公开(公告)号：US12173215B2

公开(公告)日：2024-12-24

申请号：US17570386

申请日：2022-01-07

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Chong Min Koo ,  Tae Gon Oh ,  Seung Jun Lee ,  Seon Joon Kim ,  Soon Man Hong ,  Seung Sang Hwang ,  Albert Lee

IPC: C09K13/06 ,  C01B32/90 ,  C01B32/921 ,  C08K3/14 ,  C09G1/00 ,  C09G1/02 ,  C09G1/06 ,  C09K3/14 ,  C09K13/00 ,  C09K13/04 ,  C09K13/08 ,  C11D3/04 ,  C11D3/24 ,  C11D7/08 ,  C11D7/10 ,  C11D7/28

Abstract: The present invention relates to an etching composition and a method of producing a MXene. The etching composition of the present invention can stably and quickly produce a MXene at high temperature. The etching composition of the present invention can produce a MXene in high yield. The etching composition of the present invention can easily produce various types of MXenes. A method using the etching composition of the present invention can produce a MXene having excellent electrochemical and mechanical properties.