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公开(公告)号:US20200373422A1
公开(公告)日:2020-11-26
申请号:US16799901
申请日:2020-02-25
发明人: Masahiko KURAGUCHI , Yosuke KAJIWARA , Aya SHINDOME , Hiroshi ONO , Daimotsu KATO , Akira MUKAI
IPC分类号: H01L29/778 , H01L29/20 , H01L29/205 , H01L29/45 , H01L29/423 , H01L29/66
摘要: According to one embodiment, a semiconductor device includes first, second and third electrodes, first and second semiconductor layers, a first conductive part, first and second insulating layers. The third electrode includes first and second portions. The first portion is between the first electrode and the second electrode. The first semiconductor layer includes first, second, third, fourth and fifth partial regions. The third partial region is between the first and second partial regions. The fourth partial region is between the first and third partial regions. The fifth partial region is between the third and second partial regions. The second semiconductor layer includes first and second semiconductor regions. The first conductive part is electrically connected to the first electrode. The first insulating layer includes a first insulating portion. The second insulating layer includes first and second insulating regions.
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2.
公开(公告)号:US20210384337A1
公开(公告)日:2021-12-09
申请号:US17407851
申请日:2021-08-20
发明人: Daimotsu KATO , Yosuke KAJIWARA , Akira MUKAI , Aya SHINDOME , Hiroshi ONO , Masahiko KURAGUCHI
IPC分类号: H01L29/778 , H01L29/20 , H01L29/205 , H01L29/06 , H01L29/66 , H01L29/423
摘要: According to one embodiment, a semiconductor device includes first to third electrodes, first to third nitride regions, and first and second insulating films. The first nitride region includes Alx1Ga1−x1N, and includes first and second partial regions, a third partial region between the first and second partial regions, a fourth partial region between the first and third partial regions, and a fifth partial region between the third and second partial regions. The first nitride region includes first to fifth partial regions. The second nitride region includes Alx2Ga1−x2N, and sixth and seventh partial regions. At least a portion of the third electrode is between the sixth and seventh partial regions. The first insulating film includes silicon and oxygen and includes first and second insulating regions. The third nitride region includes Alx3Ga1−x3N, and first to seventh portions. The second insulating film includes silicon and oxygen and includes third to seventh insulating regions.
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公开(公告)号:US20200220002A1
公开(公告)日:2020-07-09
申请号:US16565715
申请日:2019-09-10
发明人: Aya SHINDOME , Masahiko Kuraguchi
IPC分类号: H01L29/778 , H01L29/20 , H01L29/06
摘要: According to one embodiment, a semiconductor device includes a first electrode extending along a first direction, a second electrode including a portion extending along the first direction, a third electrode extending along the first direction, a first member, first and second semiconductor regions, and a conductive portion. A position of the second electrode in a second direction is between the third electrode and the first electrode in the second direction crossing the first direction. A distance along the second direction between the third and second electrodes is shorter than a distance along the second direction between the second and first electrodes. The first member includes first and second regions. A conductivity of the second region is lower than a conductivity of the first region. The first semiconductor region includes Alx1Ga1-x1N. The second semiconductor region includes Alx2Ga1-x2N. A conductive portion is electrically connected to the first electrode.
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4.
公开(公告)号:US20230268430A1
公开(公告)日:2023-08-24
申请号:US18307099
申请日:2023-04-26
发明人: Daimotsu KATO , Yosuke KAJIWARA , Akira MUKAI , Aya SHINDOME , Hiroshi ONO , Masahiko KURAGUCHI
IPC分类号: H01L29/778 , H01L29/20 , H01L29/205 , H01L29/06 , H01L29/66 , H01L29/423
CPC分类号: H01L29/7783 , H01L29/2003 , H01L29/205 , H01L29/0653 , H01L29/2006 , H01L29/66462 , H01L29/4236
摘要: According to one embodiment, a semiconductor device includes first to third electrodes, first to third nitride regions, and first and second insulating films. The first nitride region includes Alx1Ga1−x1N, and includes first and second partial regions, a third partial region between the first and second partial regions, a fourth partial region between the first and third partial regions, and a fifth partial region between the third and second partial regions. The first nitride region includes first to fifth partial regions. The second nitride region includes Alx2Ga1−x2N, and sixth and seventh partial regions. At least a portion of the third electrode is between the sixth and seventh partial regions. The first insulating film includes silicon and oxygen and includes first and second insulating regions. The third nitride region includes Alx3Ga1−x3N, and first to seventh portions. The second insulating film includes silicon and oxygen and includes third to seventh insulating regions.
