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公开(公告)号：US20210046432A1
公开(公告)日：2021-02-18
申请号：US16977618
申请日：2019-02-25
Inventor： Takahiro KAWAKATSU , Yu FUJIMURA , Hideto MATSUYAMA , Daisuke SAEKI , Kenta OKUNO
Abstract: A permselective membrane is provided with a support membrane having selective permeability, and a coating layer formed on a surface of the support membrane and including a lipid bilayer membrane containing a channel substance. The support membrane includes a polyamide membrane providing permeation flux of 35 L/(m2·h) or more at a pressure of 0.1 MPa. A method for producing the permselective membrane includes a step of treating a polyamide membrane with chlorine to produce the support membrane and a step of forming the lipid bilayer membrane on the support membrane.
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2.发明申请公开(公告)号：US20200017384A1
公开(公告)日：2020-01-16
申请号：US16492947
申请日：2017-09-12
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor： Yu FUJIMURA , Nobuko GAN
Abstract: A diluted chemical liquid production apparatus has a structure that has a platinum group metal carrying resin column 2, a membrane-type deaeration apparatus 3 and a gas dissolving membrane apparatus 4, which are sequentially provided in a supply line 1 of ultrapure water W; and has a pH adjuster injection device 5A and an oxidation-reduction potential adjuster injection device 5B, which are provided between the platinum group metal carrying resin column 2 and the membrane-type deaeration apparatus 3. An inert gas source 6 is connected to a gaseous phase side of the membrane-type deaeration apparatus 3, and an inert gas source 7 is also connected to the gaseous phase side of the gas dissolving membrane apparatus 4; and a discharge line 8 communicates with the gas dissolving membrane apparatus 4. A pH meter 10A and an ORP meter 10B are provided in the discharge line 8. Such a diluted chemical liquid production apparatus can control a pH and an oxidation-reduction potential.
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Patent Agency Ranking
公开(公告)号：US20220184596A1
公开(公告)日：2022-06-16
申请号：US17442573
申请日：2020-03-10
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor： Yu FUJIMURA , Takahiro KAWAKATSU , Yoichi TANAKA
IPC: B01J47/014 , B01J41/14 , B01J41/13 , B01J47/127 , B01D15/36
Abstract: An organic solvent treatment method for removing particulates from an organic solvent used in a manufacturing step of electronic components is characterized by comprising a step of bringing the organic solvent into contact with a treatment material that has a positive or negative electric charge in water and has a moisture content of 3% by mass or more. An organic solvent treatment material, which is to be used in the manufacturing step of electronic components and which is for removing particulates from an organic solvent by coming into contact with the organic solvent used in the manufacturing step of electronic components, has a positive or negative electric charge in water.
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公开(公告)号：US20200048116A1
公开(公告)日：2020-02-13
申请号：US16492616
申请日：2017-09-12
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor： Nobuko GAN , Yu FUJIMURA
Abstract: An apparatus has a platinum group metal carrying resin column provided in a supply line of ultrapure water, and has a pH adjuster injection device and a redox potential adjuster injection device provided in a later stage thereof. The apparatus has a membrane-type deaeration apparatus and a gas dissolving membrane apparatus sequentially provided in a later stage of the devices, and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are each provided at some midpoint in the discharge line, and the pH meter and the ORP meter are connected to a control device. Then, the control device controls the amount of adjusters to be injected from the pH adjuster injection device and the redox potential adjuster injection device, on the basis of the measurement results of the pH meter and the ORP meter.
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公开(公告)号：US20250025869A1
公开(公告)日：2025-01-23
申请号：US18713695
申请日：2022-09-14
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor： Takahiro KAWAKATSU , Yu FUJIMURA , Takaaki CHUUMAN
IPC: B01J41/14 , B01J39/07 , B01J41/07 , B01J47/014
Abstract: Provided is a material for removing impurities in an organic solvent having a water content of 1,000 ppm or less, the material comprising a porous ion exchange resin. It is preferred that the porous ion exchange resin has, as an ion exchange group, at least one functional group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group and a quaternary ammonium group. Also provided is a method for removing impurities in an organic solvent, the method comprising bringing the material for removing impurities in an organic solvent into contact with an organic solvent having a water content of 1,000 ppm or less.
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公开(公告)号：US20220212145A1
公开(公告)日：2022-07-07
申请号：US17441041
申请日：2020-03-12
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor： Yoichi TANAKA , Yu FUJIMURA , Hideaki IINO , Takahiro KAWAKATSU
Abstract: There is provided an apparatus for removing fine particles having membranes for removing fine particles in a liquid, wherein a microfiltration membrane or ultrafiltration membrane having a positive charge and a microfiltration membrane or ultrafiltration membrane having a negative charge are arranged in series. There is also provided a method for removing fine particles using the apparatus. Liquids may be passed through the membrane having a negative charge and the membrane having a positive charge in order; thereby, extrafine particles having a particle size of 50 nm or smaller, especially of 10 nm or smaller, in the liquids can be removed highly. The liquid passing may be carried out in the order reverse thereto.
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7.发明申请公开(公告)号：US20190233307A1
公开(公告)日：2019-08-01
申请号：US16313245
申请日：2017-03-14
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor： Yu FUJIMURA , Nobuko GAN , Hiroto TOKOSHIMA
Abstract: A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.
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