公开(公告)号：US20080170818A1

公开(公告)日：2008-07-17

申请号：US11971726

申请日：2008-01-09

申请人： Karl Kissa ,  William J. Minford ,  Jason Jiazhan Xu ,  Glen Drake

发明人： Karl Kissa ,  William J. Minford ,  Jason Jiazhan Xu ,  Glen Drake

IPC分类号： G02F1/035

CPC分类号： G02F1/0316 ,  G02F1/0356

摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration and other effects that can be present in non-hermetic packages. The bias electrodes include an upper split portion and an optically transparent lower portion. The optically transparent lower layer improves modulation frequency and reduces optical loss.

摘要翻译： 本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。 因此，用于调制输入光信号的RF电极可以以零直流偏压运行，通过电迁移减少电极腐蚀和可能存在于非密封封装中的其他效应。 偏置电极包括上分割部分和光学透明下部分。 光透明下层提高调制频率，减少光损耗。

公开(公告)号：US07529433B2

公开(公告)日：2009-05-05

申请号：US11971726

申请日：2008-01-09

申请人： Karl Kissa ,  William J. Minford ,  Jason Jiazhan Xu ,  Glen Drake

发明人： Karl Kissa ,  William J. Minford ,  Jason Jiazhan Xu ,  Glen Drake

IPC分类号： G02F1/295 ,  G02B6/12

CPC分类号： G02F1/0316 ,  G02F1/0356

摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration and other effects that can be present in non-hermetic packages. The bias electrodes include an upper split portion and an optically transparent lower portion. The optically transparent lower layer improves modulation frequency and reduces optical loss.

摘要翻译： 本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。 因此，用于调制输入光信号的RF电极可以以零直流偏压运行，通过电迁移减少电极腐蚀和可能存在于非密封封装中的其他效应。 偏置电极包括上分割部分和光学透明下部分。 光透明下层提高调制频率，减少光损耗。

公开(公告)号：US07512303B2

公开(公告)日：2009-03-31

申请号：US11769070

申请日：2007-06-27

申请人： Benjamin F. Catching ,  Donald M. Friedrich ,  Charles A. Hulse ,  Marc K. Von Gunten ,  Jason Reed ,  Karl Kissa ,  Glen Drake ,  Julia Duncan ,  William J. Minford ,  Hiren V. Shah ,  Jerry Zieba ,  Jason Jiazhan Xu

发明人： Benjamin F. Catching ,  Donald M. Friedrich ,  Charles A. Hulse ,  Marc K. Von Gunten ,  Jason Reed ,  Karl Kissa ,  Glen Drake ,  Julia Duncan ,  William J. Minford ,  Hiren V. Shah ,  Jerry Zieba ,  Jason Jiazhan Xu

IPC分类号： G02B6/10

CPC分类号： G02F1/377 ,  G02B6/13 ,  G02B6/1342 ,  G02B2006/1204 ,  G02B2006/12097 ,  G02F2201/06 ,  G02F2201/07

摘要： The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.

摘要翻译： 本发明涉及一种用于制造光波导器件的晶片刻度工艺，特别涉及脊波导器件的制造以及由此制成的改进的波导。 本发明已经发现了一种通过提供尺寸稳定的晶片组件来实现光学波导层厚度的亚微米控制的方法，其中可以引入粘合剂而不改变晶片规模制造中的载体晶片和光学透射晶片之间的平面关系 。 该方法允许晶圆级制造包括薄光学透射层的光波导器件。 通过沉积和回蚀，或通过表面蚀刻工艺来产生间隔基座的图案，以将表面信息从主表面精确地参考到载体晶片到薄的光学透射晶片。 根据该方法可实现的公差提供了跨晶片的一致产率。