公开(公告)号：US08183545B2

公开(公告)日：2012-05-22

申请号：US12850928

申请日：2010-08-05

Applicant: Jun Yashima

Inventor： Jun Yashima

IPC: H01J3/14 ,  H01J5/10 ,  G21K1/08 ,  G03F9/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

Abstract: There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A charged particle beam writing apparatus includes: a data storage unit to which layout data defining a plurality of figure patterns in a chip region is input and which stores the layout data; a dividing unit configured to divide the chip region into a plurality of process regions; a shot data generating unit configured to perform distributed processing on pattern data in the process regions using a plurality of computing processors so as to convert the pattern data to shot data for shooting a charged particle beam onto a target object; a determining and instructing unit configured to compare an amount of output data from each of the computing processors with a predetermined threshold, and when the amount of the output data is larger than the threshold, instruct corresponding one of the computing processors to divide corresponding one of the process regions and continue the data processing; and a writing unit configured to write on the target object using the shot data.

Abstract translation: 提供了一种带电粒子束写入装置，其中通过自动划分执行并行分布式处理的处理区域来优化数据处理。 带电粒子束写入装置包括：数据存储单元，其输入定义芯片区域中的多个图形图案的布局数据，并存储布局数据; 分割单元，被配置为将所述芯片区域划分为多个处理区域; 镜头数据生成单元，被配置为使用多个计算处理器对所述处理区域中的图案数据进行分散处理，以将所述图案数据转换为用于将带电粒子束拍摄到目标对象的拍摄数据; 确定和指示单元，被配置为将来自每个计算处理器的输出数据的量与预定阈值进行比较，并且当输出数据的量大于阈值时，指示对应的一个计算处理器将 进程区域并继续进行数据处理; 以及写入单元，其被配置为使用所述拍摄数据对所述目标对象进行写入。

公开(公告)号：US20120108063A1

公开(公告)日：2012-05-03

申请号：US13323986

申请日：2011-12-13

Applicant: Keiko EMI ,  Junichi SUZUKI ,  Takayuki ABE ,  Tomohiro IIJIMA ,  Jun YASHIMA

Inventor： Keiko EMI ,  Junichi SUZUKI ,  Takayuki ABE ,  Tomohiro IIJIMA ,  Jun YASHIMA

IPC: H01L21/306

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

Abstract translation: 射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便 校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图 在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量 的所述物体。

公开(公告)号：US20100173235A1

公开(公告)日：2010-07-08

申请号：US12649846

申请日：2009-12-30

Applicant: Yasuo KATO ,  Jun Yashima ,  Hiroshi Matsumoto ,  Tomoo Motosugi ,  Tomohiro Iijima ,  Takayuki Abe

Inventor： Yasuo KATO ,  Jun Yashima ,  Hiroshi Matsumoto ,  Tomoo Motosugi ,  Tomohiro Iijima ,  Takayuki Abe

IPC: G03F7/20 ,  G21K5/00 ,  G21K1/00

CPC classification number: G03F1/68 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/025 ,  H01J37/3174

Abstract: A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.

Abstract translation: 一种写入方法包括计算用于校正带电粒子束写入中的邻近效应的邻近效应校正剂量，对于通过将目标对象的写入区域虚拟地分成多个第一网格尺寸的第一网格区域而制成的每个第一网格区域 通过使用计算的邻近效应校正剂量和相对于计算区域的一部分的第一网格尺寸的面积密度来计算雾化效果校正剂量，以计算用于校正雾化效果的起雾效果校正剂量 带电粒子束写入，并且相对于计算区域的剩余部分使用相对于第一网格尺寸大的第二网格尺寸的面积密度，合成每个图像的雾化效果校正剂量和邻近效应校正剂量 第一网格区域，并且基于合成的校正剂量，通过使用带电粒子束将目标物体上的图案写入。

公开(公告)号：US08878149B2

公开(公告)日：2014-11-04

申请号：US13288530

申请日：2011-11-03

Applicant: Jun Yashima

Inventor： Jun Yashima

IPC: G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31762

Abstract: A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam.

Abstract translation: 带电粒子束写入装置包括存储单元，其被配置为存储其中定义了多个图形的写入数据，并且调整大小信息，其中，对于多个图中的每一个，调整大小信息是否进行调整大小的调整大小状态，以及 判断确定单元，被配置为输入写入数据，并且针对多个图中的每一个判断调整大小状态是否进行调整大小和调整大小时使用的调整大小方向;调整大小 处理单元，被配置为当判断为进行调整大小时，相对于所述多个图中的每一个调整所判定的大小调整方向上的图形的尺寸;以及写入单元，被配置为使用图案将图案写入到目标工件上 调整大小的图和带电粒子束。

公开(公告)号：US08796650B2

公开(公告)日：2014-08-05

申请号：US12725676

申请日：2010-03-17

Applicant: Jun Yashima

Inventor： Jun Yashima

IPC: H01J37/302 ,  H01J37/317

CPC classification number: H01J37/3023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J37/3026 ,  H01J37/3174

Abstract: A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through.