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公开(公告)号:US20200335587A1
公开(公告)日:2020-10-22
申请号:US16787351
申请日:2020-02-11
发明人: Hiroshi ONO , Akira MUKAI , Yosuke KAJIWARA , Daimotsu KATO , Aya SHINDOME , Masahiko KURAGUCHI
IPC分类号: H01L29/205 , H01L29/207 , H01L29/20 , H01L29/778 , H01L29/423 , H01L29/51 , H01L29/40 , H01L23/29
摘要: According to one embodiment, a semiconductor device includes first, second and third electrodes, first and second semiconductor layers, and a first compound member. A position of the third electrode is between a position of the second electrode and a position of the first electrode. The first semiconductor layer includes first, second, third, fourth, and fifth partial regions. The fourth partial region is between the third and first partial regions. The fifth partial region is between the second and third partial regions. The second semiconductor layer includes first, second, and third semiconductor regions. The third semiconductor region is between the first partial region and the first electrode. The first compound member includes first compound portions between the third semiconductor region and the first electrode. A portion of the first electrode is between one of the first compound portions and an other one of the first compound portions.
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公开(公告)号:US20190288081A1
公开(公告)日:2019-09-19
申请号:US16056917
申请日:2018-08-07
发明人: Aya SHINDOME , Masahiko KURAGUCHI , Tatsuo SHIMIZU
IPC分类号: H01L29/40 , H01L29/778 , H01L29/423
摘要: According to one embodiment, a semiconductor device includes first and second semiconductor regions, first to third electrodes, a conductive portion, first and second insulating layers. The first, second and third electrodes are separated from the first semiconductor region. The conductive portion is separated from the first semiconductor region. The second semiconductor region includes first to third partial regions. The first and second partial regions are electrically connected to the first and second electrodes, respectively. The third partial region is positioned between the second portion and the first semiconductor region. A portion of the first insulating layer is provided between the first portion and the first semiconductor region. The second insulating layer includes first and second insulating portions. The first insulating portion is positioned between the second portion and the third partial region. The second insulating portion is positioned between the conductive portion and the second semiconductor region.
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公开(公告)号:US20240313100A1
公开(公告)日:2024-09-19
申请号:US18361647
申请日:2023-07-28
发明人: Daimotsu KATO , Yosuke KAJIWARA , Hiroshi ONO , Aya SHINDOME , Ikuo FUJIWARA , Masahiko KURAGUCHI , Tatsuo SHIMIZU
IPC分类号: H01L29/778 , H01L29/20 , H01L29/36
CPC分类号: H01L29/7786 , H01L29/2003 , H01L29/36
摘要: According to one embodiment, a semiconductor device includes a first electrode, a second electrode, a third electrode, a first semiconductor region, a second semiconductor region, a first nitride region, and a first insulating member. The first semiconductor region includes Alx1Ga1-x1N (0≤x1
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公开(公告)号:US20230187500A1
公开(公告)日:2023-06-15
申请号:US17809714
申请日:2022-06-29
IPC分类号: H01L29/08 , H01L29/20 , H01L29/205 , H01L29/778 , H01L29/66
CPC分类号: H01L29/0891 , H01L29/2003 , H01L29/205 , H01L29/7786 , H01L29/66462
摘要: According to one embodiment, a semiconductor device includes first to third electrodes, first and second semiconductor regions, and a first member. The first semiconductor region includes Alx1Ga1-x1N (0≤x1
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公开(公告)号:US20220393006A1
公开(公告)日:2022-12-08
申请号:US17590866
申请日:2022-02-02
IPC分类号: H01L29/40 , H01L29/20 , H01L29/205 , H01L29/778
摘要: According to one embodiment, a semiconductor device includes first, second, third electrodes, first, and second semiconductor regions, a first conductive member, and an insulating member. The third electrode is between the first and second electrodes. The first semiconductor region includes first to sixth partial regions. The second semiconductor region includes first to third semiconductor portions. The first conductive member is electrically connected with a first one of the first and third electrodes. The first conductive member includes a first conductive end portion. The insulating member includes first and second nitride regions. The second semiconductor portion is between the fifth partial region and the first nitride region. The third semiconductor portion is between the sixth partial region and the second nitride region. The first nitride region includes a first nitride end portion. The first nitride end portion is in contact with the second semiconductor region.
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公开(公告)号:US20220130986A1
公开(公告)日:2022-04-28
申请号:US17444977
申请日:2021-08-12
发明人: Daimotsu KATO , Hiroshi ONO , Tatsuo SHIMIZU , Yosuke KAJIWARA , Aya SHINDOME , Akira MUKAI , Po-Chin HUANG , Masahiko KURAGUCHI
IPC分类号: H01L29/778 , H01L29/51
摘要: According to one embodiment, a semiconductor device includes first, second and third electrodes, first and second semiconductor layers, a first member, and a first insulating member. The first semiconductor layer includes Alx1Ga1-x1N (0≤x1
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