公开(公告)号：US20250027233A1

公开(公告)日：2025-01-23

申请号：US18714121

申请日：2022-12-19

Applicant: KOLON INDUSTRIES, INC.

Inventor： Jung Eun PARK ,  Young Soo LEE ,  Seong-Young KIM ,  Sinho LEE

IPC: D01F6/04 ,  D01D5/253 ,  D03D15/283 ,  D03D15/44

Abstract: The present invention relates to a shaped cross-sectional polyethylene yarn and a functional fabric including the same, and more particularly, to a shaped cross-sectional polyethylene yarn by which a fabric having a cooling sensation and sweat absorption and quick drying properties may be manufactured, and a functional fabric including the same. A polyethylene yarn according to the present invention includes a filament having a central body and two or more protrusions protruding from the central body based on a cross section perpendicular to a longitudinal direction, wherein a degree of crystallinity of the polyethylene yarn is 56 to 85%.

公开(公告)号：US20250019869A1

公开(公告)日：2025-01-16

申请号：US18713521

申请日：2022-12-06

Applicant: KOLON INDUSTRIES, INC.

Inventor： Seong-Young KIM ,  Young Soo LEE ,  Jung Eun PARK ,  Sinho LEE

IPC: D02G3/02 ,  D03D13/00 ,  D03D15/283 ,  D03D15/54 ,  D03D15/573

Abstract: The present invention relates to a dope dyed polyethylene yarn and a functional fabric including the same, and more particularly, to a dope dyed polyethylene yarn having excellent color uniformity and a functional fabric including the same.
A dope dyed polyethylene yarn according to the present invention contains a pigment, wherein L*, a* and b* measured under the following measurement condition satisfy the following expression: [Measurement condition] a measurement region is formed by winding the dope dyed polyethylene yarn around a planar substrate, computer color matching (CCM) is measured in the measurement region, and the CCM is measured at least n times (n is a natural number of 50 or more) every time the dope dyed polyethylene yarn is wound around the substrate 70 turns, ( C max - C min ) / C aver × 1 ⁢ 0 ⁢ 0 ≤ 1 ⁢ 5 [ Expression ] wherein Cmax, Cmin, and Caver represent maximum, minimum, and average values of any one selected from L*, a*, and b*, respectively.

公开(公告)号：US20250011976A1

公开(公告)日：2025-01-09

申请号：US18713654

申请日：2022-12-06

Applicant: KOLON INDUSTRIES, INC.

Inventor： Sinho LEE ,  Young Soo LEE ,  Seong-Young KIM ,  Jung Eun PARK

IPC: D02G3/02 ,  D03D15/283

Abstract: Provided are a polyethylene yarn having improved dimensional stability and a functional fabric including the same, and more particularly, a polyethylene yarn having improved dimensional stability, which may prevent shape deformation after post-processing such as weaving and cutting, and a functional fabric including the yarn to provide a user with a cool feeling are provided.

公开(公告)号：US20230357966A1

公开(公告)日：2023-11-09

申请号：US18043035

申请日：2021-12-29

Applicant: KOLON INDUSTRIES, INC.

Inventor： Sinho LEE ,  Young Soo LEE ,  Seong-Young KIM ,  Jung Eun PARK

IPC: D02G3/44 ,  D02G3/02 ,  D02G3/04 ,  D02G3/38 ,  D04B1/28 ,  D04B21/20

CPC classification number: D02G3/442 ,  D02G3/02 ,  D02G3/045 ,  D02G3/38 ,  D04B1/28 ,  D04B21/207 ,  D10B2321/021 ,  D10B2401/06 ,  D10B2501/041 ,  D10B2331/02 ,  D10B2331/10 ,  D10B2401/063

Abstract: Provided is a cut-resistant polyethylene yarn, and more particularly, a cut-resistant polyethylene yarn which allows manufacture of a product having excellent cut resistance and providing excellent wearability.

公开(公告)号：US20230322979A1

公开(公告)日：2023-10-12

申请号：US18043037

申请日：2022-06-21

Applicant: KOLON INDUSTRIES, INC.

Inventor： Sinho LEE ,  Young Soo LEE ,  Seong-Young KIM ,  Jung Eun PARK

IPC: C08F110/02

CPC classification number: C08F110/02

Abstract: Provided is a polyethylene yarn having improved post-processability, and more particularly, a polyethylene yarn which maintains excellent mechanical properties even in a harsh environment such as a high temperature to have improved post-processability such as dyeing or coating is provided.

公开(公告)号：US20250034760A1

公开(公告)日：2025-01-30

申请号：US18713475

申请日：2022-12-01

Applicant: KOLON INDUSTRIES, INC.

Inventor： Young Soo LEE ,  Jung Eun PARK ,  Seong-Young KIM ,  Sinho LEE

IPC: D02G3/02 ,  D03D13/00 ,  D03D15/283 ,  D03D15/573

Abstract: Provided are a polyethylene yarn having improved weaving properties and a functional fabric including the same, and more particularly, a polyethylene yarn which may provide a user with an appropriate cool feeling and excellent wearability and allow manufacture of a fabric having a very low fluff occurrence frequency, and a functional fabric including the same are provided.
The polyethylene yarn has a polydispersity index (PDI) of 5 or more and 20 or less, a strength of 1.5 to 10 g/d as measured according to ASTM D2256, and an elongation at maximum force of 10 to 50%.

公开(公告)号：US20230392296A1

公开(公告)日：2023-12-07

申请号：US18248390

申请日：2021-10-08

Applicant: KOLON INDUSTRIES, INC.

Inventor： Sinho LEE ,  Young Soo LEE ,  Seong-Young KIM ,  Jung Eun PARK

IPC: D01F8/06 ,  D01D5/088 ,  D01D5/098 ,  D01D5/16

CPC classification number: D01F8/06 ,  D01D5/088 ,  D01D5/098 ,  D01D5/16 ,  D10B2321/0211 ,  D10B2401/063

Abstract: Provided are a high-strength polyethylene yarn having an improved shrinkage rate and a method for manufacturing the same. More particularly, a high-strength polyethylene yarn which has a specific microstructure and has an improved shrinkage rate to allow manufacture of high-density fabric, and a method for manufacturing the same are provided.

公开(公告)号：US20230357965A1

公开(公告)日：2023-11-09

申请号：US18043029

申请日：2021-12-29

Applicant: KOLON INDUSTRIES, INC.

Inventor： Sinho LEE ,  Young Soo LEE ,  Seong-Young KIM ,  Jung Eun PARK

IPC: D02G3/44 ,  D02G3/02 ,  D02G3/38 ,  D04B21/20 ,  D04B1/28

CPC classification number: D02G3/442 ,  D02G3/02 ,  D02G3/38 ,  D04B21/207 ,  D04B1/28 ,  D10B2321/021 ,  D10B2401/00 ,  D10B2501/041 ,  D10B2401/063

Abstract: Provided is a cut-resistant polyethylene yarn, and more particularly, a cut-resistant polyethylene yarn which allows manufacture of a product having both excellent cut resistance and excellent wear resistance.