公开(公告)号：US07935474B2

公开(公告)日：2011-05-03

申请号：US12174759

申请日：2008-07-17

申请人： Jung-Youl Lee ,  Min-Ja Yoo ,  Jeong-Sik Kim ,  Young-Bae Lim ,  Jae-Woo Lee ,  Jae-Hyun Kim

发明人： Jung-Youl Lee ,  Min-Ja Yoo ,  Jeong-Sik Kim ,  Young-Bae Lim ,  Jae-Woo Lee ,  Jae-Hyun Kim

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： C07D317/72 ,  C07D339/06 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/123

摘要： An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4˜C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1˜C10 linear hydrocarbon, C1˜C10 perfluoro compound or C5˜C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1˜C4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).

摘要翻译： 公开了具有缩醛基的酸性放大器和包含该缩醛基的光致抗蚀剂组合物。 在曝光过程中，酸放大器在曝光前烘烤（PEB）中产生酸（第二酸），其由在光生酸发生器（PAG）产生的酸（第一酸）诱导，使得线 改善了光致抗蚀剂图案的边缘粗糙度（LER）和光致抗蚀剂的能量灵敏度。 酸式放大器在式1中具有下式1的结构，R为C 4〜C 20单环或多环饱和烃，R 1为C 1〜C 10直链烃，C 1〜C 10全氟化合物或C 5〜C 20芳族化合物 ，Ra和Rb独立地为氢原子或C1〜C4饱和烃，A独立地为氧原子（O）或硫原子（S）。

公开(公告)号：US20090023093A1

公开(公告)日：2009-01-22

申请号：US12174759

申请日：2008-07-17

申请人： Jung-Youl Lee ,  Min-Ja Yoo ,  Jeong-Sik Kim ,  Young-Bae Lim ,  Jae-Woo Lee ,  Jae-Hyun Kim

发明人： Jung-Youl Lee ,  Min-Ja Yoo ,  Jeong-Sik Kim ,  Young-Bae Lim ,  Jae-Woo Lee ,  Jae-Hyun Kim

IPC分类号： G03F7/004 ,  C07D317/72

CPC分类号： C07D317/72 ,  C07D339/06 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/123

摘要： An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4˜C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1˜C10 linear hydrocarbon, C1˜C10 perfluoro compound or C5˜C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1˜C4 saturated hydrocarbon and A is independently oxygen atom (0) or sulfur atom (S).

摘要翻译： 公开了具有缩醛基的酸性放大器和包含该缩醛基的光致抗蚀剂组合物。 在曝光过程中，酸放大器在曝光前烘烤（PEB）中产生酸（第二酸），其由在光生酸发生器（PAG）产生的酸（第一酸）诱导，使得线 改善了光致抗蚀剂图案的边缘粗糙度（LER）和光致抗蚀剂的能量灵敏度。 酸式放大器在式1中具有下式1的结构，R为C 4〜C 20单环或多环饱和烃，R 1为C 1〜C 10直链烃，C 1〜C 10全氟化合物或C 5〜C 20芳族化合物 ，Ra和Rb独立地为氢原子或C1〜C4饱和烃，A独立地为氧原子（O）或硫原子（S）。

公开(公告)号：US08043789B2

公开(公告)日：2011-10-25

申请号：US12337058

申请日：2008-12-17

申请人： Jae-Woo Lee ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

发明人： Jae-Woo Lee ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC分类号： C07C43/30 ,  C07C69/42 ,  C07C69/712 ,  C07C2603/74 ,  C07D309/12 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/115

摘要： A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.

