Abstract:
The manufacturing method of nano porous material according to an example of the present invention comprises: a preparing step to prepare a substrate; and a manufacturing step to prepare nano porous material with a network structure in which nanoclusters are connected to each other using plasma deposition through over 300 mTorr of working pressure. Using the manufacturing method, it is possible to form a nano porous material having desired surface energy without formation of additional coating layer as well as pores distributed both within and on the surface of the nano porous material with only one deposition process.
Abstract:
A method of fabricating CIGS nanorod or nanowire according to one exemplary embodiment of the present disclosure comprises a deposition preparation step of placing a raw material including copper, indium, gallium and selenium and a substrate, and a deposition step of growing CIGS nanorod or nanowire on the substrate by maintaining an internal temperature of a reactor, in which carrier gas flows at a constant flow rate, at a temperature in the range of 850 to 1000° C. According to the method, Cu(In,Ga)Se2 nanorod or nanowire as a direct transition type semiconductor material having substantially uniform composition, high crystallinity and high light absorption ratio can be fabricated.