公开(公告)号：US11564468B2

公开(公告)日：2023-01-31

申请号：US16328219

申请日：2017-06-22

Applicant: Kao Corporation

Inventor： Rina Iikubo ,  Shuichiro Kobaru ,  Yuki Kotaka ,  Aguri Maruyama ,  Kohsuke Kawaguchi

IPC: A45D19/00 ,  A61K8/02 ,  A61K8/19 ,  A61Q5/06 ,  A61K8/898 ,  A61K8/73 ,  A45D19/02 ,  A61K8/72

Abstract: The invention relates to a hair treatment method for treating hair by using a hair treatment tool (1). The hair treatment tool (1) includes: a fiber structure member (5) that retains a hair cosmetic; and a liquid-impermeable sheet (3) to which the fiber structure member (5) is fixed. The fiber structure member (5) retains a hair cosmetic that includes a pigment and a film-forming resin, and is sealed in a packaging (2). The hair treatment method of the invention treats hair by: exposing a surface of the fiber structure member (5) of the hair treatment tool (1); and bringing the fiber structure member (5) into contact with hair, and in this state, moving the fiber structure member (5) in a direction of orientation of the hair.

公开(公告)号：US20150111383A1

公开(公告)日：2015-04-23

申请号：US14394985

申请日：2013-04-16

Applicant: Kao Corporation

Inventor： Joji Miura ,  Yoshiaki Matsui ,  Yuki Kato ,  Yuki Kotaka

IPC: C09G1/02 ,  H01L21/306 ,  H01L21/02

CPC classification number: C09G1/02 ,  B24B37/044 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/02019 ,  H01L21/02024 ,  H01L21/30625

Abstract: A polishing liquid composition for a silicon wafer, wherein the composition comprises silica particles (component A), at least one kind of nitrogen-containing basic compound (component B) selected from an amine compound and an ammonium compound, and a water-soluble macromolecular compound (component C) that contains 10 wt % or more of a constitutional unit I represented by a general formula (1) below and has a weight average molecular weight of 50,000 or more and 1,500,000 or less; and the pH at 25° C. is 8.0 to 12.0. In the general formula (1), R1 and R2 each independently represents a hydrogen, a C1 to C8 alkyl group, or a C1 to C2 hydroxyalkyl group, and R1 and R2 are never both hydrogens.

Abstract translation: 一种用于硅晶片的抛光液体组合物，其中所述组合物包含二氧化硅颗粒（组分A），至少一种选自胺化合物和铵化合物的含氮碱性化合物（组分B）和水溶性大分子 化合物（组分C），其含有10重量％以上由下述通式（1）表示的结构单元I，重均分子量为50,000以上且1,500,000以下; 25℃下的pH为8.0〜12.0。 在通式（1）中，R 1和R 2各自独立地表示氢，C 1至C 8烷基或C 1至C 2羟烷基，并且R 1和R 2不能都是氢。