公开(公告)号：US08352889B2

公开(公告)日：2013-01-08

申请号：US13323986

申请日：2011-12-13

申请人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

发明人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

IPC分类号： G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G06K9/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

摘要： A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

摘要翻译： 射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便 校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图 在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量 的所述物体。

公开(公告)号：US20100015537A1

公开(公告)日：2010-01-21

申请号：US12566525

申请日：2009-09-24

申请人： Keiko EMI ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iljima ,  Jun Yashima

发明人： Keiko EMI ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iljima ,  Jun Yashima

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01J3/26

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

摘要翻译： 光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

公开(公告)号：US07740991B2

公开(公告)日：2010-06-22

申请号：US11460848

申请日：2006-07-28

申请人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

发明人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

IPC分类号： G06F1/00 ,  G06F19/00 ,  G06F17/50 ,  G06K9/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

摘要翻译： 光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

公开(公告)号：US08429575B2

公开(公告)日：2013-04-23

申请号：US13275448

申请日：2011-10-18

申请人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

发明人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

IPC分类号： G06F17/50

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

摘要翻译： 通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由负载效应引起的尺寸误差的图案的第一维度校正量 基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量 第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

公开(公告)号：US08103980B2

公开(公告)日：2012-01-24

申请号：US12566525

申请日：2009-09-24

申请人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iljima ,  Jun Yashima

发明人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iljima ,  Jun Yashima

IPC分类号： G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G03C5/00 ,  G06K9/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

摘要翻译： 光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

公开(公告)号：US20080184190A1

公开(公告)日：2008-07-31

申请号：US11851176

申请日：2007-09-06

申请人： Jun YASHIMA ,  Junichi Suzuki ,  Takayuki Abe

发明人： Jun YASHIMA ,  Junichi Suzuki ,  Takayuki Abe

IPC分类号： G06F17/50

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

摘要翻译： 通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由加载效应引起的尺寸误差的图案的第一维度校正量 基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量 第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

公开(公告)号：US08527913B2

公开(公告)日：2013-09-03

申请号：US13349002

申请日：2012-01-12

申请人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

发明人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

IPC分类号： G06F17/50 ,  A61N5/00 ,  G21G5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

公开(公告)号：US20120036486A1

公开(公告)日：2012-02-09

申请号：US13275448

申请日：2011-10-18

申请人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

发明人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

IPC分类号： G06F17/50

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

摘要翻译： 通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由负载效应引起的尺寸误差的图案的第一维度校正量 基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量 第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

公开(公告)号：US08065635B2

公开(公告)日：2011-11-22

申请号：US11851176

申请日：2007-09-06

申请人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

发明人： Jun Yashima ,  Junichi Suzuki ,  Takayuki Abe

IPC分类号： G06F17/50

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

摘要翻译： 通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由负载效应引起的尺寸误差的图案的第一维度校正量 基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量 第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

公开(公告)号：US20070114453A1

公开(公告)日：2007-05-24

申请号：US11460848

申请日：2006-07-28

申请人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

发明人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

IPC分类号： A61N5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

摘要翻译： 光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。