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1.
公开(公告)号:US07955660B2
公开(公告)日:2011-06-07
申请号:US12588014
申请日:2009-09-30
IPC分类号: C08G77/60
CPC分类号: H01B3/46 , C08G77/08 , C08G77/50 , C09D183/04 , C09D183/14 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L21/3127 , Y10T428/31663
摘要: A method for producing a polymer for semiconductor optoelectronics, comprising the steps of providing a monomer is produced having the formula: wherein: R1 is a hydrolysable group R2 is hydrogen, and R3 is a bridging linear or branched bivalent hydrocarbyl group, said monomer being produced by hydrosilylation of the corresponding starting materials, and homo- or copolymerizing the monomer to produce a polymer.
摘要翻译: 一种制备半导体光电子学聚合物的方法,包括提供具有下式的单体的步骤:其中:R1为可水解基团,R2为氢,R3为桥连的直链或支链二价烃基,所述单体的制备 通过相应起始材料的氢化硅烷化,以及均聚或共聚单体以产生聚合物。
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2.
公开(公告)号:US20100136798A1
公开(公告)日:2010-06-03
申请号:US12588014
申请日:2009-09-30
IPC分类号: H01L21/312 , C08G77/12
CPC分类号: H01B3/46 , C08G77/08 , C08G77/50 , C09D183/04 , C09D183/14 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L21/3127 , Y10T428/31663
摘要: A method for producing a polymer for semiconductor optoelectronics, comprising the steps of providing a monomer is produced having the formula: wherein: R1 is a hydrolysable group R2 is hydrogen, and R3 is a bridging linear or branched bivalent hydrocarbyl group, said monomer being produced by hydrosilylation of the corresponding starting materials, and homo- or copolymerizing the monomer to produce a polymer.
摘要翻译: 一种制备半导体光电子学聚合物的方法,包括提供具有下式的单体的步骤:其中:R1为可水解基团,R2为氢,R3为桥连的直链或支链二价烃基,所述单体的制备 通过相应起始材料的氢化硅烷化,以及均聚或共聚单体以产生聚合物。
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公开(公告)号:US07504470B2
公开(公告)日:2009-03-17
申请号:US11215303
申请日:2005-08-31
申请人: Juha T. Rantala , Jyri Paulasaari , Janne Kylmä , Turo T. Törmänen , Jarkko Pietikäinen , Nigel Hacker , Admir Hadzic
发明人: Juha T. Rantala , Jyri Paulasaari , Janne Kylmä , Turo T. Törmänen , Jarkko Pietikäinen , Nigel Hacker , Admir Hadzic
IPC分类号: C08G77/18
CPC分类号: C09D183/14 , C08G77/50 , H01B3/46 , H01L21/02126 , H01L21/02282 , H01L21/3122 , H01L21/76822 , H01L21/76837 , H01L23/5329 , H01L2924/0002 , H01L2924/12044 , Y10T428/31663 , H01L2924/00
摘要: A thin film comprising a composition obtained by polymerizing a monomer having the formula I: wherein: R1 is a hydrolysable group, R2 is a polarizability reducing organic group, and R3 is a bridging hydrocarbon group, to form a siloxane material. The invention also concerns methods for producing the thin films. The thin film can be used a low k dielectric in integrated circuit devices. The novel dielectric materials have excellent properties of planarization resulting in good local and global planarity on top a semiconductor substrate topography, which reduces or eliminates the need for chemical mechanical planarization after dielectric and oxide liner deposition.
摘要翻译: 一种薄膜,其包含通过聚合具有式I的单体而获得的组合物:其中:R 1是可水解基团,R 2是极化率降低的有机基团,并且R 3是桥连烃基,以形成硅氧烷材料。 本发明还涉及制备薄膜的方法。 该薄膜可用于集成电路器件中的低k电介质。 新型介电材料具有优异的平面化特性,从而在半导体衬底形貌的顶部产生良好的局部和全局平面性,从而减少或消除了电介质和氧化物衬垫沉积后对化学机械平面化的需要。
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