公开(公告)号：US09978565B2

公开(公告)日：2018-05-22

申请号：US13292649

申请日：2011-11-09

申请人： Jon McChesney ,  Saravanapriyan Sriraman ,  Ricky Marsh ,  Alex Paterson ,  John Holland

发明人： Jon McChesney ,  Saravanapriyan Sriraman ,  Ricky Marsh ,  Alex Paterson ,  John Holland

IPC分类号： H01L21/3065 ,  H01J37/32

CPC分类号： H01J37/32522 ,  H01J37/32082 ,  H01J37/32119 ,  H01J37/32238

摘要： In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.

公开(公告)号：US20130087283A1

公开(公告)日：2013-04-11

申请号：US13292649

申请日：2011-11-09

申请人： Jon McChesney ,  Saravanapriyan Sriraman ,  Ricky Marsh ,  Alex Paterson ,  John Holland

发明人： Jon McChesney ,  Saravanapriyan Sriraman ,  Ricky Marsh ,  Alex Paterson ,  John Holland

IPC分类号： H01L21/3065

CPC分类号： H01J37/32522 ,  H01J37/32082 ,  H01J37/32119 ,  H01J37/32238

摘要： In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.

摘要翻译： 在一个实施例中，等离子体处理装置可以包括电介质窗，真空室，能量源和至少一个空气放大器。 电介质窗口可以包括等离子体暴露表面和空气暴露表面。 电介质窗口的真空室和等离子体暴露表面可以配合以包围等离子体处理气体。 能量源可以通过电介质窗口传输电磁能并在电介质窗口中形成升高的温度区域。 至少一个空气放大器可以与电介质窗口流体连通。 至少一个空气放大器可以在至少约1in-H 2 O的背压下操作，并且可以提供至少约30cfm的空气。

公开(公告)号：US20130135058A1

公开(公告)日：2013-05-30

申请号：US13751001

申请日：2013-01-25

申请人： Maolin Long ,  Ricky Marsh ,  Alex Paterson

发明人： Maolin Long ,  Ricky Marsh ,  Alex Paterson

IPC分类号： H03H7/38

CPC分类号： H03H7/38 ,  H03H7/40

摘要： A match circuit includes the following: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground.

公开(公告)号：US20130186568A1

公开(公告)日：2013-07-25

申请号：US13658652

申请日：2012-10-23

申请人： Maolin Long ,  Alex Paterson ,  Ricky Marsh ,  Ying Wu ,  John Drewery

发明人： Maolin Long ,  Alex Paterson ,  Ricky Marsh ,  Ying Wu ,  John Drewery

IPC分类号： H01L21/67 ,  H05K9/00

CPC分类号： H01L21/67069 ,  H01J37/32651 ,  H05K9/00

摘要： A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.

摘要翻译： 提供了法拉第屏蔽和包含法拉第屏蔽的等离子体处理室。 等离子体室包括用于接收基板的静电卡盘，连接到腔室的顶部的介电窗口，设置在静电卡盘上的电介质窗口和法拉第屏蔽件。 法拉第屏蔽设置在室内并限定在静电卡盘和电介质窗口之间。 法拉第屏蔽包括具有包括第一和第二多个狭槽的内半径范围的内区和具有包括第三多个槽的外半径范围的外区。 内部区域与外部区域相邻。 法拉第屏蔽还包括分隔内区和外区的带环，使得第一和第二多个槽不与第三多个槽连接。

公开(公告)号：US09293353B2

公开(公告)日：2016-03-22

申请号：US13658652

申请日：2012-10-23

申请人： Maolin Long ,  Alex Paterson ,  Ricky Marsh ,  Ying Wu ,  John Drewery

发明人： Maolin Long ,  Alex Paterson ,  Ricky Marsh ,  Ying Wu ,  John Drewery

IPC分类号： C23C16/00 ,  H01L21/306 ,  H01L21/67 ,  H05K9/00 ,  H01J37/32

CPC分类号： H01L21/67069 ,  H01J37/32651 ,  H05K9/00

摘要： A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.

摘要翻译： 提供了法拉第屏蔽和包含法拉第屏蔽的等离子体处理室。 等离子体室包括用于接收基板的静电卡盘，连接到腔室的顶部的介电窗口，设置在静电卡盘上的电介质窗口和法拉第屏蔽件。 法拉第屏蔽设置在室内并限定在静电卡盘和电介质窗口之间。 法拉第屏蔽包括具有包括第一和第二多个狭槽的内半径范围的内区和具有包括第三多个槽的外半径范围的外区。 内部区域与外部区域相邻。 法拉第屏蔽还包括分隔内区和外区的带环，使得第一和第二多个槽不与第三多个槽连接。

公开(公告)号：US06357308B1

公开(公告)日：2002-03-19

申请号：US09337012

申请日：1999-06-30

申请人： Ricky Marsh ,  Stanley Siu

发明人： Ricky Marsh ,  Stanley Siu

IPC分类号： G01D2100

CPC分类号： H05H1/0081 ,  G01D11/245

摘要： A probe for measuring properties of plasma includes a shell, a contact extending through the shell and having a first connecting portion positioned in the shell, and a connector guide attached to a second connecting portion, the second connecting portion being detachably coupled to the first connecting portion. In another embodiment, a probe for measuring properties of plasma includes a shell, a contact extending through the shell, wiring extending from the contact and along an interior of the shell, and a coolant inlet line for injecting coolant into the interior of the shell for cooling the wiring. A method for cooling wiring positioned in an interior of a probe includes providing a coolant inlet line for injecting coolant into the interior of the probe and inserting the coolant inlet line in the interior of the probe such that the coolant cools the wiring. A method for assembling a probe having a shell and a contact extending through the shell and having a first connecting portion positioned in the shell includes attaching a connector guide to a second connecting portion adapted for detachably coupling to the first connecting portion and inserting the second connecting portion and the connector guide into the shell of the probe such that the second connecting portion becomes detachably coupled to the first connecting portion, the connector guide being for aligning the second connecting portion with the first connecting portion.

