公开(公告)号：US09443696B2

公开(公告)日：2016-09-13

申请号：US14711607

申请日：2015-05-13

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Liqun Han

IPC: H01J37/26 ,  H01J37/05 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/05 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/057

Abstract: One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及双维尼滤波器单色仪。 第一维恩滤波器将电子束聚焦在第一平面中，同时使电子束在第二平面中平行。 狭缝开口允许具有能量范围内的能量的电子束的电子通过，同时阻挡具有能量范围外的能量的电子束的电子。 第二维恩滤波器将电子束聚焦成在第一平面中平行，同时使电子束在第二平面中平行。 还公开了其它实施例，方面和特征。

公开(公告)号：US08921782B2

公开(公告)日：2014-12-30

申请号：US13846548

申请日：2013-03-18

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Ichiro Honjo ,  Christopher Malcolm Stanley Sears ,  Liqun Han

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/263 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1534

Abstract: One embodiment relates to a tilt-imaging scanning electron microscope apparatus. The apparatus includes an electron gun, first and second deflectors, an objective electron lens, and a secondary electron detector. The first deflector deflects the electron beam away from the optical axis, and the second deflector deflects the electron beam back towards the optical axis. The objective lens focuses the electron beam onto a spot on a surface of a target substrate, wherein the electron beam lands on the surface at a tilt angle. Another embodiment relates to a method of imaging a surface of a target substrate using an electron beam with a trajectory tilted relative to a substrate surface. Other embodiments and features are also disclosed.

Abstract translation: 一个实施例涉及一种倾斜成像扫描电子显微镜装置。 该装置包括电子枪，第一和第二偏转器，物镜电子透镜和二次电子检测器。 第一偏转器使电子束偏离光轴，第二偏转器将电子束偏转回光轴。 物镜将电子束聚焦到目标衬底表面上的一个点上，其中电子束以倾斜角落在表面上。 另一实施例涉及使用具有相对于衬底表面倾斜的轨迹的电子束对目标衬底的表面进行成像的方法。 还公开了其它实施例和特征。