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公开(公告)号：US11356594B1
公开(公告)日：2022-06-07
申请号：US16995681
申请日：2020-08-17
Applicant: KLA Corporation
Inventor： Brooke Bruguier , Xiumei Liu , Qiang Q. Zhang , Stephen Taylor
Abstract: A system for automated focus tracking of a sample is disclosed. The system comprises an illumination source, a set of illumination optics in an illumination path, a set of collection optics in a collection path, a first slit device in the illumination path, a second slit device in the collection path, at least one detector configured to generate an image of the sample, and a controller configured to receive through-focus information from the image, and provide corrective motion to a stage holding the sample to maintain a position of the sample at a selected focus. A method for automated focus tracking of a sample is also disclosed.
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公开(公告)号：US20210297600A1
公开(公告)日：2021-09-23
申请号：US17195614
申请日：2021-03-08
Applicant: KLA Corporation
Inventor： Bryant Mantiply , Xiumei Liu , Matthew Giusti , Kai Cao , Richard Wallingford
Abstract: Methods and systems for determining focus settings for use in a specimen scan are provided. One method includes generating a focus map defined as values of best focus as a function of position on a specimen using output generated in one or more pre-focus swaths scanned on the specimen by an output acquisition subsystem configured to direct energy to a specimen, to detect energy from the specimen, and to generate output responsive to the detected energy. The method also includes interpolating the focus map to generate focus settings for a scan performed on the specimen during a process and storing information for the generated focus settings for use in the scan performed on the specimen during the process.
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公开(公告)号：US20220252512A1
公开(公告)日：2022-08-11
申请号：US17568995
申请日：2022-01-05
Applicant: KLA Corporation
Inventor： Xiumei Liu , Mark S. Wang
Abstract: An imaging system may include an imaging metrology tool with an illumination source, one or more illumination optics to direct illumination from the illumination source to a sample, a detector, one or more collection optics to image the sample onto the detector; and one or more aberration-controlling components. The one or more aberration-controlling components may provide aberration correction for imaging the sample onto the detector according to one or more degrees of freedom, where the one or more degrees of freedom include at least a defocus of the imaging system, and where the one or more aberration-controlling components are integrated with at least one of the one or more illumination optics, the one or more collection optics, or the detector.
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公开(公告)号：US20220317062A1
公开(公告)日：2022-10-06
申请号：US17846187
申请日：2022-06-22
Applicant: KLA Corporation
Inventor： Xiumei Liu
Abstract: A beam of light is directed from a light source at a wafer on a chuck. The beam of light is reflected off the wafer toward a 2D imaging camera. Movable focus lenses in the path of the beam of light can independently change the illumination conjugate and the collection conjugate. A structured mask in an illumination path can be used and the beam of light can be directed through apertures in the structured mask. A gray field image of a wafer in a zone without direct illumination is generated using the 2D imaging camera and locations of defects on the wafer can be determined using the gray field image.
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公开(公告)号：US20210164916A1
公开(公告)日：2021-06-03
申请号：US17106046
申请日：2020-11-27
Applicant: KLA Corporation
Inventor： Xiumei Liu
Abstract: A beam of light is directed from a light source at a wafer on a chuck. The beam of light is reflected off the wafer toward a 2D imaging camera. Movable focus lenses in the path of the beam of light can independently change the illumination conjugate and the collection conjugate. A structured mask in an illumination path can be used and the beam of light can be directed through apertures in the structured mask. A gray field image of a wafer in a zone without direct illumination is generated using the 2D imaging camera and locations of defects on the wafer can be determined using the gray field image.
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Patent Agency Ranking
公开(公告)号：US11965835B2
公开(公告)日：2024-04-23
申请号：US17846187
申请日：2022-06-22
Applicant: KLA Corporation
Inventor： Xiumei Liu
CPC classification number: G01N21/9501 , G01N21/8806 , G06T7/0004 , G06T2207/30148
Abstract: A beam of light is directed from a light source at a wafer on a chuck. The beam of light is reflected off the wafer toward a 2D imaging camera. Movable focus lenses in the path of the beam of light can independently change the illumination conjugate and the collection conjugate. A structured mask in an illumination path can be used and the beam of light can be directed through apertures in the structured mask. A gray field image of a wafer in a zone without direct illumination is generated using the 2D imaging camera and locations of defects on the wafer can be determined using the gray field image.
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公开(公告)号：US11330164B2
公开(公告)日：2022-05-10
申请号：US17195614
申请日：2021-03-08
Applicant: KLA Corporation
Inventor： Bryant Mantiply , Xiumei Liu , Matthew Giusti , Kai Cao , Richard Wallingford
Abstract: Methods and systems for determining focus settings for use in a specimen scan are provided. One method includes generating a focus map defined as values of best focus as a function of position on a specimen using output generated in one or more pre-focus swaths scanned on the specimen by an output acquisition subsystem configured to direct energy to a specimen, to detect energy from the specimen, and to generate output responsive to the detected energy. The method also includes interpolating the focus map to generate focus settings for a scan performed on the specimen during a process and storing information for the generated focus settings for use in the scan performed on the specimen during the process.
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8.发明申请公开(公告)号：US20200319443A1
公开(公告)日：2020-10-08
申请号：US16836787
申请日：2020-03-31
Applicant: KLA Corporation
Inventor： Xiumei Liu , Kai Cao , Richard Wallingford , Matthew Giusti , Brooke Bruguier
Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.
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9.发明公开公开(公告)号：US20230204934A1
公开(公告)日：2023-06-29
申请号：US18114859
申请日：2023-02-27
Applicant: KLA Corporation
Inventor： Xiumei Liu , Kai Cao , Richard Wallingford , Matthew Giusti , Brooke Bruguier
CPC classification number: G02B21/006 , G02B21/364 , G02B21/0032
Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.
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10.发明授权公开(公告)号：US11592653B2
公开(公告)日：2023-02-28
申请号：US16836787
申请日：2020-03-31
Applicant: KLA Corporation
Inventor： Xiumei Liu , Kai Cao , Richard Wallingford , Matthew Giusti , Brooke Bruguier
Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.
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