公开(公告)号：US20070212569A1

公开(公告)日：2007-09-13

申请号：US11683403

申请日：2007-03-07

申请人： Jong-Tae Je ,  Dong-Soo Lim ,  Seon-Keun Yoo ,  Jai-Sang Yoon

发明人： Jong-Tae Je ,  Dong-Soo Lim ,  Seon-Keun Yoo ,  Jai-Sang Yoon

IPC分类号： H01L51/54 ,  C09K11/06

CPC分类号： C09K11/06 ,  C09K2211/1011 ,  C09K2211/1025 ,  C09K2211/185 ,  H01L51/0081 ,  H01L51/0085 ,  H01L51/5012 ,  H01L51/5016 ,  H05B33/14

摘要： An organometallic complex for an organic light-emitting layer and an organic light-emitting diode are provided. A naphthalene derivative as a ligand is introduced to the organometallic complex. The organic light-emitting diode uses the organometallic complex as a phosphorescent host material. The organic light-emitting diode exhibits high current efficiency, high power efficiency and long lifetime when compared to conventional devices using BAlq.

摘要翻译： 提供了一种有机发光层和有机发光二极管的有机金属配合物。 将萘衍生物作为配体引入有机金属络合物中。 有机发光二极管使用有机金属络合物作为磷光主体材料。 与使用BAlq的常规器件相比，有机发光二极管具有高电流效率，高功率效率和长寿命。

公开(公告)号：US20050173067A1

公开(公告)日：2005-08-11

申请号：US10514609

申请日：2003-11-18

申请人： Dong-Soo Lim

发明人： Dong-Soo Lim

IPC分类号： H01L21/3065 ,  C23F1/00 ,  H01J37/32 ,  H01L21/02

CPC分类号： H01L21/02082 ,  H01J37/32091 ,  H01J37/32532 ,  H01J2237/334

摘要： Disclosed is a plasma etching chamber for completely dry-cleaning a film material and particles deposited at the periphery of a wafer through plasma etching while generating plasma at the top to the bottom sides of the periphery of the wafer. A pair of top and bottom anodes facing each other is placed around the periphery of the wafer under the application of radio frequency through a cathode. Alternatively, a top cathode and a bottom anode are placed around the periphery of the wafer while facing each other and a view-ring shields the area of the cathode, the anode and the wafer from the outside. A plasma etching system includes a plurality of the above-structured etching chambers. A handler takes wafers from a plurality of cassette stands or load ports, and posture-corrects the orientation frat locations of the wafers by a wafer alignment unit. The wafers are charged into the plasma etching chambers directly or via load lock chambers. The handler takes the etched wafers from the chambers, and returns the wafers to the cassettes or the load ports directly or via the load lock chambers.

摘要翻译： 公开了一种等离子体蚀刻室，用于通过等离子体蚀刻在晶片的周边的顶部至底部产生等离子体，完全干燥膜材料和沉积在晶片周边的颗粒。 在射频施加下通过阴极将一对顶部和底部的阳极相对放置在晶片的周边周围。 或者，顶部阴极和底部阳极围绕晶片的周边放置，同时彼此面对，并且视环从外部屏蔽阴极，阳极和晶片的区域。 等离子体蚀刻系统包括多个上述结构的蚀刻室。 处理器从多个盒架或装载端口取出晶片，并且通过晶片对准单元姿态校正晶片的取向边缘位置。 将晶片直接或通过负载锁定室装入等离子体蚀刻室。 处理器从室中取出蚀刻的晶片，并将晶片直接或经由负载锁定室返回到盒或负载端口。

公开(公告)号：US20070279526A1

公开(公告)日：2007-12-06

申请号：US11725325

申请日：2007-03-19

申请人： Dong-Soo Lim ,  Young-Sik Park

发明人： Dong-Soo Lim ,  Young-Sik Park

IPC分类号： H04N9/00

CPC分类号： H04H60/27 ,  H04H60/91 ,  H04M1/72522 ,  H04N5/45 ,  H04N21/41407 ,  H04N21/4316 ,  H04N21/4331 ,  H04N21/478 ,  H04N21/4858 ,  H04N21/4882

摘要： Disclosed is a method for outputting a digital broadcast with a digital broadcast receiver terminal. The method includes storing first digital broadcast data as second digital broadcast data by the digital broadcast receiver terminal from a moment when an incoming call is connected while the first digital broadcast data is outputted and outputting the first and second digital broadcast data simultaneously to a digital broadcast output screen when connection of the incoming call is terminated. According to the method, a portion of a digital broadcast, which a user fails to watch due to an incoming call, is stored and, after the call, outputted on a separate screen.

