Retardation element
    1.
    发明授权
    Retardation element 有权
    延迟元件

    公开(公告)号:US09181479B2

    公开(公告)日:2015-11-10

    申请号:US13133489

    申请日:2009-12-08

    摘要: A retardation element containing a liquid crystalline compound, and at least one compound selected from the group consisting of a compound represented by the following formula (1), a compound represented by the following formula (2) and a compound represented by the following formula (3). In the formula (1), n represents an integer of 3 to 10 and R2 represents a —CH2—CH2— group, a —CH2—CH(CH3)— group or a —CH2—CH2—CH2— group. In the formula (2), R3 represents a —(CH2)p— group or a phenylene group and p represents an integer of 4 to 8. In the formula (3), R4 represents a substituted phenylene group. In the formulas (1) to (3), R1-1, R1-2 and R1-3 each represent an alkyl group having a branched structure having 5 or more carbon atoms and R1-1, R1-2 and R1-3 may be the same or different.

    摘要翻译: 含有液晶化合物的延迟元件和选自由下式(1)表示的化合物,下式(2)表示的化合物和下式(I)表示的化合物中的至少一种化合物 3)。 在式(1)中,n表示3〜10的整数,R 2表示-CH 2 -CH 2 - 基,-CH 2 -CH(CH 3) - 基或-CH 2 -CH 2 -CH 2 - 基。 式(2)中,R3表示 - (CH2)p-基或亚苯基,p表示4〜8的整数。式(3)中,R4表示取代亚苯基。 式(1)〜(3)中,R1-1,R1-2和R1-3各自表示具有碳原子数5以上的支链结构的烷基,R1-1,R1-2和R1-3可以 相同或不同

    LAMINATE FOR LAMINATED GLASS
    2.
    发明申请
    LAMINATE FOR LAMINATED GLASS 有权
    层压玻璃层压板

    公开(公告)号:US20110293857A1

    公开(公告)日:2011-12-01

    申请号:US13139576

    申请日:2009-12-22

    IPC分类号: G02F1/13363

    摘要: An object of the present invention is to provide a laminate for a laminated glass that exhibits an excellent heat resistance, exhibits little variation in its retardation value in high-temperature atmospheres, and can maintain stable optical properties.The present invention is a laminate for a laminated glass, comprising an interlayer film for a laminated glass laminated with a retardation element interposed between an adhesive layer A and an adhesive layer B, wherein the retardation element contains a liquid-crystal compound and at least one compound selected from the group consisting of a compound represented by the following formula (1), a compound represented by the following formula (2), and a compound represented by the following formula (3).In formula (1), n represents an integer from 3 to 10 and R2 represents a —CH2—CH2— group, a —CH2—CH(CH3)— group, or a —CH2—CH2—CH2— group.In formula (2), R3 represents a —(CH2)p— group or a phenylene group and p represents an integer from 4 to 8.In formula (3), R4 presents a substituted phenylene group.R1-1, R1-2, and R1-3 in formulas (1) to (3) are the same or different, each representing an alkyl group that has a branched structure and that contains at least 5 carbon atoms.

    摘要翻译: 本发明的目的是提供一种表现出优异的耐热性的夹层玻璃层压板,在高温环境下的延迟值几乎没有变化,并且可以保持稳定的光学性能。 本发明是一种夹层玻璃用层叠体,其特征在于,具有夹层玻璃用中间膜,层叠了介于粘合剂层A和粘合剂层B之间的相位差元件,其中,所述相位差元件含有液晶性化合物和至少一种 选自由下式(1)表示的化合物,下式(2)表示的化合物和下式(3)表示的化合物的化合物。 在式(1)中,n表示3至10的整数,R 2表示-CH 2 -CH 2 - 基,-CH 2 -CH(CH 3) - 基或-CH 2 -CH 2 -CH 2 - 基。 在式(2)中,R 3表示 - (CH 2)p基或亚苯基,p表示4至8的整数。在式(3)中,R 4表示取代的亚苯基。 式(1)〜(3)中的R1-1,R1-2和R1-3相同或不同,表示具有支链结构且含有至少5个碳原子的烷基。

