公开(公告)号：US20170183539A1

公开(公告)日：2017-06-29

申请号：US15386502

申请日：2016-12-21

Applicant: K.C.Tech Co., Ltd.

Inventor： Jang Kuk KWON ,  Sung Pyo LEE ,  Chang Gil KWON ,  Jun Ha HWANG

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/306

Abstract: An abrasive particle-dispersion layer composite and a polishing slurry composition including the abrasive particle-dispersion layer composite are provided. The abrasive particle-dispersion layer composite includes abrasive particles, a first dispersant that is at least one cationic compound among an amino acid, an organic acid, polyalkylene glycol and a high-molecular polysaccharide coupled to a glucosamine compound, and a second dispersant that is a cationic polymer including at least two ionized cations in a molecular formula.

公开(公告)号：US20170183538A1

公开(公告)日：2017-06-29

申请号：US15379861

申请日：2016-12-15

Applicant: K.C.Tech Co., Ltd.

Inventor： Jang Kuk KWON ,  Sung Pyo LEE ,  Chang Gil KWON ,  Jun Ha HWANG

IPC: C09G1/02 ,  H01L21/3105 ,  C09G1/04

CPC classification number: C09G1/02 ,  H01L21/31053

Abstract: An additive composition and a positive polishing slurry composition including the additive composition are provided. The additive composition includes a cationic compound, an organic acid, a nonionic compound, and a pH adjuster.