公开(公告)号：US20160172151A1

公开(公告)日：2016-06-16

申请号：US14567785

申请日：2014-12-11

申请人： KLA-Tencor Corporation

发明人： Christopher F. BEVIS

IPC分类号： H01J37/153 ,  H01J37/30 ,  H01J37/317

CPC分类号： H01J37/153 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0435 ,  H01J2237/1534 ,  H01J2237/303 ,  H01J2237/3175 ,  H01J2237/31774 ,  H01J2237/31788 ,  H01J2237/31789

摘要： One embodiment relates to an apparatus for aberration correction in an electron beam lithography system. An inner electrode surrounds a pattern generating device, and there is at least one outer electrode around the inner electrode. Each of the inner and outer electrodes has a planar surface in a plane of the pattern generating device. Circuitry is configured to apply an inner voltage level to the inner electrode and at least one outer voltage level to the at least one outer electrode. The voltage levels may be set to correct a curvature of field in the electron beam lithography system. Another embodiment relates to an apparatus for aberration correction used in an electron based system, such as an electron beam inspection, or review, or metrology system. Other embodiments, aspects and features are also disclosed.

摘要翻译： 一个实施例涉及一种用于电子束光刻系统中的像差校正的装置。 内部电极围绕图案生成装置，并且在内部电极周围存在至少一个外部电极。 内电极和外电极中的每一个在图案生成装置的平面中具有平坦表面。 电路被配置为将内部电压电平施加到所述内部电极，并且至少一个外部电压电平施加到所述至少一个外部电极。 可以设置电压电平以校正电子束光刻系统中的曲率场。 另一实施例涉及用于电子系统中的像差校正装置，例如电子束检查或检查或计量系统。 还公开了其它实施例，方面和特征。