公开(公告)号：US11332641B2

公开(公告)日：2022-05-17

申请号：US17123115

申请日：2020-12-16

Applicant: KCTECH CO., LTD.

Inventor： Gi Joo Shin ,  Jung Yoon Kim ,  Kwang Soo Park ,  Soo Wan Choi

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/3105

Abstract: A polishing slurry composition enabling implementation of multi-selectivity is provided. The polishing slurry composition includes: a polishing liquid including abrasive particles; and an additive liquid, in which the additive liquid includes a polymer having an amide bond, and a cationic polymer.

公开(公告)号：US12247141B2

公开(公告)日：2025-03-11

申请号：US17415704

申请日：2019-11-04

Applicant: KCTECH CO., LTD.

Inventor： Nak Hyun Choi ,  Jung Yoon Kim ,  Hae Won Yang ,  Soo Wan Choi

IPC: C09G1/02 ,  C09G1/04 ,  B82Y40/00 ,  H01L21/304

Abstract: The present invention relates to a polishing slurry composition. A polishing slurry composition according to an embodiment of the present disclosure comprises: a nonionic polymer having at least one amide bond; a selectivity control agent; and abrasive particles.

公开(公告)号：US12037516B2

公开(公告)日：2024-07-16

申请号：US17293236

申请日：2019-05-29

Applicant: KCTECH CO., LTD.

Inventor： Kwang Soo Park ,  Jun Ha Hwang ,  Soo Wan Choi ,  Nak Hyun Choi

IPC: C09G1/02 ,  C08K3/14 ,  C09K3/14

CPC classification number: C09G1/02 ,  C09K3/14

Abstract: The present disclosure relates to a polishing slurry composition and a method of producing the same. The polishing slurry composition according to one embodiment of the present disclosure includes: abrasive particles dispersed so as to have positively-charged particle surfaces; a first dispersant including a nonionic linear polymer; and a second dispersant including an anionic coiling polymer, wherein the polishing slurry composition satisfies the following Expressions 1 and 2: [Expression 1] 4≤log(milling energy)