    RETARDATION ELEMENT
    3.
    发明申请
    RETARDATION ELEMENT 有权
    延迟元素

    公开(公告)号:US20110293856A1

    公开(公告)日:2011-12-01

    申请号:US13133489

    申请日:2009-12-08

    摘要: The present invention aims at providing a retardation element which has excellent heat resistance, is small in the changes in the retardation value in an atmosphere of high temperatures, and is capable of maintaining stable optical performance.The present invention pertains to a retardation element containing a liquid crystalline compound, and at least one compound selected from the group consisting of a compound represented by the following formula (1), a compound represented by the following formula (2) and a compound represented by the following formula (3). In the formula (1), n represents an integer of 3 to 10 and R2 represents a —CH2—CH2— group, a —CH2—CH(CH3)— group or a —CH2—CH2—CH2— group. In the formula (2), R3 represents a —(CH2)p— group or a phenylene group and p represents an integer of 4 to 8. In the formula (3), R4 represents a substituted phenylene group. In the formulas (1) to (3), R1-1, R1-2 and R1-3 each represent an alkyl group having a branched structure having 5 or more carbon atoms and R1-1, R1-2 and R1-3 may be the same or different.

    摘要翻译: 本发明的目的在于提供一种具有优异的耐热性,在高温气氛中的延迟值的变化小的延迟元件,并且能够保持稳定的光学性能。 本发明涉及含有液晶化合物的延迟元件和至少一种选自由下式(1)表示的化合物,下式(2)表示的化合物和表示的化合物的化合物 由下式(3)表示。 在式(1)中,n表示3〜10的整数,R 2表示-CH 2 -CH 2 - 基,-CH 2 -CH(CH 3) - 基或-CH 2 -CH 2 -CH 2 - 基。 式(2)中,R3表示 - (CH2)p-基或亚苯基,p表示4〜8的整数。式(3)中,R4表示取代亚苯基。 式(1)〜(3)中,R1-1,R1-2和R1-3各自表示具有碳原子数5以上的支链结构的烷基,R1-1,R1-2和R1-3可以 相同或不同

    Laminate for laminated glass
    4.
    发明授权
    Laminate for laminated glass 有权
    夹层玻璃层压板

    公开(公告)号:US09180648B2

    公开(公告)日:2015-11-10

    申请号:US13139576

    申请日:2009-12-22

    摘要: A laminate for a laminated glass, comprising an interlayer film for a laminated glass laminated with a retardation element interposed between an adhesive layer A and an adhesive layer B, wherein the retardation element contains a liquid-crystal compound and at least one compound selected from the group consisting of a compound represented by the following formula (1), a compound represented by the following formula (2), and a compound represented by the following formula (3). In formula (1), n represents an integer from 3 to 10 and R2 represents a —CH2—CH2— group, a —CH2—CH(CH3)— group, or a —CH2—CH2—CH2— group. In formula (2), R3 represents a —(CH2)p— group or a phenylene group and p represents an integer from 4 to 8. In formula (3), R4 represents a substituted phenylene group. R1-1, R1-2, and R1-3 in formulas (1) to (3) are the same or different, each representing an alkyl group that has a branched structure and that contains at least 5 carbon atoms.

    摘要翻译: 一种夹层玻璃用层压体,其特征在于,具有夹层玻璃用中间膜,层叠了介于粘合剂层A和粘合剂层B之间的相位差元件,其中,所述相位差元件含有液晶化合物和选自 由下式(1)表示的化合物,由下式(2)表示的化合物和下式(3)表示的化合物组成的组。 在式(1)中,n表示3至10的整数,R 2表示-CH 2 -CH 2 - 基,-CH 2 -CH(CH 3) - 基或-CH 2 -CH 2 -CH 2 - 基。 式(2)中,R3表示 - (CH2)p-基或亚苯基,p表示4〜8的整数。式(3)中,R4表示取代亚苯基。 式(1)〜(3)中的R1-1,R1-2和R1-3相同或不同,表示具有支链结构且含有至少5个碳原子的烷基。

    LAMINATE FOR LAMINATED GLASS AND INTERLAYER FILM FOR LAMINATED GLASS
    6.
    发明申请
    LAMINATE FOR LAMINATED GLASS AND INTERLAYER FILM FOR LAMINATED GLASS 有权
    层压玻璃的层压板和层压玻璃的层间膜

    公开(公告)号:US20120021230A1

    公开(公告)日:2012-01-26

    申请号:US13139806

    申请日:2009-12-22

    IPC分类号: B32B17/06 F21V9/06

    摘要: The present invention aims to provide a laminate for a laminated glass which is used as a head-up display (HUD) and is not deteriorated even if exposed to light, and with which a laminated glass having excellent impact resistance can be prepared.The present invention pertains to a laminate for a laminated glass, wherein an interlayer film for a laminated glass and a retardation element sandwiched between adhesive layers are laminated, the interlayer film for a laminated glass contains a thermoplastic resin and an ultraviolet absorber, the interlayer film for a laminated glass contains, as the ultraviolet absorber, a benzotriazole compound or a benzophenone compound, and at least one compound selected from the group consisting of a malonic ester compound, an oxanilide compound and a triazine compound, the sum of the contents of the malonic ester compound, the oxanilide compound and the triazine compound is 0.8 parts by weight or more and the sum of the contents of the benzotriazole compound or the benzophenone compound is 0.8 parts by weight or more with respect to 100 parts by weight of the thermoplastic resin and the adhesive layer contains an adhesive having a glass transition temperature of −20° C. or lower.

