保持适合于高通量处理的延迟时间。 该装置还可以在电介质或电介质上提供凸起的表面几何形状或凸起，该电介质包括用于减少颗粒污染到工件后侧的中心腔的外环。 此外，可以在基座和绝缘体之间设置薄壁套管，并且可以将交流电施加到相互交错的电极对的相对的电极对，以减少颗粒污染并提高注入均匀性。

公开(公告)号：US06863736B2

公开(公告)日：2005-03-08

申请号：US10157687

申请日：2002-05-29

申请人： William Leavitt ,  Richard Muka ,  Steven Richards

发明人： William Leavitt ,  Richard Muka ,  Steven Richards

IPC分类号： C23C14/50 ,  H01J37/20 ,  H01J37/317 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67103 ,  C23C14/505 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/2001

摘要： The present invention provides a rotating shaft that can extend between two regions having different ambient pressures. The rotating shaft can include a rotatable hollow outer shell that is coupled to a proximal portion of an inner shaft with a limited number of contact points. A plurality of thermal breaks disposed between the inner shaft and the hollow outer shell impede heat transfer between these two components. A rotary seal coupled to the distal portion of the inner shaft preserves the pressure differential between the two regions. Further, a heat sink removes heat transferred to the seal to ensure that the temperature of the seal remains within a range suitable for its operation. The rotating shaft of the invention can be utilized, for example, in an ion implantation system by the coupling of the outer shell to a wafer holder to position and orient a wafer in a path of an ion beam.

摘要翻译： 本发明提供一种能够在具有不同环境压力的两个区域之间延伸的旋转轴。 旋转轴可以包括可旋转的中空外壳，其以有限数量的接触点联接到内轴的近侧部分。 设置在内轴和中空外壳之间的多个热断裂阻碍了这两个部件之间的热传递。 联接到内轴的远端部分的旋转密封件保持两个区域之间的压力差。 此外，散热器移除传递到密封件的热量，以确保密封件的温度保持在适于其操作的范围内。 本发明的旋转轴可以例如通过外壳与晶片保持器的耦合而用在离子注入系统中，以在离子束的路径中定位和定向晶片。