摘要翻译： 公开了尺寸小于用于光致抗蚀剂的常规聚合物并具有明确（均匀）结构的光敏化合物和包含其的光致抗蚀剂组合物。 由下式表示的感光性化合物。 另外，本发明提供了含有1〜85重量％（重量）感光性化合物的光致抗蚀剂组合物， 0.05〜15重量份的光酸发生剂相对于100重量份的感光性化合物; 和10〜5000重量份的有机溶剂。 在该式中，n为0或1，x为1,2,3,4或5，y为2,3,4,5或6，z为0,1,2,3或4，R，R' R“独立地为1〜30个碳原子，优选2〜20个碳原子的烃基，R'”为氢原子或碳原子数为1〜30，优选为2〜20的烃基。

公开(公告)号：US20090081587A1

公开(公告)日：2009-03-26

申请号：US12208586

申请日：2008-09-11

申请人： Jae-Woo LEE ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

发明人： Jae-Woo LEE ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0045 ,  C07C43/2055 ,  C07C43/30 ,  C07C65/24 ,  C07C69/42 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0392 ,  Y10S430/115

摘要： A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula 1. Also, the photoresist composition comprises 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 200 to 5000 weight parts of an organic solvent. In the formula 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, and R and R′ are independently a chain type or a ring type of aliphatic or aromatic hydrocarbon group of 1 to 30 carbon atoms.

摘要翻译： 公开了尺寸小于用于光致抗蚀剂的常规聚合物并具有明确（均匀）结构的光敏化合物和包含其的光致抗蚀剂组合物。 由下式1表示的感光性化合物。另外，光致抗蚀剂组合物含有1〜85重量％（重量）感光性化合物; 0.05〜15重量份的光酸发生剂相对于100重量份的感光性化合物; 和200〜5000重量份的有机溶剂。 在式1中，x是1,2,3,4或5，y是2,3,4,5或6，R和R'独立地是链型或环型的脂族或芳族烃基的 1至30个碳原子。

公开(公告)号：US07947423B2

公开(公告)日：2011-05-24

申请号：US12208586

申请日：2008-09-11

申请人： Jae-Woo Lee ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

发明人： Jae-Woo Lee ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38 ,  C07C43/205

CPC分类号： G03F7/0045 ,  C07C43/2055 ,  C07C43/30 ,  C07C65/24 ,  C07C69/42 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0392 ,  Y10S430/115

摘要： A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula 1. Also, the photoresist composition comprises 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 200 to 5000 weight parts of an organic solvent. In the formula 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, and R and R′ are independently a chain type or a ring type of aliphatic or aromatic hydrocarbon group of 1 to 30 carbon atoms.

摘要翻译： 公开了尺寸小于用于光致抗蚀剂的常规聚合物并具有明确（均匀）结构的光敏化合物和包含其的光致抗蚀剂组合物。 由下式1表示的感光性化合物。另外，光致抗蚀剂组合物含有1〜85重量％（重量）感光性化合物; 0.05〜15重量份的光酸发生剂相对于100重量份的感光性化合物; 和200〜5000重量份的有机溶剂。 在式1中，x是1,2,3,4或5，y是2,3,4,5或6，R和R'独立地是链型或环型的脂族或芳族烃基的 1至30个碳原子。

公开(公告)号：US20090155714A1

公开(公告)日：2009-06-18

申请号：US12337058

申请日：2008-12-17

申请人： Jae-Woo LEE ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

发明人： Jae-Woo LEE ,  Min-Ja Yoo ,  Jun-Gyeong Lee ,  Young-Bae Lim ,  Jae-Hyun Kim

IPC分类号： G03F7/004 ,  C07C43/307 ,  C07D309/12 ,  G03F7/20 ,  C07C69/017 ,  C07C69/612

CPC分类号： C07C43/30 ,  C07C69/42 ,  C07C69/712 ,  C07C2603/74 ,  C07D309/12 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/115

摘要： A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.

摘要翻译： 公开了尺寸小于用于光致抗蚀剂的常规聚合物并具有明确（均匀）结构的光敏化合物和包含其的光致抗蚀剂组合物。 由下式表示的感光性化合物。 另外，本发明提供了含有1〜85重量％（重量）感光性化合物的光致抗蚀剂组合物， 相对于100重量份感光性化合物的光酸产生剂为0.05〜 和10〜5000重量份的有机溶剂。 在该式中，n为0或1，x为1,2,3,4或5，y为2,3,4,5或6，z为0,1,2,3或4，R，R' R“独立地为1〜30个碳原子，优选2〜20个碳原子的烃基，R”'为氢原子或碳原子数为1〜30，优选为2〜20的烃基。