    摘要翻译: 本发明旨在提供一种用作平视显示器(HUD)的夹层玻璃层压板,即使曝光也不会劣化,并且可以制备具有优异抗冲击性的夹层玻璃。 本发明涉及夹层玻璃的叠层体,其中夹层玻璃用中间膜和夹在粘合剂层之间的相位差元件层压,夹层玻璃用中间膜含有热塑性树脂和紫外线吸收剂,层间膜 对于夹层玻璃,作为紫外线吸收剂,含有苯并三唑化合物或二苯甲酮化合物,以及至少一种选自丙二酸酯化合物,草酰替苯胺化合物和三嗪化合物的化合物,其含量的总和 丙二酸酯化合物,草酰苯胺化合物和三嗪化合物相对于100重量份热塑性树脂为0.8重量份以上,苯并三唑化合物或二苯甲酮化合物的含量之和为0.8重量份以上 并且粘合剂层含有玻璃化转变温度为-20℃以下的粘合剂。

    Bactericidal/algicidal method
    7.
    发明授权

    公开(公告)号:US10421676B2

    公开(公告)日:2019-09-24

    申请号:US12733746

    申请日:2008-09-10

    摘要: The invention provides a bactericidal/algicidal method including adding an oxidant-based bactericidal/algicidal agent and a stabilizer therefor to a target water system, characterized in that the amount of combined chlorine or the stabilizer in the water system is controlled by generating free residual chlorine in the water system, and a bactericidal/algicidal method including adding an oxidant-based bactericidal/algicidal agent and a stabilizer therefor to a target water system, characterized in that the amount of the oxidant-based bactericidal/algicidal agent added is controlled so that the concentration of total residual chlorine in the water system falls within a predetermined range, and the amount of combined chlorine or the stabilizer is controlled so that the concentration of free residual chlorine in the water system falls within a predetermined range.An object of the present invention is to provide a bactericidal/algicidal method including adding an oxidant-based bactericidal/algicidal agent and a stabilizer therefor to a target water system for bactericidal/algicidal treatment, wherein the amount of combined chlorine or the stabilizer is controlled, and the amount of the oxidant-based bactericidal/algicidal agent added is controlled, which method realizes effective utilization of the stabilizer, to thereby reduce the amount of the stabilizer employed and to reduce COD and the amount of nitrogen derived from the stabilizer, and which method does not require a special control apparatus for in-line mixing as described above.

    EXTRUSION DIE
    8.
    发明申请
    EXTRUSION DIE 审中-公开
    挤出机

    公开(公告)号:US20110291312A1

    公开(公告)日:2011-12-01

    申请号:US13143246

    申请日:2009-12-28

    IPC分类号: B29C47/20

    摘要: In an extrusion die in which a mandrel ring is outwardly arranged around a spindle, the present invention aims to enhance the fixing stability of the mandrel ring and enables easy maintenance. The extrusion die includes a mandrel (30) for forming an inner surface of an extruded material. The mandrel includes a spindle (32) and a mandrel ring (35) outwardly arranged around the spindle (32). The mandrel ring (35) is made of a material having a coefficient of thermal expansion smaller than that of a material of the spindle (32). In a state in which the mandrel ring (35) is outwardly arranged around the spindle (32), the extrusion die is configured such that a gap is formed between an outer circumferential surface (32a) of the spindle (32) and an inner circumferential surface (35a) of the mandrel ring (35) at a normal temperature and the gap disappears at least partially in an axial direction of the mandrel (30) to allow contact of both the outer circumferential surface of the spindle (32) and the inner circumferential surface of the mandrel ring (35) at a die temperature at the time of extrusion.

