Semiconductor memory device
    5.
    发明授权

    公开(公告)号:US11276700B2

    公开(公告)日:2022-03-15

    申请号:US16559363

    申请日:2019-09-03

    Abstract: A semiconductor memory device includes first conductive layers stacked on a substrate; second conductive layers stacked on the substrate and apart from the first conductive layer in a direction; third conductive layers stacked on the substrate and electrically connected to the first and second conductive layers; first insulating layers arranged in the direction to sandwich the first conductive layers; second insulating layers arranged in the direction to sandwich the second conductive layers; slit regions that sandwich the third conductive layers; and memory pillars disposed on the first and second insulating layers. The slit region is disposed between an end portion of one of the first insulating layers and an end portion of one of the second insulating layers.

    Semiconductor storage device
    6.
    发明授权

    公开(公告)号:US12232325B2

    公开(公告)日:2025-02-18

    申请号:US17462854

    申请日:2021-08-31

    Abstract: A semiconductor storage device includes a first conductive layer, a second conductive layer, a third conductive layer, a contact plug, a memory trench extending between the second conductive layer and the third conductive layer. The memory trench is formed around the contact plug, and surrounds a first area in which the contact plug is disposed. A second area is separated from the first area and includes a pillar penetrating the first conductive layer. The second conductive layer extends between the first and second areas, and is connected to the first conductive layer. The third conductive layer is on the opposite side of the first area to the second area, and is connected to the first conductive layer.

    Semiconductor memory device
    9.
    发明授权

    公开(公告)号:US11289505B2

    公开(公告)日:2022-03-29

    申请号:US16801336

    申请日:2020-02-26

    Abstract: A semiconductor memory device according to an embodiment includes a substrate, first to eleventh conductive layers, first and second pillars, and first to fourth insulating regions. The first insulating regions are provided between the third and fifth conductive layers and between the fourth and sixth conductive layers. The second insulating regions are provided between the eighth and tenth conductive layers and between the ninth and eleventh conductive layers. The third insulating region is provided between the third to sixth conductive layers and the eighth to eleventh conductive layers. The fourth insulating region is provided between the second and seventh conductive layers. The fourth insulating region is separated from the third insulating region in a planar view.

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