摘要翻译： 公开了一种用数字广播接收机终端输出数字广播的方法。 该方法包括：当第一数字广播数据被输出时，数字广播接收机终端从连接有来话呼叫的时刻存储第一数字广播数据作为第二数字广播数据，并将第一和第二数字广播数据同时输出到数字广播 连接来电时的输出画面被终止。 根据该方法，存储用户由于来电而不能观看的数字广播的一部分，并且在呼叫之后在单独的屏幕上输出。

公开(公告)号：US20070006260A1

公开(公告)日：2007-01-04

申请号：US11444834

申请日：2006-06-01

申请人： Jun Yoon ,  Hark-Sang Kim ,  Seok-Hyo Park ,  Young-Sik Park ,  Dong-Soo Lim ,  Jung-Hoon Park ,  Seung-Chul Choi

发明人： Jun Yoon ,  Hark-Sang Kim ,  Seok-Hyo Park ,  Young-Sik Park ,  Dong-Soo Lim ,  Jung-Hoon Park ,  Seung-Chul Choi

IPC分类号： H04N5/445 ,  G06F13/00

CPC分类号： H04H20/93 ,  H04H60/33 ,  H04H60/82 ,  H04M1/72561 ,  H04N5/4401 ,  H04N5/45 ,  H04N7/17318 ,  H04N21/41407 ,  H04N21/4312 ,  H04N21/4314 ,  H04N21/4622 ,  H04N21/4722 ,  H04N21/4758 ,  H04N21/4781 ,  H04N21/8586

摘要： Disclosed is a method for providing an interactive digital broadcasting service in a mobile communication terminal for receiving digital broadcasting. Digital broadcasting signals including URL information of the digital broadcasting are received and outputted, the URL information from the received digital broadcasting signals is detected, a website of the digital broadcasting is accessed using the detected URL information when a broadcast information request for the digital broadcasting is received from a user, and broadcasting information provided from the website is displayed in a portion of a digital broadcasting output screen. Thus, while watching the digital broadcasting, users can access the Internet, retrieve information relating to broadcasting contents and state their opinion about broadcast programs.

摘要翻译： 公开了一种用于在用于接收数字广播的移动通信终端中提供交互式数字广播服务的方法。 接收并输出包括数字广播的URL信息的数字广播信号，从所接收的数字广播信号中检测出URL信息，当数字广播的广播信息请求是广播信息请求时，使用检测到的URL信息访问数字广播的网站 从用户接收的，并且从网站提供的广播信息显示在数字广播输出屏幕的一部分中。 因此，在观看数字广播的同时，用户可以访问因特网，检索与广播内容相关的信息，并且对广播节目表达其意见。