摘要翻译： 用于测量等离子体性质的探针包括壳体，延伸穿过壳体并具有位于壳体中的第一连接部分的接触件和连接到第二连接部分的连接器导向件，第二连接部分可拆卸地连接到第一连接部分 一部分。 在另一个实施例中，用于测量等离子体性质的探针包括壳体，延伸穿过壳体的接触件，从接触件延伸并沿壳体内部的布线，以及用于将冷却剂注入壳体内部的冷却剂入口管线， 冷却接线。 用于冷却位于探头内部的布线的方法包括提供用于将冷却剂注入探针内部的冷却剂入口管线，并将冷却剂入口管线插入探针内部，使得冷却剂冷却布线。 一种用于组装探针的方法，所述探针具有壳体和延伸穿过所述壳体并且具有位于所述壳体中的第一连接部分的接触件，包括将连接器引导件附接到适于可拆卸地联接到所述第一连接部分的第二连接部分并将所述第二连接 部分和连接器引导件进入探针的壳体，使得第二连接部分可拆卸地联接到第一连接部分，连接器引导件用于将第二连接部分与第一连接部分对准。

公开(公告)号：US5933314A

公开(公告)日：1999-08-03

申请号：US883068

申请日：1997-06-27

申请人： Albert M. Lambson ,  Rick Caple ,  Eric H. Lenz ,  Laura M. Braun ,  Ricky Marsh

发明人： Albert M. Lambson ,  Rick Caple ,  Eric H. Lenz ,  Laura M. Braun ,  Ricky Marsh

IPC分类号： B23Q3/15 ,  H01L21/683 ,  H02N13/00

CPC分类号： H01L21/6833 ,  H02N13/00 ,  Y10T279/23

摘要： A control circuit configured to control a reference voltage of a reference node of an electrostatic chuck power supply is disclosed. The electrostatic chuck power supply is configured to clamp a substrate to a bipolar electrostatic chuck. The electrostatic chuck has a first buried conductor and a second buried conductor. The electrostatic chuck power supply has a first output configured for being coupled with the first buried plate. The first output has a first output voltage referenced to the reference voltage of the reference node. The electrostatic chuck power supply also has a second output configured for being coupled with the second buried plate. The first output has a first output voltage referenced to the reference voltage of the reference node. The control circuit includes: a first resistor coupled in series with the first output; a first amplifier coupled to the first resistor for sensing a voltage drop across the first resistor; a second resistor in series with said second output; and a second amplifier coupled to the second resistor for sensing a voltage drop across the second resistor.

摘要翻译： 公开了一种被配置为控制静电卡盘电源的基准节点的参考电压的控制电路。 静电卡盘电源被配置为将基板夹持到双极静电卡盘。 静电卡盘具有第一掩埋导体和第二掩埋导体。 静电卡盘电源具有被配置为与第一掩埋板耦合的第一输出。 第一输出具有参考参考节点参考电压的第一输出电压。 静电卡盘电源还具有被配置为与第二掩埋板耦合的第二输出。 第一输出具有参考参考节点参考电压的第一输出电压。 控制电路包括：与第一输出串联耦合的第一电阻; 耦合到所述第一电阻器的第一放大器，用于感测跨越所述第一电阻器的电压降; 与所述第二输出串联的第二电阻器; 以及耦合到所述第二电阻器的第二放大器，用于感测跨越所述第二电阻器的电压降。

公开(公告)号：US06553853B2

公开(公告)日：2003-04-29

申请号：US10058186

申请日：2002-01-25

申请人： Ricky Marsh ,  Stanley Siu

发明人： Ricky Marsh ,  Stanley Siu

IPC分类号： G01D2100

CPC分类号： H05H1/0081 ,  G01D11/245

摘要： A probe for measuring properties of plasma includes a shell, a contact extending through the shell and having a first connecting portion positioned in the shell, and a connector guide attached to a second connecting portion, the second connecting portion being detachably coupled to the first connecting portion. In another embodiment, a probe for measuring properties of plasma includes a shell, a contact extending through the shell, wiring extending from the contact and along an interior of the shell, and a coolant inlet line for injecting coolant into the interior of the shell for cooling the wiring. A method for cooling wiring positioned in an interior of a probe includes providing a coolant inlet line for injecting coolant into the interior of the probe and inserting the coolant inlet line in the interior of the probe such that the coolant cools the wiring. A method for assembling a probe having a shell and a contact extending through the shell and having a first connecting portion positioned in the shell includes attaching a connector guide to a second connecting portion adapted for detachably coupling to the first connecting portion and inserting the second connecting portion and the connector guide into the shell of the probe such that the second connecting portion becomes detachably coupled to the first connecting portion, the connector guide being for aligning the second connecting portion with the first connecting portion.