公开(公告)号：US20140346701A1

公开(公告)日：2014-11-27

申请号：US14454955

申请日：2014-08-08

Applicant: Kabushiki Kaisha Toshiba

Inventor： Sachiko KOBAYASHI ,  Kazuhiro TAKAHATA ,  Yingkang ZHANG ,  Masafumi ASANO ,  Shigeki NOJIMA

IPC: B29C59/02 ,  B29C59/00 ,  B29C71/04

CPC classification number: B29C59/026 ,  B29C59/002 ,  B29C71/04 ,  B29K2105/246 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: According to one embodiment, a pattern formation device that presses a template that includes a concave and convex part onto a transferring object and that forms a pattern in which a shape of the concave and convex part is transferred is provided. The device includes: a calculation part; an adjustment part; and a transfer. The calculation part calculates, using design information of the pattern, the distribution of force applied to the pattern at a time of releasing the template pressed onto the transferring object from the transferring object. The adjustment part adjusts forming conditions of the pattern in order to uniformly approach the distribution of force calculated by the calculation part. The transfer part transfers the shape of the concave and convex part to the transferring object according to the forming conditions adjusted by the adjustment part.

Abstract translation: 根据一个实施例，提供了一种图案形成装置，其将包括凹凸部分的模板按压到转印体上并形成其中转移了凹凸部分的形状的图案。 该装置包括：计算部分; 调整部分; 和转移。 所述计算部使用所述图案的设计信息，计算从所述转印体上释放压印在所述转印体上的所述模板时施加到所述图案的力的分布。 调整部调整图案的成形条件，以均匀地接近由计算部计算出的力的分布。 转印部件根据由调节部件调整的成形条件将凹凸部的形状转印到转印体上。

公开(公告)号：US20160372333A1

公开(公告)日：2016-12-22

申请号：US15010041

申请日：2016-01-29

Applicant: Kabushiki Kaisha Toshiba

Inventor： Takahito NISHIMURA ,  Yoshihisa KAWAMURA ,  Kazuhiro TAKAHATA ,  Ikuo YONEDA ,  Yoshiharu ONO

IPC: H01L21/308 ,  H01L29/06 ,  H01L21/3065

CPC classification number: H01L21/0334 ,  G03F7/0002

Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.

Abstract translation: 根据一个实施例，器件衬底包括多层膜，其包括构成器件元件的膜并设置在衬底上。 设置有元件的主面包括在压印处理期间在其上施加抗蚀剂的构图区域，以及设置为从图案形成区域的周边部分到端部的区域的斜面区域 器件衬底。 斜面区域包括相对于图案化区域的上表面，斜面区域的上表面朝向器件衬底的端部变低的区域。 在图案化区域和斜面区域的边界处，斜面区域的上表面相对于图案化区域的上表面具有10°以上且90°以下的倾斜角。

公开(公告)号：US20160320696A1

公开(公告)日：2016-11-03

申请号：US14834617

申请日：2015-08-25

Applicant: Kabushiki Kaisha Toshiba

Inventor： Takahito NISHIMURA ,  Suigen KYOH ,  Kazuhiro TAKAHATA

IPC: G03F7/00 ,  B29C33/38

CPC classification number: G03F7/0002 ,  B82Y30/00 ,  B82Y40/00

Abstract: According to an embodiment, a template substrate is provided. The template substrate is formed by a board-shaped member. The template substrate includes topography that is non-planar deviation in a predetermined region on a pattern surface of the board-shaped member on which a template pattern is formed.

Abstract translation: 根据实施例，提供模板基板。 模板基板由板状构件形成。 模板基板包括在其上形成有模板图案的板状构件的图案表面上的预定区域中的非平面偏差的形貌。

公开(公告)号：US20140284846A1

公开(公告)日：2014-09-25

申请号：US14015803

申请日：2013-08-30

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yoko TAKEKAWA ,  Ryouichi INANAMI ,  Masafumi ASANO ,  Kazuhiro TAKAHATA ,  Sachiko KOBAYASHI ,  Shigeki NOJIMA ,  Yohko FURUTONO ,  Masato SUZUKI ,  Kenji KONOMI

IPC: B29C59/02

CPC classification number: B29C33/0055 ,  B29C33/424 ,  B29C2033/422 ,  G03F7/0002 ,  G03F9/7042 ,  G03F9/7076 ,  G03F9/7084

Abstract: According to one embodiment, a mold includes a base, a first concave pattern, a second concave pattern, and a third concave pattern. The base includes a first surface and a pedestal projecting from the first surface. The pedestal includes a first region and a second region disposed outside the first region. The first concave pattern is formed in the first region. The second concave pattern is formed in the second region. The third concave pattern extends from the first region to the second region.

Abstract translation: 根据一个实施例，模具包括基座，第一凹形图案，第二凹形图案和第三凹形图案。 底座包括从第一表面突出的第一表面和基座。 基座包括设置在第一区域外的第一区域和第二区域。 第一凹形图案形成在第一区域中。 第二凹形图案形成在第二区域中。 第三凹形图案从第一区域延伸到第二区域。