公开(公告)号：US20140015805A1

公开(公告)日：2014-01-16

申请号：US14004266

申请日：2012-06-25

申请人： Kil-Sun Kim ,  Dong-Soo Lim ,  Byoung-Hoon Pyo

发明人： Kil-Sun Kim ,  Dong-Soo Lim ,  Byoung-Hoon Pyo

IPC分类号： G06F3/042

CPC分类号： G06F3/0428 ,  G06F3/0421 ,  G06F2203/04104

摘要： The present invention relates to an infrared rays touch screen apparatus using an array of infrared elements in two opposite sides comprising: a plurality of infrared rays transmitting elements arranged sequentially in a first direction; a plurality of infrared rays receiving elements arranged sequentially in the first direction and in the opposite side of the plurality of infrared rays transmitting elements to receive infrared rays transmitted from the plurality of infrared rays transmitting elements; and a touch control unit which is operated in a first scan control mode which controls the plurality of infrared rays receiving elements and the plurality of infrared rays transmitting elements such that each infrared rays receiving element receives infrared rays from the infrared rays transmitting elements arranged in the opposite side and which is operated in a second scan control mode which controls such that each infrared rays receiving element receives infrared rays from the infrared rays transmitting elements arranged diagonally to the infrared rays receiving element; wherein the touch control unit detects the first touch coordinates of the first direction by the operation in the first scan control mode, and detects the second touch coordinates of the second direction perpendicular to the first direction on the basis of the first touch coordinates of the first direction and a preliminary coordinates of the first direction detected by the operation in the second scan control mode. Accordingly, the single-touch and multi-touch are able to be sensed by a plurality of infrared rays transmitting elements and infrared rays receiving elements arranged which are arranged in the two opposite sides on the screen, thereby the manufacturing cost can be reduced significantly.

摘要翻译： 本发明涉及一种红外线触摸屏装置，其使用两相对侧的红外线阵列，其特征在于，包括：沿第一方向依次布置的多个红外线发射元件; 多个红外线接收元件，其沿着所述多个红外线传输元件的所述第一方向和所述相反侧排列，以接收从所述多个红外线发射元件发射的红外线; 以及触摸控制单元，其以控制多个红外线接收元件和多个红外线透射元件的第一扫描控制模式操作，使得每个红外线接收元件从布置在所述红外线接收元件中的红外线传输元件接收红外线 在第二扫描控制模式下操作，该第二扫描控制模式控制使得每个红外线接收元件从与红外线接收元件对角布置的红外线传输元件接收红外线; 其中所述触摸控制单元通过所述第一扫描控制模式中的操作来检测所述第一方向的所述第一触摸坐标，并且基于所述第一扫描控制模式的所述第一触摸坐标来检测与所述第一方向垂直的所述第二方向的所述第二触摸坐标 方向和通过第二扫描控制模式中的操作检测到的第一方向的初步坐标。 因此，能够通过布置在屏幕的两个相对侧的多个红外线发射元件和红外线接收元件来感测单触摸和多点触摸，从而可以显着降低制造成本。

公开(公告)号：US07615131B2

公开(公告)日：2009-11-10

申请号：US10514609

申请日：2003-11-18

申请人： Dong-Soo Lim

发明人： Dong-Soo Lim

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01L21/02082 ,  H01J37/32091 ,  H01J37/32532 ,  H01J2237/334

摘要： Disclosed is a plasma etching chamber for completely dry-cleaning a film material and particles deposited at the periphery of a wafer through plasma etching while generating plasma at the top to the bottom sides of the periphery of the wafer. A pair of top and bottom anodes facing each other is placed around the periphery of the wafer under the application of radio frequency through a cathode. Alternatively, a top cathode and a bottom anode are placed around the periphery of the wafer while facing each other and a view-ring shields the area of the cathode, the anode and the wafer from the outside. A plasma etching system includes a plurality of the above-structured etching chambers. A handler takes wafers from a plurality of cassette stands or load ports, and posture-corrects the orientation frat locations of the wafers by a wafer alignment unit. The wafers are charged into the plasma etching chambers directly or via load lock chambers. The handler takes the etched wafers from the chambers, and returns the wafers to the cassettes or the load ports directly or via the load lock chambers.

摘要翻译： 公开了一种等离子体蚀刻室，用于通过等离子体蚀刻在晶片的周边的顶部至底部产生等离子体，完全干燥膜材料和沉积在晶片周边的颗粒。 在射频施加下通过阴极将一对顶部和底部的阳极相对放置在晶片的周边周围。 或者，顶部阴极和底部阳极围绕晶片的周边放置，同时彼此面对，并且视环从外部屏蔽阴极，阳极和晶片的区域。 等离子体蚀刻系统包括多个上述结构的蚀刻室。 处理器从多个盒架或装载端口取出晶片，并且通过晶片对准单元姿态校正晶片的取向边缘位置。 将晶片直接或通过负载锁定室装入等离子体蚀刻室。 处理器从室中取出蚀刻的晶片，并将晶片直接或经由负载锁定室返回到盒或负载端口。