    摘要翻译: 在芯轴环绕心轴向外配置的挤出模具中,本发明旨在提高心轴环的固定稳定性,能够容易地进行维护。 挤出模具包括用于形成挤出材料的内表面的心轴(30)。 心轴包括主轴(32)和围绕心轴(32)向外设置的心轴环(35)。 心轴环(35)由热膨胀系数小于主轴(32)的材料的材料制成。 在心轴环(35)围绕心轴(32)向外配置的状态下,挤出模具构造成使得在主轴(32)的外周面(32a)与内周面 心轴环(35)的表面(35a)在常温下,并且间隙至少部分地沿心轴(30)的轴向消失,以允许心轴(32)的外周面与内筒 心轴环(35)的周向表面在挤出时的模具温度下。

    METHOD FOR MANUFACTURING BONDED SUBSTRATE
    9.
    发明申请
    METHOD FOR MANUFACTURING BONDED SUBSTRATE 有权
    制造粘结基板的方法

    公开(公告)号:US20110104871A1

    公开(公告)日:2011-05-05

    申请号:US12934788

    申请日:2009-04-10

    IPC分类号: H01L21/762

    CPC分类号: H01L21/187 H01L21/76254

    摘要: Provided is a method for manufacturing a bonded wafer with a good thin film over the entire substrate surface, especially in the vicinity of the lamination terminal point. The method for manufacturing a bonded wafer comprises at least the following steps of: forming an ion-implanted region by implanting a hydrogen ion or a rare gas ion, or the both types of ions from a surface of a first substrate which is a semiconductor substrate; subjecting at least one of an ion-implanted surface of the first substrate and a surface of a second substrate to be attached to a surface activation treatment; laminating the ion-implanted surface of the first substrate and the surface of the second substrate in an atmosphere with a humidity of 30% or less and/or a moisture content of 6 g/m3 or less; and a splitting the first substrate at the ion-implanted region so as to reduce thickness of the first substrate, thereby manufacturing a bonded wafer with a thin film on the second substrate.

    摘要翻译: 提供一种在整个基板表面上,特别是在层叠终点附近制造具有良好薄膜的接合晶片的方法。 制造接合晶片的方法至少包括以下步骤:通过从作为半导体衬底的第一衬底的表面注入氢离子或稀有气体离子或两种离子形成离子注入区域 ; 对第一基板的离子注入表面和第二基板的表面中的至少一个进行表面活化处理; 将第一基板的离子注入表面和第二基板的表面在湿度为30%以下和/或6g / m 3以下的气氛中层压; 以及在离子注入区域处分裂第一衬底以便减小第一衬底的厚度,由此在第二衬底上制造具有薄膜的接合晶片。

    METHOD OF MANUFACTURING LAMINATED WAFER BY HIGH TEMPERATURE LAMINATING METHOD
    10.
    发明申请
    METHOD OF MANUFACTURING LAMINATED WAFER BY HIGH TEMPERATURE LAMINATING METHOD 有权
    通过高温层压法制造层压陶瓷的方法

    公开(公告)号:US20100244182A1

    公开(公告)日:2010-09-30

    申请号:US12685194

    申请日:2010-01-11

    IPC分类号: H01L29/02 H01L21/762

    摘要: To provide a method of manufacturing a laminated wafer by which a strong coupling is achieved between wafers made of different materials having a large difference in thermal expansion coefficient without lowering a maximum heat treatment temperature as well as in which cracks or chips of the wafer does not occur. A method of manufacturing a laminated wafer 7 by forming a silicon film layer on a surface 4 of an insulating substrate 3 comprising the steps in the following order of: applying a surface activation treatment to both a surface 2 of a silicon wafer 1 or a silicon wafer 1 to which an oxide film is layered and a surface 4 of the insulating substrate 3 followed by laminating in an atmosphere of temperature exceeding 50° C. and lower than 300° C., applying a heat treatment to a laminated wafer 5 at a temperature of 200° C. to 350° C., and thinning the silicon wafer 1 by a combination of grinding, etching and polishing to form a silicon film layer.

    摘要翻译: 为了提供一种制造层叠晶片的方法,在不降低最大热处理温度的情况下,不会降低最大热处理温度以及晶片的裂纹或芯片不会在不具有热膨胀系数差的不同材料制成的晶片之间实现强耦合, 发生。 一种通过在绝缘基板3的表面4上形成硅膜层来制造层压晶片7的方法,包括以下顺序的步骤:对硅晶片1或硅的表面2施加表面活化处理 叠层氧化膜的晶片1和绝缘基板3的表面4,然后在温度超过50℃且低于300℃的气氛中层压,在层叠晶片5上进行热处理 温度为200〜350℃,通过研磨,蚀刻和研磨的组合使硅晶片1变薄,形成硅膜层。