Abstract translation: 带电粒子束描绘装置包括带电粒子束枪，具有开口的第一形成孔径构件，其中从带电粒子束枪发射的带电粒子束穿过第一成形孔构件的开口，第二形成孔 具有开口的构件，其中穿过第一成形孔构件的带电粒子束穿过第二成形孔构件的开口，用于支撑工件的可移动台，其中对应于图形数据中的图形的图案被绘制在 通过穿过第二成形孔径构件的带电粒子束的工件以及用于基于第二成形孔的开口中的位置移动图形数据中的图形的绘图数据校正处理部分，其中用于绘制的带电粒子束 图案通过。

公开(公告)号：US08563953B2

公开(公告)日：2013-10-22

申请号：US13235432

申请日：2011-09-18

Applicant: Noriaki Nakayamada ,  Makoto Hiramoto ,  Jun Yashima

Inventor： Noriaki Nakayamada ,  Makoto Hiramoto ,  Jun Yashima

IPC: H01J37/147 ,  H01J19/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3023 ,  H01J2237/30461 ,  H01J2237/30483 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus includes a unit calculating a total charge amount of charged particle beams irradiating each minimum deflection region in deflection regions having different deflection sizes respectively deflected by deflectors of a plurality of levels for deflecting charged particle beams, a unit calculating a representative temperature of the each minimum deflection region based on heat transfer from other minimum deflection regions having been written before the each minimum deflection region is written, a unit inputting a first dose of a shot of each charged particle beam irradiating the each minimum deflection region, and modulating the first dose by using the representative temperature of the each minimum deflection region, and a unit including the deflectors of a plurality of levels and writing a pattern in the each minimum deflection region with a second dose, which has been modulated, by using the deflectors of a plurality of levels.

Abstract translation: 一种带电粒子束写入装置，包括一个单元，该单元计算在偏转区域中照射每个最小偏转区域的带电粒子束的总电荷量，该偏转区域具有不同的偏转尺寸，该偏转区域分别由用于偏转带电粒子束的多个级别的偏转器偏转， 基于已经写入在每个最小偏转区域之前写入的其它最小偏转区域的热传递的每个最小偏转区域的温度，输入照射每个最小偏转区域的每个带电粒子束的射束的第一剂量的单元，以及 通过使用每个最小偏转区域的代表性温度调制第一剂量，以及包括多个级别的偏转器的单元，并且通过使用已调制的第二剂量在每个最小偏转区域中写入图案 多个级别的偏转器。

公开(公告)号：US08352889B2

公开(公告)日：2013-01-08

申请号：US13323986

申请日：2011-12-13

Applicant: Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

Inventor： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

IPC: G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G06K9/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

Abstract translation: 射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便 校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图 在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量 的所述物体。

公开(公告)号：US20120292537A1

公开(公告)日：2012-11-22

申请号：US13469580

申请日：2012-05-11

Applicant: Jun YASHIMA ,  Akihito Anpo

Inventor： Jun YASHIMA ,  Akihito Anpo

IPC: G21K5/10

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/31754 ,  H01J2237/31764 ,  H01J2237/31776 ,  Y10S430/143

Abstract: A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular shape by the stripe region height, whether a height of a last stripe region is narrower than the stripe region height; and a unit to divide the write region into stripe regions in the thin rectangular shape in such a way that the last stripe region and a stripe region prior to the last stripe region are combined to create one stripe region and stripe regions at least two stripe regions prior to the last stripe region are each created as stripe regions of the stripe region height if the height of the last stripe region is narrower than the stripe region height.

Abstract translation: 一种带电粒子束写入装置，包括输入关于条带区域高度的信息的单元，并且当写入区域被划分成条形区域高度的薄矩形形状的条带区域时，判断最后条带的高度 区域比条纹区域高; 以及将所述写入区域划分成所述薄矩形形状的条带区域的单元，使得所述最后条带区域和所述最后条带区域之前的条带区域被组合以产生一个条带区域和条带区域，至少两个条带区域 如果最后一个条带区域的高度比条带区域高度窄，则在最后一个条带区域之前分别被创建为条带区域高度的条带区域。

公开(公告)号：US20100072390A1

公开(公告)日：2010-03-25

申请号：US12560802

申请日：2009-09-16

Applicant: Jun YASHIMA

Inventor： Jun YASHIMA

IPC: G21K1/08

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3174

Abstract: The present invention provides a charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput.A graphic pattern defined in write data is divided into graphics represented in shot units (S20). The divided graphics are temporarily stored in a memory. The graphics divided at S20 are distributed to their corresponding subfield areas while developing position information defined in a state of being compressed to write data (S30). When each pattern is written by multi-pass writing, graphics divided at a first pass are used for distribution to subfield areas after a second pass.

Abstract translation: 本发明提供了一种能够缩短产生镜头数据所需时间并提高写入吞吐量的带电粒子束写入装置和带电粒子束写入方法。 在写入数据中定义的图形图案被分成以拍摄单元表示的图形（S20）。 分割的图形临时存储在存储器中。 在S20处划分的图形被分配到其对应的子场区域，同时以被压缩的状态定义为写入数据的显示位置信息（S30）。 当通过多遍写入写入每个图案时，在第二次通过后将分割为第一遍的图形用于分配到子场区域。

公开(公告)号：US20100015537A1

公开(公告)日：2010-01-21

申请号：US12566525

申请日：2009-09-24

Applicant: Keiko EMI ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iljima ,  Jun Yashima

Inventor： Keiko EMI ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iljima ,  Jun Yashima

IPC: G03F7/20 ,  H01J37/317 ,  H01J3/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

Abstract translation: 光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。