公开(公告)号：US20210297600A1

公开(公告)日：2021-09-23

申请号：US17195614

申请日：2021-03-08

Applicant: KLA Corporation

Inventor： Bryant Mantiply ,  Xiumei Liu ,  Matthew Giusti ,  Kai Cao ,  Richard Wallingford

IPC: H04N5/232 ,  G06T7/00

Abstract: Methods and systems for determining focus settings for use in a specimen scan are provided. One method includes generating a focus map defined as values of best focus as a function of position on a specimen using output generated in one or more pre-focus swaths scanned on the specimen by an output acquisition subsystem configured to direct energy to a specimen, to detect energy from the specimen, and to generate output responsive to the detected energy. The method also includes interpolating the focus map to generate focus settings for a scan performed on the specimen during a process and storing information for the generated focus settings for use in the scan performed on the specimen during the process.

公开(公告)号：US11330164B2

公开(公告)日：2022-05-10

申请号：US17195614

申请日：2021-03-08

Applicant: KLA Corporation

Inventor： Bryant Mantiply ,  Xiumei Liu ,  Matthew Giusti ,  Kai Cao ,  Richard Wallingford

IPC: H04N5/232 ,  G06T7/00

Abstract: Methods and systems for determining focus settings for use in a specimen scan are provided. One method includes generating a focus map defined as values of best focus as a function of position on a specimen using output generated in one or more pre-focus swaths scanned on the specimen by an output acquisition subsystem configured to direct energy to a specimen, to detect energy from the specimen, and to generate output responsive to the detected energy. The method also includes interpolating the focus map to generate focus settings for a scan performed on the specimen during a process and storing information for the generated focus settings for use in the scan performed on the specimen during the process.

公开(公告)号：US20200319443A1

公开(公告)日：2020-10-08

申请号：US16836787

申请日：2020-03-31

Applicant: KLA Corporation

Inventor： Xiumei Liu ,  Kai Cao ,  Richard Wallingford ,  Matthew Giusti ,  Brooke Bruguier

IPC: G02B21/00 ,  G02B21/36

Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.

公开(公告)号：US20230204934A1

公开(公告)日：2023-06-29

申请号：US18114859

申请日：2023-02-27

Applicant: KLA Corporation

Inventor： Xiumei Liu ,  Kai Cao ,  Richard Wallingford ,  Matthew Giusti ,  Brooke Bruguier

IPC: G02B21/00 ,  G02B21/36

CPC classification number: G02B21/006 ,  G02B21/364 ,  G02B21/0032

Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.

公开(公告)号：US11592653B2

公开(公告)日：2023-02-28

申请号：US16836787

申请日：2020-03-31

Applicant: KLA Corporation

Inventor： Xiumei Liu ,  Kai Cao ,  Richard Wallingford ,  Matthew Giusti ,  Brooke Bruguier

IPC: G02B21/00 ,  G02B21/36

Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.