Semiconductor memory device
    1.
    发明授权

    公开(公告)号:US11626375B2

    公开(公告)日:2023-04-11

    申请号:US17304057

    申请日:2021-06-14

    Inventor: Hideo Wada

    Abstract: A semiconductor memory device includes: a stack above a peripheral circuit on a first substrate, in which first conductive layers and first insulation layers are alternately stacked in a first direction each; a first pillar through the stack, in which a semiconductor layer and each first conductive layer form a memory cell at their intersection; a second substrate including a first region above the stack and the first pillar, being connected to a semiconductor layer, and a second region juxtaposed with the first region in a second direction; a second insulation layer through the second substrate, insulating the regions from each other; and a second conductive layer including a first portion through the second substrate, and a second portion extending in the second direction above the second substrate and including a part defining a bonding pad. The second portion overlaps with the second insulation layer in the first direction.

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