公开(公告)号：US20140376694A1

公开(公告)日：2014-12-25

申请号：US14021030

申请日：2013-09-09

Applicant: Kabushiki Kaisha Toshiba

Inventor： Hideaki ABE ,  Yasuhiko ISHIBASHI

IPC: G01N23/20 ,  G01N23/207

CPC classification number: G01N23/20008 ,  G01N23/207

Abstract: In accordance with an embodiment, a substrate measurement apparatus circuit includes a light source, a detector, a data calculation unit, a mirror unit, a mirror drive unit, and a mirror drive calculation unit. The light source applies the electromagnetic waves to a measurement target substrate. The detector detects the electromagnetic waves diffracted or scattered by the application of the electromagnetic waves to the substrate. The data calculation unit processes a signal from the detector to acquire substrate information. The mirror unit includes a deflecting mirror which is adjusted to an optical condition where incident electromagnetic waves are totally reflected to control the track of the electromagnetic waves. The mirror drive unit drives the deflecting mirror in at least one of vertical, horizontal, and rotational directions. The mirror drive calculation unit calculates a drive amount to drive the deflecting mirror in at least one of the vertical, horizontal, and rotational directions.

Abstract translation: 根据实施例，基板测量装置电路包括光源，检测器，数据计算单元，反射镜单元，反射镜驱动单元和反射镜驱动计算单元。 光源将电磁波施加到测量对象基板。 检测器通过将电磁波施加到基板来检测衍射或散射的电磁波。 数据计算单元处理来自检测器的信号以获取衬底信息。 镜单元包括偏转镜，该偏转镜被调整到入射电磁波被全反射以控制电磁波的轨迹的光学状态。 镜驱动单元以垂直，水平和旋转方向中的至少一个驱动偏转镜。 反射镜驱动计算单元计算在垂直方向，水平方向和旋转方向中的至少一个方向上驱动偏转镜的驱动量。

公开(公告)号：US20140067316A1

公开(公告)日：2014-03-06

申请号：US13752490

申请日：2013-01-29

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yasuhiko ISHIBASHI

IPC: G01N23/201 ,  G06F17/00

CPC classification number: G01N23/201 ,  G01N2223/6116 ,  G06F17/00

Abstract: In accordance with an embodiment, a measuring apparatus includes a stage, an electromagnetic wave applying unit, a detector, a monitor, a detector location adjusting unit, and a measuring unit. The stage supports a substrate comprising a periodic structure on a main surface thereof. The electromagnetic wave applying unit generates electromagnetic waves and applies the electromagnetic waves to the substrate. The detector detects the intensity of the electromagnetic waves scattered or reflected by the substrate with the use of two-dimensionally arranged detection elements, and then outputs a signal. The monitor processes the signal from the detector to acquire a first scatter profile, and measure a positional deviation of the detector in accordance with the first scatter profile. The detector location adjusting unit corrects the positional deviation of the detector in accordance with the measured positional deviation. The measuring unit calculates a surface shape of the periodic structure.

Abstract translation: 根据实施例，测量装置包括台，电磁波施加单元，检测器，监视器，检测器位置调整单元和测量单元。 该载物台在其主表面上支撑包含周期性结构的基底。 电磁波施加单元产生电磁波并将电磁波施加到基板。 检测器利用二维排列的检测元件检测由基板散射或反射的电磁波的强度，然后输出信号。 监视器处理来自检测器的信号以获取第一散射分布，并且根据第一散射分布测量检测器的位置偏差。 检测器位置调整单元根据所测量的位置偏差校正检测器的位置偏差。 测量单元计算周期结构的表面形状。

公开(公告)号：US20150012239A1

公开(公告)日：2015-01-08

申请号：US14021127

申请日：2013-09-09

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yasuhiko ISHIBASHI

IPC: G01N9/00

CPC classification number: G01N9/24 ,  G01N23/201 ,  H01L22/12

Abstract: In accordance with an embodiment, a measurement apparatus includes a stage to hold a substrate, an electromagnetic wave applying unit, a detector, and first and second calculation units. The electromagnetic wave applying unit generates electromagnetic waves and applies it to the substrate. The detector detects the electromagnetic waves scattered or reflected by the substrate and measure the intensity of the electromagnetic waves. The first calculation unit processes a signal from the detector to create a first reflectance profile, fit the first reflectance profile to a second reflectance profile prepared by a simulation, thereby calculating thickness and density of an analytic model which is set so that the periodic structure and the membranous structure are regarded as a single mixed layer. The second calculation unit calculates, from a sectional shape of the periodic structure and the calculated thickness and density, the density of the second material after a volume change.

Abstract translation: 根据实施例，测量装置包括保持基板的台，电磁波施加单元，检测器以及第一和第二计算单元。 电磁波施加单元产生电磁波并将其施加到基板。 检测器检测由基板散射或反射的电磁波，并测量电磁波的强度。 第一计算单元处理来自检测器的信号以产生第一反射率分布，将第一反射率分布拟合到通过模拟准备的第二反射率分布，从而计算分析模型的厚度和密度，其被设置为使得周期性结构和 膜结构被认为是单一的混合层。 第二计算单元根据周期性结构的截面形状和计算出的厚度和密度，计算体积变化后的第二材料的密度。