公开(公告)号：US20210299814A1

公开(公告)日：2021-09-30

申请号：US17010729

申请日：2020-09-02

Applicant: KIOXIA CORPORATION

Inventor： Mikiya SAKASHITA ,  Yumiko Kataoka ,  Yukiteru Matsui

IPC: B24B37/015 ,  B24B37/013 ,  C09G1/02

Abstract: According to one embodiment, a polishing method includes supplying a polishing agent to be between a polishing pad and to-be-polished surface, then polishing the to-be-polished surface with the polishing agent while rotating at least one of the to-be-polished surface and the polishing pad. The polishing agent includes abrasive grains and an organic polymer. The organic polymer makes a reversible phase transition between a gel state and a sol state depending on temperature.

公开(公告)号：US11986920B2

公开(公告)日：2024-05-21

申请号：US17010729

申请日：2020-09-02

Applicant: KIOXIA CORPORATION

Inventor： Mikiya Sakashita ,  Yumiko Kataoka ,  Yukiteru Matsui

IPC: B24B37/015 ,  B24B37/013 ,  C08L1/08 ,  C09G1/02

CPC classification number: B24B37/015 ,  B24B37/013 ,  C09G1/02 ,  C08L1/08

Abstract: According to one embodiment, a polishing method includes supplying a polishing agent to be between a polishing pad and to-be-polished surface, then polishing the to-be-polished surface with the polishing agent while rotating at least one of the to-be-polished surface and the polishing pad. The polishing agent includes abrasive grains and an organic polymer. The organic polymer makes a reversible phase transition between a gel state and a sol state depending on temperature.