公开(公告)号：US10790114B2

公开(公告)日：2020-09-29

申请号：US15672797

申请日：2017-08-09

Applicant: KLA-Tencor Corporation

Inventor： Ichiro Honjo ,  Christopher Sears ,  Hedong Yang ,  Thanh Ha ,  Jianwei Wang ,  Huina Xu

IPC: H01J37/28 ,  G02B21/00 ,  H01J37/22 ,  H01J37/30 ,  H01J37/10 ,  G06N3/08 ,  G06N3/04

Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.

公开(公告)号：US08921782B2

公开(公告)日：2014-12-30

申请号：US13846548

申请日：2013-03-18

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Ichiro Honjo ,  Christopher Malcolm Stanley Sears ,  Liqun Han

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/263 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1534

Abstract: One embodiment relates to a tilt-imaging scanning electron microscope apparatus. The apparatus includes an electron gun, first and second deflectors, an objective electron lens, and a secondary electron detector. The first deflector deflects the electron beam away from the optical axis, and the second deflector deflects the electron beam back towards the optical axis. The objective lens focuses the electron beam onto a spot on a surface of a target substrate, wherein the electron beam lands on the surface at a tilt angle. Another embodiment relates to a method of imaging a surface of a target substrate using an electron beam with a trajectory tilted relative to a substrate surface. Other embodiments and features are also disclosed.

Abstract translation: 一个实施例涉及一种倾斜成像扫描电子显微镜装置。 该装置包括电子枪，第一和第二偏转器，物镜电子透镜和二次电子检测器。 第一偏转器使电子束偏离光轴，第二偏转器将电子束偏转回光轴。 物镜将电子束聚焦到目标衬底表面上的一个点上，其中电子束以倾斜角落在表面上。 另一实施例涉及使用具有相对于衬底表面倾斜的轨迹的电子束对目标衬底的表面进行成像的方法。 还公开了其它实施例和特征。

公开(公告)号：US20190004298A1

公开(公告)日：2019-01-03

申请号：US15672797

申请日：2017-08-09

Applicant: KLA-Tencor Corporation

Inventor： Ichiro Honjo ,  Christopher Sears ,  Hedong Yang ,  Thanh Ha ,  Jianwei Wang ,  Huina Xu

IPC: G02B21/00 ,  H01J37/22 ,  H01J37/30 ,  G06N3/08

Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.